Patents by Inventor Nobutaka Fujimoto

Nobutaka Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9552985
    Abstract: The invention provides an oxide semiconductor layer that has less cracks and is excellent in electrical property and stability, as well as a semiconductor element and an electronic device each including the oxide semiconductor layer. The invention provides an exemplary method of producing an oxide semiconductor layer, and the method includes the precursor layer forming step of forming, on or above a substrate, a layered oxide semiconductor precursor including a compound of metal to be oxidized into an oxide semiconductor dispersed in a solution including a binder made of aliphatic polycarbonate, and the annealing step of heating the precursor layer at a first temperature achieving decomposition of 90 wt % or more of the binder, and then annealing the precursor layer at a temperature equal to or higher than a second temperature (denoted by X) that is higher than the first temperature, achieves bonding between the metal and oxygen, and has an exothermic peak value in differential thermal analysis (DTA).
    Type: Grant
    Filed: July 4, 2014
    Date of Patent: January 24, 2017
    Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Satoshi Inoue, Tatsuya Shimoda, Tomoki Kawakita, Nobutaka Fujimoto, Kiyoshi Nishioka
  • Publication number: 20160315198
    Abstract: It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment. An exemplary method for producing a thin film transistor according to the invention includes an aliphatic polycarbonate layer forming step of forming an aliphatic polycarbonate layer 50 that covers a gate electrode layer 40 disposed above a semiconductor layer 20 with a gate insulator 30 being interposed between the gate electrode layer 40 and the semiconductor layer 20, and also covers the semiconductor layer 20, and has a dopant causing the semiconductor layer 20 to become an n-type or p-type semiconductor layer, and a heating step of heating at a temperature causing introduction of the dopant into the semiconductor layer 20 and decomposition of the aliphatic polycarbonate layer 50.
    Type: Application
    Filed: December 16, 2014
    Publication date: October 27, 2016
    Inventors: Satoshi INOUE, Tatsuya SHIMODA, Nobutaka FUJIMOTO, Kiyoshi NISHIOKA, Shuichi KARASHIMA
  • Publication number: 20160280898
    Abstract: This invention provides a polyolefin-based resin composition excellent in mechanical strength and elasticity. The polyolefin-based resin composition comprises a polyolefin-based resin, and, per 100 parts by mass of the polyolefin-based resin, 0.05 to 10 parts by mass of an aliphatic polycarbonate resin and 0.01 to 2 parts by mass of an acid modified polypropylene.
    Type: Application
    Filed: April 24, 2014
    Publication date: September 29, 2016
    Applicant: Sumitomo Seika Chemicals Co.,Ltd.
    Inventors: Nobutaka FUJIMOTO, Kiyoshi NISHIOKA, Tomoki KAWAKITA, Koh-hei NITTA, Makiko NAKAHARA
  • Patent number: 9414487
    Abstract: The present invention provides a metal paste composition which can obtain the calcined bodies having low volume resistivity in a wiring substrate after calcining. More specifically, the present invention provides a metal paste composition comprising a metal, an aliphatic polycarbonate, and an organic solvent.
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: August 9, 2016
    Assignees: SUMITOMO SEIKA CHEMICALS CO., LTD., OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE
    Inventors: Nobutaka Fujimoto, Tomoki Kawakita, Ryou Miyabara, Masami Nakamoto, Toshinobu Ohno, Mari Yamamoto, Yukiyasu Kashiwagi
  • Publication number: 20160181098
    Abstract: The invention provides an oxide semiconductor layer that has less cracks and is excellent in electrical property and stability, as well as a semiconductor element and an electronic device each including the oxide semiconductor layer. The invention provides an exemplary method of producing an oxide semiconductor layer, and the method includes the precursor layer forming step of forming, on or above a substrate, a layered oxide semiconductor precursor including a compound of metal to be oxidized into an oxide semiconductor dispersed in a solution including a binder made of aliphatic polycarbonate, and the annealing step of heating the precursor layer at a first temperature achieving decomposition of 90 wt % or more of the binder, and then annealing the precursor layer at a temperature equal to or higher than a second temperature (denoted by X) that is higher than the first temperature, achieves bonding between the metal and oxygen, and has an exothermic peak value in differential thermal analysis (DTA).
