Patents by Inventor Norihiro Ito

Norihiro Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210230795
    Abstract: The present invention relates to a method for producing modified cellulose fibers having cellulose I crystal structure, comprising: step A: introducing Substituent Group A to cellulose fibers via an ether bond in a solvent comprising water in the presence of a base, and step B: introducing Substituent Group B to cellulose fibers via an ether bond in a solvent comprising water in the presence of a base, wherein the method includes the steps A and B concurrently, or in the order of the step A and then the step B. The cellulose fibers of the present invention obtained by the method for production of the present invention have favorable dispersibility in a hydrophobic medium and a controlled increase in viscosity.
    Type: Application
    Filed: June 11, 2019
    Publication date: July 29, 2021
    Applicant: KAO CORPORATION
    Inventors: Yutaka YOSHIDA, Shotaro SHIBATA, Haruka NAKAGAWA, Yoshiaki KUMAMOTO, Norihiro ITO, Yusaku ASAI
  • Patent number: 11024518
    Abstract: A substrate processing apparatus includes a stationary cup body 51 provided to surround a substrate holding unit 31 and configured to receive a processing liquid or mist of the processing liquid discharged onto a substrate, the stationary cup body not being moved relatively with respect to a processing vessel; a mist guard 80; and a guard elevating mechanism 84 configured to elevate the mist guard. Here, the mist guard is provided at an outside of the stationary cup body to surround the stationary cup body and configured to block a liquid scattered outwards beyond a space above the stationary cup body. Further, the mist guard includes a cylindrical portion 81 of a cylindrical shape and a protruding portion 82 protruded from an upper portion of the cylindrical portion toward an inside of the cylindrical portion.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: June 1, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Norihiro Ito, Jiro Higashijima, Nobuhiro Ogata, Takahisa Otsuka, Yuichi Douki, Yusuke Hashimoto, Kazuhiro Aiura, Daisuke Goto
  • Patent number: 10947194
    Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including DHIs obtained by causing DOPAs to react with hexacyanoferrate(III); a step 2 of obtaining an oleaginous second solution in which DHIs are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent; and a step 3 of obtaining an aqueous third solution by evaporating the extraction solvent from a mixture of the second solution obtained in the step 2 and water. The extraction of DHIs in the step 2 is performed in a tank A. After the second solution is discharged from the tank A, the second solution is supplied to a tank B, and then the step 3 is performed in the tank B.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: March 16, 2021
    Assignee: KAO CORPORATION
    Inventors: Norihiro Ito, Masayoshi Nakamoto
  • Patent number: 10947195
    Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including dihydroxyindoles obtained by causing at least a material selected from the group consisting of 3-(3,4-dihydroxyphenyl)alanine and a derivative of 3-(3,4-dihydroxyphenyl)alanine to react with an oxidizing agent; and a step 2 of obtaining an oleaginous second solution in which the dihydroxyindoles are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent. Before the first solution obtained in the step 1 is mixed with the extraction solvent in the step 2, a water-insoluble by-product is removed from the first solution.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: March 16, 2021
    Assignee: KAO CORPORATION
    Inventors: Masayoshi Nakamoto, Norihiro Ito
  • Publication number: 20200339510
    Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including DHIs obtained by causing DOPAs to react with hexacyanoferrate(III); a step 2 of obtaining an oleaginous second solution in which DHIs are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent; and a step 3 of obtaining an aqueous third solution by evaporating the extraction solvent from a mixture of the second solution obtained in the step 2 and water. The extraction of DHIs in the step 2 is performed in a tank A. After the second solution is discharged from the tank A, the second solution is supplied to a tank B, and then the step 3 is performed in the tank B.
    Type: Application
    Filed: October 31, 2018
    Publication date: October 29, 2020
    Applicant: KAO CORPORATION
    Inventors: Norihiro ITO, Masayoshi NAKAMOTO
  • Publication number: 20200270208
    Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including dihydroxyindoles obtained by causing at least a material selected from the group consisting of 3-(3,4-dihydroxyphenyl)alanine and a derivative of 3-(3,4-dihydroxyphenyl)alanine to react with an oxidizing agent; and a step 2 of obtaining an oleaginous second solution in which the dihydroxyindoles are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent. Before the first solution obtained in the step 1 is mixed with the extraction solvent in the step 2, a water-insoluble by-product is removed from the first solution.
