Patents by Inventor Norikazu Sasaki

Norikazu Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220288725
    Abstract: Provided are a solder alloy, a solder powder, a solder paste, and a solder joint having a low liquidus temperature and not too low solidus temperature. The solder alloy has an alloy composition of, by mass: Ag: 2.0 to 4.0%; Cu: 0.51 to 0.79%; and Bi: more than 4.0% and 8.0% or less, with the balance being Sn. The solder alloy has a liquidus temperature of less than 217° C.
    Type: Application
    Filed: March 9, 2022
    Publication date: September 15, 2022
    Inventors: Yoshie Tachibana, Tomoki Sasaki, Norikazu Sakai, Yoshihiro Yamaguchi
  • Patent number: 10607819
    Abstract: A method for cleaning a process chamber of a processing apparatus including the process chamber and a gas supply mechanism. The gas supply mechanism includes a flow splitter, a first flow path communicating with an upstream end of the flow splitter, a first valve provided in the first flow path, a second flow path communicating with a downstream end of the flow splitter and connected to the process chamber, a second valve provided in the second flow path, a bypass flow path connecting the first flow path and the second flow path, and a bypass valve provided in the bypass flow path. The method includes a step of closing the first valve and the second valve and opening the bypass valve, and a step of cleaning the process chamber by introducing a gas through the bypass flow path into the process chamber after opening the bypass valve.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: March 31, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Eiji Takahashi, Norikazu Sasaki, Atsushi Sawachi
  • Patent number: 10472717
    Abstract: A gas supply system includes a first device to a third device. A plurality of integral units of the first device is configured to select one or more gases from one or more gas sources and supply the selected gases. The second device is configured to distribute plural gases from the integral units and supply the distributed gases while controlling flow rates of the distributed gases. The third device is configured to exhaust the gases within the gas supply system to a gas exhaust device.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: November 12, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Atsushi Sawachi, Norikazu Sasaki, Jun Yamashima, Yoshiyasu Sato, Kenichi Nogami
  • Patent number: 10168049
    Abstract: Disclosed is a plasma processing apparatus in which a main control unit is capable of managing the processing situation of an exhaust gas in an exhaust gas processing unit through a dilution controller. The exhaust gas processing unit includes a detoxifying device connected to the outlet of a vacuum pump through an exhaust pipe, a dilution gas source connected to the exhaust pipe near the outlet of the vacuum pump through a dilution gas supply pipe, an MFC and an opening/closing valve installed at the middle of the dilution gas supply pipe, a gas sensor attached to the exhaust pipe on the downstream side of an end (node N) of the dilution gas supply pipe, and a dilution controller configured to control the MFC.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: January 1, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Norihiko Amikura, Norikazu Sasaki, Risako Miyoshi
  • Publication number: 20180122620
    Abstract: Processing gases respectively supplied from multiple gas supply lines into a processing vessel can be switched at a high speed in a uniform manner. A plasma processing apparatus includes the processing vessel configured to perform therein a plasma process to a target substrate; and a gas inlet member including first gas discharge holes and second gas discharge holes which are alternately arranged to be adjacent to each other and respectively communicate with a first gas supply line and a second gas supply line, which are switchable. Further, the first gas discharge holes and the second gas discharge holes independently and respectively introduce a first processing gas and a second processing gas, which are respectively supplied from the first gas supply line and the second gas supply line and used in the plasma process, into the processing vessel.
    Type: Application
    Filed: December 26, 2017
    Publication date: May 3, 2018
    Inventors: Norihiko AMIKURA, Norikazu SASAKI, Atsushi SAWACHI
  • Patent number: 9904299
    Abstract: A gas supply control method uses a pressure control flowmeter and first and second valves provided upstream and downstream, respectively, of the pressure control flowmeter in a gas supply line. The pressure control flowmeter includes a control valve and an orifice. The gas supply control method includes maintaining a pressure P1 of a first gas supply pipe between the orifice and the control valve and a pressure P2 of a second gas supply pipe between the orifice and the second valve so as to satisfy P1>2×P2. The supply of gas is controlled by controlling the opening and closing of the second valve with the first valve being open and the control valve being controlled. A volume V1 of the first gas supply pipe and a volume V2 of the second gas supply pipe have a relationship of V1/V2?9.