    Type: Application
    Filed: July 4, 2014
    Publication date: June 23, 2016
    Inventors: Satoshi INOUE, Tatsuya SHIMODA, Tomoki KAWAKITA, Nobutaka FUJIMOTO, Kiyoshi NISHIOKA
  • Publication number: 20160156024
    Abstract: A negative electrode mixture for a nonaqueous electrolyte secondary cell according to the present invention includes: a negative electrode active material; a conductive assistant; and a binder. The binder contains a copolymer of vinyl alcohol and an alkali metal-neutralized product of ethylene-unsaturated carboxylic acid.
    Type: Application
    Filed: March 19, 2014
    Publication date: June 2, 2016
    Applicants: Sumitomo Seika Chemicals Co., Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Yuji Kinpara, Junichi Fujishige, Nobutaka Fujimoto, Takashi Mukai, Masanori Morishita, Tetsuo Sakai
  • Patent number: 9356292
    Abstract: The present invention provides a radical composition capable of suppressing elution of electrode components in an electrolyte solution when used in an electrode for a secondary battery, and a battery using the radical composition. The present invention relates to a radical composition including a pyrroline nitroxide polymer and polyethylene glycols.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: May 31, 2016
    Assignees: SUMITOMO SEIKA CHEMICALS CO., LTD., NEC CORPORATION
    Inventors: Hiroyuki Nishide, Kenichi Oyaizu, Sosuke Yamaguchi, Nobutaka Fujimoto, Yuji Kinpara, Shun Hashimoto, Shigeyuki Iwasa, Kentaro Nakahara
  • Publication number: 20150280237
    Abstract: This binder for use in a positive electrode for a lithium ion secondary battery contains a copolymer of both vinyl alcohol and an alkali-metal-neutralized ethylenically unsaturated carboxylic acid.
    Type: Application
    Filed: October 1, 2013
    Publication date: October 1, 2015
    Inventors: Takashi Mukai, Masanori Morishita, Tetsuo Sakai, Yuji Kinpara, Junichi Fujishige, Nobutaka Fujimoto, Shuichi Karashima
  • Patent number: 8816040
    Abstract: A polymer dye has repeating units of formula (I): Each of R1, R2, and R3 is independently a monocyclic carbocyclic group, a condensed polycyclic carbocyclic group, a monocyclic heterocyclic group, or a condensed polycyclic heterocyclic group. In any case, each of R1, R2, and R3 independently may have a substituent. R1 is a divalent group, and R2 and R3 are monovalent groups. D is an organic dye group and n is an integer of from 0 to 10. The polymer dye has a number-average molecular weight of from 500 to 500,000. The dye can be a component in a film. The dye can also be included in various industrial materials in automobiles; communication instruments, such as mobile phones, PDA, remote controllers, mobile information terminals, electronic dictionaries, and electronic organizers; home electric appliances; construction parts; and the like.
    Type: Grant
    Filed: May 2, 2012
    Date of Patent: August 26, 2014
    Assignees: University of Tsukuba, Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Takaki Kanbara, Junpei Kuwabara, Hikaru Yamada, Nobutaka Fujimoto
  • Patent number: 8779087
    Abstract: The present invention provides an aliphatic polycarbonate production method which, using carbon dioxide and an epoxide, easily produces aliphatic polycarbonates having a low metal catalyst content. The invention relates to an aliphatic polycarbonate production method which includes a step of polymerization by reacting carbon dioxide with an epoxide in the presence of a metal catalyst; and a step of treating a polymer obtainable in the polymerization step with a surfactant. High-purity aliphatic polycarbonate having a low metal catalyst content can be easily provided by the aliphatic polycarbonate production method of the invention.