    Type: Application
    Filed: October 31, 2018
    Publication date: August 27, 2020
    Applicant: Kao Corporation
    Inventors: Masayoshi NAKAMOTO, Norihiro ITO
  • Patent number: 10712602
    Abstract: Optical device includes first substrate being light transmissive, second substrate opposing first substrate and being light transmissive, and light distribution layer disposed between first substrate and second substrate and distributing incident light. Light distribution layer includes uneven structure portion having a plurality of projections repeated in the z axial direction parallel to the main face of first substrate, and optical medium portion containing a birefringent material and disposed to fill a plurality of recesses that are spaces between the plurality of projections. Light blocking component configured to block at least part of incident light is disposed in the plurality of recesses.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: July 14, 2020
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Kazuki Kitamura, Hiroshi Fukushima, Norihiro Ito, Hirofumi Kubota, Masuyuki Ota
  • Patent number: 10580669
    Abstract: After a discharge of a processing liquid is stopped, a position of a liquid surface within a nozzle can be observed. A substrate processing apparatus includes a substrate holding mechanism and the nozzle. The substrate holding mechanism is configured to hold a substrate. The nozzle is configured to supply the processing liquid to the substrate. The nozzle includes a pipe member and an observation window. The pipe member has a horizontal part and a downward part extended downwards from the horizontal part, and is configured to discharge the processing liquid from a tip end of the downward part. The observation window is provided at the horizontal part of the pipe member.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: March 3, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tsuyoshi Fukushima, Kazuhiro Aiura, Norihiro Ito
  • Patent number: 10486208
    Abstract: According to the present disclosure, both first and second cup bodies are brought into a state of being close to each other by lifting one of the first and second cup bodies. A first gap between a gap forming portion formed on the lower surface of a first protruding portion and the upper surface of a second protruding portion is narrower than a second gap between a portion of the first protruding portion where the gap forming portion is absent, and the upper surface of the second protruding portion. In this state, a cleaning liquid is supplied to the second gap. Since movement of the cleaning liquid that tends to flow radially outward is restricted by the first narrow gap, the entire area between the first and second protruding portions may be filled with the cleaning liquid so that the surface to be cleaned may be evenly cleaned.
    Type: Grant
    Filed: June 16, 2017
    Date of Patent: November 26, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Norihiro Ito, Jiro Higashijima, Yusuke Hashimoto, Kazuhiro Aiura
  • Patent number: 10460962
    Abstract: A substrate processing apparatus can suppress a rear surface of a substrate from being contaminated when moving the substrate and a liquid supply unit upwards. When a lift pin 22 and a liquid supply pipe 40 are moved from a neighboring position where they are adjacent to a holding plate 30 to a distanced position, an elevating device 60 raises only the lift pin 22 for a time during which the first lifting member 61 is moved up to a preset position while being connected to the lift pin 22. The elevating device 60 raises the lift pin 22 and the liquid supply pipe 40 for a time during which the first lifting member 61 is raised from the preset position to the distanced position.
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: October 29, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Terufumi Wakiyama, Norihiro Ito
  • Publication number: 20190196255
    Abstract: Optical device includes first substrate being light transmissive, second substrate opposing first substrate and being light transmissive, and light distribution layer disposed between first substrate and second substrate and distributing incident light. Light distribution layer includes uneven structure portion having a plurality of projections repeated in the z axial direction parallel to the main face of first substrate, and optical medium portion containing a birefringent material and disposed to fill a plurality of recesses that are spaces between the plurality of projections. Light blocking component configured to block at least part of incident light is disposed in the plurality of recesses.
    Type: Application
    Filed: June 13, 2017
    Publication date: June 27, 2019
    Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Kazuki KITAMURA, Hiroshi FUKUSHIMA, Norihiro ITO, Hirofumi KUBOTA, Masuyuki OTA
  • Patent number: 10297473
    Abstract: A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion.
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: May 21, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Terufumi Wakiyama, Norihiro Ito, Jiro Higashijima
  • Patent number: 10276425
    Abstract: A substrate processing system includes: a holding plate provided to be rotatable around a vertical axis; a substrate holding member provided on the holding plate to hold a substrate; a rotary drive unit that rotates the substrate in a predetermined direction; and a processing fluid supply unit that supplies a processing liquid to the substrate. The substrate holding member includes a first side portion provided at a position facing the substrate and a second side portion and a third side portion that are adjacent to the first side portion. The first side portion includes a gripping portion configured to grip an end surface of the substrate. The second side portion forms a pointed end portion with the first side portion, and includes a liquid flow guide portion that guides the processing liquid to a lower side of the substrate after the processing liquid is supplied to the substrate.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: April 30, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Terufumi Wakiyama, Norihiro Ito, Jiro Higashijima, Satoshi Biwa
  • Publication number: 20180373082
    Abstract: An optical device includes a first substrate which is light-transmissive, a second substrate which is light-transmissive and opposes the first substrate, a light distribution layer which is interposed between the first substrate and the second substrate and distributes incident light, and an optical element which is disposed on one of a surface of the second substrate on a side opposite to a side facing the first substrate and a surface of the first substrate on a side opposite to a side facing the second substrate. The light distribution layer includes an optical medium containing a birefringent material and an uneven structure. The optical element has an optical property of reducing an amount of at least one of first polarized light and second polarized light that differ in a polarization direction.