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: February 27, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Kumiko Ono, Hiroshi Tsujimoto, Atsushi Sawachi, Norihiko Amikura, Norikazu Sasaki, Yoshitaka Kawaguchi
  • Publication number: 20170159180
    Abstract: A gas supply system includes a first device to a third device. A plurality of integral units of the first device is configured to select one or more gases from one or more gas sources and supply the selected gases. The second device is configured to distribute plural gases from the integral units and supply the distributed gases while controlling flow rates of the distributed gases. The third device is configured to exhaust the gases within the gas supply system to a gas exhaust device.
    Type: Application
    Filed: August 6, 2015
    Publication date: June 8, 2017
    Inventors: Atsushi Sawachi, Norikazu Sasaki, Jun Yamashima, Yoshiyasu Sato, Kenichi Nogami
  • Patent number: 9651272
    Abstract: A base terminal receives the air-conditioning control information from the server, and on the basis of the received air-conditioning control information, when a power consumption value in a site is greater than the target power value for demand control, the base terminal transmits, to air-conditioning control equipment, a control instruction that sets an air conditioner to OFF, and when the temperature measured in an area is greater than the upper limit temperature when the air conditioner is performing a cooling operation, or when the temperature measured in the area is less than the lower limit temperature when the air conditioner is performing a heating operation, the base terminal transmits a control instruction that sets the air conditioner to ON.
    Type: Grant
    Filed: August 29, 2012
    Date of Patent: May 16, 2017
    Assignee: Hitachi Appliances, Inc.
    Inventors: Yasuhisa Mori, Hideo Tomita, Norikazu Sasaki
  • Patent number: 9477232
    Abstract: An apparatus for dividing and supplying gas is provided with a flow rate control device, a plurality of divided flow passages of gas flowing from the flow rate control device, thermal-type mass flow sensors disposed to the divided flow passages, electrically-operated valves disposed on a downstream side of the thermal-type mass flow sensors, controllers that control the electrically-operated valves, and a flow ratio setting calculator that calculates a total flow rate, then calculates flow rates of the divided flow passages, and then inputs the calculated flow rates as set flow rates to each controllers. One of the divided flow passages with the highest set flow rate is put in an uncontrolled state, and opening degree for each of the rest divided flow passages is controlled, and then feedback control of the divided flow rate of each of the divided flow passages is implemented by each of the controllers.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: October 25, 2016
    Assignees: FUJIKIN INCORPORATED, TOKYO ELECTRON LIMITED
    Inventors: Eiji Takahashi, Norikazu Sasaki, Atsushi Sawachi, Yohei Sawada, Nobukazu Ikeda, Ryousuke Dohi, Kouji Nishino
  • Publication number: 20160299514
    Abstract: A gas supply control method uses a pressure control flowmeter and first and second valves provided upstream and downstream, respectively, of the pressure control flowmeter in a gas supply line. The pressure control flowmeter includes a control valve and an orifice. The gas supply control method includes maintaining a pressure P1 of a first gas supply pipe between the orifice and the control valve and a pressure P2 of a second gas supply pipe between the orifice and the second valve so as to satisfy P1>2×P2. The supply of gas is controlled by controlling the opening and closing of the second valve with the first valve being open and the control valve being controlled. A volume V1 of the first gas supply pipe and a volume V2 of the second gas supply pipe have a relationship of V1/V2?9.