    Type: Grant
    Filed: May 6, 2010
    Date of Patent: July 15, 2014
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Nobutaka Fujimoto, Masafumi Okamoto
  • Publication number: 20140061532
    Abstract: The present invention provides a radical composition capable of suppressing elution of electrode components in an electrolyte solution when used in an electrode for a secondary battery, and a battery using the radical composition. The present invention relates to a radical composition including a pyrroline nitroxide polymer and polyethylene glycols.
    Type: Application
    Filed: March 23, 2012
    Publication date: March 6, 2014
    Applicants: WASEDA UNIVERSITY, NEC CORPORATION, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Hiroyuki Nishide, Kenichi Oyaizu, Sosuke Yamaguchi, Nobutaka Fujimoto, Yuji Kinpara, Shun Hashimoto, Shigeyuki Iwasa, Kentaro Nakahara
  • Publication number: 20140008588
    Abstract: The present invention provides a metal paste composition which can obtain the calcined bodies having low volume resistivity in a wiring substrate after calcining. More specifically, the present invention provides a metal paste composition comprising a metal, an aliphatic polycarbonate, and an organic solvent.
    Type: Application
    Filed: March 6, 2012
    Publication date: January 9, 2014
    Applicants: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Nobutaka Fujimoto, Tomoki Kawakita, Ryou Miyabara, Masami Nakamoto, Toshinobu Ohno, Mari Yamamoto, Yukiyasu Kashiwagi
  • Publication number: 20120329978
    Abstract: A polymer dye has repeating units of formula (I): Each of R1, R2, and R3 is independently a monocyclic carbocyclic group, a condensed polycyclic carbocyclic group, a monocyclic heterocyclic group, or a condensed polycyclic heterocyclic group. In any case, each of R1, R2, and R3 independently may have a substituent. R1 is a divalent group, and R2 and R3 are monovalent groups. D is an organic dye group and n is an integer of from 0 to 10. The polymer dye has a number-average molecular weight of from 500 to 500,000. The dye can be a component in a film. The dye can also be included in various industrial materials in automobiles; communication instruments, such as mobile phones, PDA, remote controllers, mobile information terminals, electronic dictionaries, and electronic organizers; home electric appliances; construction parts; and the like.
    Type: Application
    Filed: May 2, 2012
    Publication date: December 27, 2012
    Applicants: Sumitomo Seika Chemicals Co., Ltd., University of Tsukuba
    Inventors: Takaki Kanbara, Junpei Kuwabara, Hikaru Yamada, Nobutaka Fujimoto
  • Patent number: 8252869
    Abstract: The present invention relates to a crosslinked poly(meth)acrylic acid nitroxide compound resulting from crosslinking of a poly(meth)acrylic acid nitroxide compound, and an object of the present invention is to provide a method of inexpensively and easily producing a crosslinked poly(meth)acrylic acid nitroxide compound having a high radical concentration. The present invention is a method of producing a crosslinked poly(meth)acrylic acid nitroxide compound including a repeating unit represented by the general formula (2): (in the formula, R represents a hydrogen atom or a methyl group), comprising a nitroxidation step carried out in a state that a crosslinked poly(meth)acrylic acid imino compound resulting from crosslinking of a poly(meth)acrylic acid imino compound including a repeating unit represented by the general formula (1): (in the formula, R represents the same group as that represented by R in said general formula (2)) is dispersed in water.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: August 28, 2012
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Nobutaka Fujimoto, Koji Ueda, Masato Fujikake
  • Publication number: 20120123066
    Abstract: The present invention provides an aliphatic polycarbonate production method which, using carbon dioxide and an epoxide, easily produces aliphatic polycarbonates having a low metal catalyst content. The invention relates to an aliphatic polycarbonate production method which includes a step of polymerization by reacting carbon dioxide with an epoxide in the presence of a metal catalyst; and a step of treating a polymer obtainable in the polymerization step with a surfactant. High-purity aliphatic polycarbonate having a low metal catalyst content can be easily provided by the aliphatic polycarbonate production method of the invention.