    Type: Application
    Filed: December 1, 2016
    Publication date: December 27, 2018
    Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Kazuki KITAMURA, Norihiro ITO, Hirofumi KUBOTA, Masuyuki OTA
  • Publication number: 20180328557
    Abstract: An optical device includes a first substrate having light transmission properties, a second substrate opposing the first substrate and having light transmission properties, and an optical control layer disposed between the first substrate and the second substrate and including a first light-transmitting portion that includes an optical medium and an uneven structure and a second light-transmitting portion that includes only the optical medium out of the optical medium and the uneven structure. The optical medium and the uneven structure have different refractive indices. In a plan view, the first light-transmitting portion and the second light-transmitting portion are repeatedly arranged in one direction, and the area of repetition of at least one of the first light-transmitting portion and the second light-transmitting portion varies in the one direction.
    Type: Application
    Filed: November 4, 2016
    Publication date: November 15, 2018
    Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LT D.
    Inventors: Kazuki KITAMURA, Norihiro ITO, Hirofumi KUBOTA, Masuyuki OTA
  • Publication number: 20180221925
    Abstract: A substrate processing apparatus includes a stationary cup body 51 provided to surround a substrate holding unit 31 and configured to receive a processing liquid or mist of the processing liquid discharged onto a substrate, the stationary cup body not being moved relatively with respect to a processing vessel; a mist guard 80; and a guard elevating mechanism 84 configured to elevate the mist guard. Here, the mist guard is provided at an outside of the stationary cup body to surround the stationary cup body and configured to block a liquid scattered outwards beyond a space above the stationary cup body. Further, the mist guard includes a cylindrical portion 81 of a cylindrical shape and a protruding portion 82 protruded from an upper portion of the cylindrical portion toward an inside of the cylindrical portion.
    Type: Application
    Filed: July 28, 2016
    Publication date: August 9, 2018
    Inventors: Norihiro Ito, Jiro Higashijima, Nobuhiro Ogata, Takahisa Otsuka, Yuichi Douki, Yusuke Hashimoto, Kazuhiro Aiura, Daisuke Goto
  • Publication number: 20180226277
    Abstract: A liquid processing apparatus according to an embodiment includes a holding unit, a driving unit, a shaft, and a nozzle. The driving unit rotates the substrate and the holding unit that horizontally holds the substrate. The shaft is extended along an axial direction of a rotation axis. The nozzle includes a base that is attached to an upper end of the shaft, and a liquid supply unit that is extended from the base to a radial-direction outer side of the substrate and includes discharge ports formed to discharge the liquid toward a lower surface of the substrate. The shaft and the base are configured to include a discharge passage that is formed along the axial direction to discharge the liquid discharged toward the lower surface of the substrate. The base includes a concave portion that is concave downward to cause the liquid to flow toward the discharge passage.
    Type: Application
    Filed: January 29, 2018
    Publication date: August 9, 2018
    Inventors: Terufumi Wakiyama, Norihiro Ito
  • Publication number: 20180185856
    Abstract: A liquid processing apparatus includes a holding device, a rotation device, and a processing fluid supply device including a nozzle positioned to face a surface of a substrate, a first supply path connected to the nozzle, and a second supply path connected to the nozzle such that the supply device supplies processing liquid to the substrate. The nozzle has a common flow path extending in radial direction from center portion toward peripheral portion of the substrate, and discharge ports connected to the common path and positioned in the radial direction, the first path is connected to the common path and supplies first liquid to the common path, the second path is connected to the common path and supplies second liquid to the common path that is different from the first liquid in temperature and/or concentration, and the first and second paths are communicatively connected each other via the common path.
    Type: Application
    Filed: December 29, 2017
    Publication date: July 5, 2018
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hirofumi TAKEGUCHI, Terufumi WAKIYAMA, Norihiro ITO
  • Publication number: 20180130677
    Abstract: A substrate processing apparatus can suppress a rear surface of a substrate from being contaminated when moving the substrate and a liquid supply unit upwards. When a lift pin 22 and a liquid supply pipe 40 are moved from a neighboring position where they are adjacent to a holding plate 30 to a distanced position, an elevating device 60 raises only the lift pin 22 for a time during which the first lifting member 61 is moved up to a preset position while being connected to the lift pin 22. The elevating device 60 raises the lift pin 22 and the liquid supply pipe 40 for a time during which the first lifting member 61 is raised from the preset position to the distanced position.
    Type: Application
    Filed: November 7, 2017
    Publication date: May 10, 2018
    Inventors: Terufumi Wakiyama, Norihiro Ito
  • Patent number: 9953848
    Abstract: A substrate liquid processing apparatus of the present disclosure supplies a plurality of processing liquids from a processing liquid supplying unit in a switching manner to a substrate held on a substrate holding unit. An elevatable inner cup surrounds the substrate holding unit laterally and forms a first drain path that drains the first processing liquid. An outer cup surrounds the inner cup and forms a second drain path that drains the second processing liquid. A cover covers the outside of the outer cup, includes an eaves portion that extends inwardly from an upper side, and forms an exhaust path between the cover and the outer cup. The exhaust path is connected to the first drain path and the second drain path above inlets of the first drain path and the second drain path.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: April 24, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Terufumi Wakiyama, Norihiro Ito, Jiro Higashijima