    Type: Application
    Filed: March 25, 2016
    Publication date: October 13, 2016
    Inventors: Kumiko ONO, Hiroshi TSUJIMOTO, Atsushi SAWACHI, Norihiko AMIKURA, Norikazu SASAKI, Yoshitaka KAWAGUCHI
  • Publication number: 20150330631
    Abstract: Disclosed is a plasma processing apparatus in which a main control unit is capable of managing the processing situation of an exhaust gas in an exhaust gas processing unit through a dilution controller. The exhaust gas processing unit includes a detoxifying device connected to the outlet of a vacuum pump through an exhaust pipe, a dilution gas source connected to the exhaust pipe near the outlet of the vacuum pump through a dilution gas supply pipe, an MFC and an opening/closing valve installed at the middle of the dilution gas supply pipe, a gas sensor attached to the exhaust pipe on the downstream side of an end (node N) of the dilution gas supply pipe, and a dilution controller configured to control the MFC.
    Type: Application
    Filed: April 29, 2015
    Publication date: November 19, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Norihiko AMIKURA, Norikazu SASAKI, Risako MIYOSHI
  • Publication number: 20150206713
    Abstract: Processing gases respectively supplied from multiple gas supply lines into a processing vessel can be switched at a high speed in a uniform manner. A plasma processing apparatus includes the processing vessel configured to perform therein a plasma process to a target substrate; and a gas inlet member including first gas discharge holes and second gas discharge holes which are alternately arranged to be adjacent to each other and respectively communicate with a first gas supply line and a second gas supply line, which are switchable. Further, the first gas discharge holes and the second gas discharge holes independently and respectively introduce a first processing gas and a second processing gas, which are respectively supplied from the first gas supply line and the second gas supply line and used in the plasma process, into the processing vessel.
    Type: Application
    Filed: January 20, 2015
    Publication date: July 23, 2015
    Inventors: Norihiko AMIKURA, Norikazu SASAKI, Atsushi SAWACHI
  • Publication number: 20150059859
    Abstract: An apparatus for dividing and supplying gas is provided with a flow rate control device, a plurality of divided flow passages of gas flowing from the flow rate control device, thermal-type mass flow sensors disposed to the divided flow passages, electrically-operated valves disposed on a downstream side of the thermal-type mass flow sensors, controllers that control the electrically-operated valves, and a flow ratio setting calculator that calculates a total flow rate, then calculates flow rates of the divided flow passages, and then inputs the calculated flow rates as set flow rates to each controllers. One of the divided flow passages with the highest set flow rate is put in an uncontrolled state, and opening degree for each of the rest divided flow passages is controlled, and then feedback control of the divided flow rate of each of the divided flow passages is implemented by each of the controllers.
    Type: Application
    Filed: August 29, 2014
    Publication date: March 5, 2015
    Inventors: Eiji Takahashi, Norikazu Sasaki, Atsushi Sawachi, Yohei Sawada, Nobukazu Ikeda, Ryousuke Dohi, Kouji Nishino
  • Publication number: 20150039135
    Abstract: A base terminal receives the air-conditioning control information from the server, and on the basis of the received air-conditioning control information, when a power consumption value in a site is greater than the target power value for demand control, the base terminal transmits, to air-conditioning control equipment, a control instruction that sets an air conditioner to OFF, and when the temperature measured in an area is greater than the upper limit temperature when the air conditioner is performing a cooling operation, or when the temperature measured in the area is less than the lower limit temperature when the air conditioner is performing a heating operation, the base terminal transmits a control instruction that sets the air conditioner to ON.
    Type: Application
    Filed: August 29, 2012
    Publication date: February 5, 2015
    Inventors: Yasuhisa Mori, Hideo Tomita, Norikazu Sasaki
  • Publication number: 20150000707
    Abstract: A method for cleaning a process chamber of a processing apparatus including the process chamber and a gas supply mechanism. The gas supply mechanism includes a flow splitter, a first flow path communicating with an upstream end of the flow splitter, a first valve provided in the first flow path, a second flow path communicating with a downstream end of the flow splitter and connected to the process chamber, a second valve provided in the second flow path, a bypass flow path connecting the first flow path and the second flow path, and a bypass valve provided in the bypass flow path. The method includes a step of closing the first valve and the second valve and opening the bypass valve, and a step of cleaning the process chamber by introducing a gas through the bypass flow path into the process chamber after opening the bypass valve.