    Type: Application
    Filed: May 6, 2010
    Publication date: May 17, 2012
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Nobutaka Fujimoto, Masafumi Okamoto
  • Publication number: 20120095179
    Abstract: The present invention provides a pyrroline nitroxide polymer, an electrode active material containing the polymer, and a cell utilizing the electrode active material. The present invention is a pyrroline nitroxide polymer obtainable by polymerization of a pyrroline nitroxide compound represented by Formula (1).
    Type: Application
    Filed: March 5, 2010
    Publication date: April 19, 2012
    Applicants: WASEDA UNIVERSITY, NEC CORPORATION, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Hiroyuki Nishide, Kenichi Oyaizu, Takeshi Kawamoto, Nobutaka Fujimoto, Yuji Kinpara, Shigeyuki Iwasa, Kentaro Nakahara
  • Patent number: 8088874
    Abstract: It is an object of the present invention to provide a crosslinked (meth)acrylic acid-type copolymer excellent in stability to a solvent, which causes substantially no crack due to drying when applied onto the surface of a current collector, and a secondary-cell electrode using the copolymer. The present invention relates to a crosslinked (meth)acrylic acid-type copolymer obtained by the steps of: polymerization of a (meth)acrylic acid imino compound represented by the general formula (1): (in the formula (1), R represents a hydrogen atom or a methyl group) and a (meth)acrylic acid ester in the presence of a crosslinking agent, and nitroxidation.
    Type: Grant
    Filed: June 4, 2007
    Date of Patent: January 3, 2012
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Nobutaka Fujimoto, Koji Ueda
  • Patent number: 7816457
    Abstract: It is an object of the invention to provide a method of producing a crosslinked poly(meth)acrylic acid compound, in particular a method of producing a crosslinked poly(meth)acrylic acid nitroxide compound, which is a radical compound excellent in solvent stability.
    Type: Grant
    Filed: May 30, 2005
    Date of Patent: October 19, 2010
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Nobutaka Fujimoto, Koji Ueda, Masato Fujikake
  • Publication number: 20100168360
    Abstract: The present invention relates to a crosslinked poly(meth)acrylic acid nitroxide compound resulting from crosslinking of a poly(meth)acrylic acid nitroxide compound, and an object of the present invention is to provide a method of inexpensively and easily producing a crosslinked poly(meth)acrylic acid nitroxide compound having a high radical concentration. The present invention is a method of producing a crosslinked poly(meth)acrylic acid nitroxide compound including a repeating unit represented by the general formula (2): (in the formula, R represents a hydrogen atom or a methyl group), comprising a nitroxidation step carried out in a state that a crosslinked poly(meth)acrylic acid imino compound resulting from crosslinking of a poly(meth)acrylic acid imino compound including a repeating unit represented by the general formula (1): (in the formula, R represents the same group as that represented by R in said general formula (2)) is dispersed in water.
    Type: Application
    Filed: June 29, 2006
    Publication date: July 1, 2010
    Applicant: Sumitomo Seika Chemicals Co., Ltd.
    Inventor: Nobutaka Fujimoto
  • Publication number: 20090306304
    Abstract: It is an object of the present invention to provide a crosslinked (meth)acrylic acid-type copolymer excellent in stability to a solvent, which causes substantially no crack due to drying when applied onto the surface of a current collector, and a secondary-cell electrode using the copolymer. The present invention relates to a crosslinked (meth)acrylic acid-type copolymer obtained by the steps of: polymerization of a (meth)acrylic acid imino compound represented by the general formula (1): (in the formula (1), R represents a hydrogen atom or a methyl group) and a (meth)acrylic acid ester in the presence of a crosslinking agent, and nitroxidation.
    Type: Application
    Filed: June 4, 2007
    Publication date: December 10, 2009
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Nobutaka Fujimoto, Koji Ueda