    Type: Application
    Filed: June 23, 2014
    Publication date: January 1, 2015
    Inventors: Eiji TAKAHASHI, Norikazu SASAKI, Atsushi SAWACHI
  • Patent number: 8218945
    Abstract: A motion picture recording/reproducing apparatus for embodying the technique includes, at least, a motion picture data input unit which inputs the motion picture data, a storage unit which stores the motion picture data, a recording unit which stores the motion picture data in the storage unit, a feature generating unit which generates a feature of the motion picture data, a ranking generating unit which provides ranking of scenes in the motion picture data according to their importance levels, a reproduction scene deciding unit which decides a reproduction image for each of the scenes in the motion picture data, and a category acquiring unit which acquires the category of the motion picture data. The ranking generating unit provides ranking of the scenes in the input motion picture data on the basis of the acquired category.
    Type: Grant
    Filed: December 22, 2005
    Date of Patent: July 10, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Kazushige Hiroi, Yoshifumi Fujikawa, Norikazu Sasaki, Riri Ueda, Akio Hayashi, Yukio Fujii, Atsuo Kawaguchi
  • Publication number: 20100329636
    Abstract: A video playback apparatus includes a first unit which inputs a viewing time of video data to be played back, a second unit which extracts scenes on a basis of a power of audio in the video data or a movement of image in the video data so that a sum of the time of the extracted playback scenes is within the viewing time, and a third unit which plays back the extracted scenes.
    Type: Application
    Filed: September 13, 2010
    Publication date: December 30, 2010
    Inventors: Kazushige HIROI, Yoshifumi FUJIKAWA, Norikazu SASAKI, Riri UEDA, Akio HAYASHI, Yukio FUJII, Atsuo Kawaguchi
  • Patent number: 7796857
    Abstract: A video playback apparatus includes: video data inputting unit; a ranking data inputting/generating unit that inputs or generates ranking data where scenes in video data are ranked according to importance; a playback scene determination parameter inputting unit that inputs parameters when determining scenes to be played back according to importance; a playback scene determining unit that determines playback scenes based on ranking data and playback scene determination parameters; and a display unit that displays playback scenes. A viewing time of video data that the user desires and a maximum time width of each playback scene are inputted to the playback scene determination parameter inputting unit, and the playback scene determining unit cuts scenes so that the playback time of the playback scenes fits the maximum time width, and determines the playback scenes so that the sum of the playback time of the playback scenes fits within the viewing time.
    Type: Grant
    Filed: June 17, 2005
    Date of Patent: September 14, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Kazushige Hiroi, Yoshifumi Fujikawa, Norikazu Sasaki, Riri Ueda, Akio Hayashi, Yukio Fujii, Atsuo Kawaguchi
  • Patent number: 7716604
    Abstract: In a thumbnail screen, categories and category thumbnails are disposed and displayed in the depth (Z-axis) direction and in the horizontal (X axis) direction, respectively. When focus is given by a focus to any of upper and lower category thumbnails, which are displayed on the most front side, and a category name display part, the row (layers) of the thumbnails scrolls in the horizontal direction. When the right and left direction keys of a remote controller are operated while the category name display has focus, the scroll in the depth direction is performed, thus enabling the specification of a desired category. This three-dimensionally displays the thumbnails and facilitates the operation for viewing information.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Kataoka, Takashi Yoshimaru, Takaaki Ishii, Yasuhisa Mori, Norikazu Sasaki
  • Patent number: 7681217
    Abstract: A video information system which displays or records broadcast video information records an operation history of the video information system, and, when video information is newly reproduced and displayed or newly recorded, generates user presence information from the operation history and program information of broadcast video information and selects video information to be displayed or recorded based on the user preference information.
    Type: Grant
    Filed: January 3, 2007
    Date of Patent: March 16, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Kazunori Iwabuchi, Norikazu Sasaki