Abstract: According to one embodiment, a display device includes a first substrate including a first insulating substrate, a second substrate including a second insulating substrate, a light modulation layer, a first electrode of a strip shape extending in a first direction, a plurality of conductive wiring lines extending in a second direction crossing the first direction, configured to selectively transmit a desired polarized light component of incident light, a second electrode configured to optically change the light modulation layer in cooperation with the first electrode, and a detection circuit configured to detect a change in capacitance between the first electrode and the conductive wiring lines.

Abstract: A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the stage section. A washing section for washing the substrate is arranged near the stage section and the treatment section and deviated from a space between the stage section and the treatment section in a second direction crossing a first direction passing through the stage section and the treatment section. A transfer robot is arranged between the stage section and the treatment section. The transfer robot transfers the substrate between the stage section, treatment section, and washing section and loads the substrate, washed in the washing section, directly into the treatment section.

Abstract: Transferring apparatus includes a main body defining a take-up position at which a rectangular glass substrate is located and a transfer position spaced apart from the take-up position. A transferring mechanism is arranged between the take-up and transfer positions and provided with a hand for supporting the substrate and transferring the substrate from the take-up position to the transfer position. Two optical sensors are provided on the hand and detect one side of the substrate located at the take-up position. A control section of the apparatus generates positional data in accordance with the detection signals from the sensors. The positional data includes an angle of the one side of the substrate to the hand and a distance between the one side and the hand. The control section controls the operation of the transferring mechanism based on the positional data so as to transfer the substrate from the take-up position and the transfer position and to position it to the transfer position.

Abstract: Transferring apparatus includes a main body defining a take-up position at which a rectangular glass substrate is located and a transfer position spaced apart from the take-up position. A transferring mechanism is arranged between the take-up and transfer positions and provided with a hand for supporting the substrate and transferring the substrate from the take-up position to the transfer position. Two optical sensors are provided on the hand and detect one side of the substrate located at the take-up position. A control section of the apparatus generates positional data in accordance with the detection signals from the sensors. The positional data includes an angle of the one side of the substrate to the hand and a distance between the one side and the hand. The control section controls the operation of the transferring mechanism based on the positional data so as to transfer the substrate from the take-up position and the transfer position and to position it to the transfer position.

Abstract: Transferring apparatus includes a main body defining a take-up position at which a rectangular glass substrate is located and a transfer position spaced apart from the take-up position. A transferring mechanism is arranged between the take-up and transfer positions and provided with a hand for supporting the substrate and transferring the substrate from the take-up position to the transfer position. Two optical sensors are provided on the hand and detect one side of the substrate located at the take-up position. A control section of the apparatus generates positional data in accordance with the detection signals from the sensors. The positional data includes an angle of the one side of the substrate to the hand and a distance between the one side and the hand. The control section controls the operation of the transferring mechanism based on the positional data so as to transfer the substrate from the take-up position and the transfer position and to position it to the transfer position.

Abstract: A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the stage section. A washing section for washing the substrate is arranged near the stage section and the treatment section and deviated from a space between the stage section and the treatment section in a second direction crossing a first direction passing through the stage section and the treatment section. A transfer robot is arranged between the stage section and the treatment section. The transfer robot transfers the substrate between the stage section, treatment section, and washing section and loads the substrate, washed in the washing section, directly into the treatment section.

Abstract: A method is disclosed which forms a thin film by setting a substrate in place in a vacuum vessel provided with a gas inlet and introducing reaction gases through the gas inlet into the vacuum vessel and meanwhile applying a high-frequency electric power to the reaction gases thereby inducing generation of plasma and deposition of the thin film of the reaction product of the reaction gases on the substrate, which method is characterized in that prior to the introduction of the reaction gas, a discharge gas formed of a component gas of the reaction gases which by itself assumes the state of plasma and possesses substantially no ability to form the thin film or a plurality of reaction gases which in itself possesses substantially no ability to form the thin film is introduced into the vacuum vessel and the high-frequency electric power is meanwhile applied to the discharging gas thereby inducing the generation of plasma and effecting a pretreatment, and thereafter the reaction gases are introduced into the vacuu

Abstract: A dry etching method of a thin film comprising the steps of, forming a resist pattern on a thin film, performing a first etching wherein the thin film is selectively dry-etched under a first etching condition using the resist pattern as a mask, and performing a second etching wherein the thin film is selectively dry-etched under a second etching condition using the resist pattern as a mask, the second etching condition differing from the first etching condition, wherein changing from the first etching step to the second etching step is performed before the selective etching of the thin film is accomplished.

Abstract: A vapor deposition method for forming at least one thin film on a substrate, wherein the time required to control the temperature of a substrate is minimized and the need for additional heating and cooling chambers to change the substrate temperature is obviated. A carry-in/carry-out chamber, heating chamber, and first and second film forming heating chambers are arranged about and connected to a transfer chamber by respective gate valves. The apparatus provides for a continuous film-forming process to be carried out under different operating conditions by controlling at least one of the following parameters: evacuation times for the first and second film forming chambers, the time for transporting the substrate from the first to the second film forming chamber by a carrier mechanism, the pressure in the transfer chamber, the evacuation waiting time before the film forming step, and the material gases introducing and pressure adjusting time before the film forming step.

Abstract: Transferring apparatus includes a main body defining a take-up position at which a rectangular glass substrate is located and a transfer position spaced apart from the take-up position. A transferring mechanism is arranged between the take-up and transfer positions and provided with a hand for supporting the substrate and transferring the substrate from the take-up position to the transfer position. Two optical sensors are provided on the hand and detect one side of the substrate located at the take-up position. A control section of the apparatus generates positional data in accordance with the detection signals from the sensors. The positional data includes an angle of the one side of the substrate to the hand and a distance between the one side and the hand. The control section controls the operation of the transferring mechanism based on the positional data so as to transfer the substrate from the take-up position and the transfer position and to position it to the transfer position.

Abstract: A suction detector which can accurately detect suction and removal of an object to be chucked, includes: a pressure sensor for detecting the pressure in a suction path for chucking the object and for generating pressure data corresponding to the detected pressure; a delaying circuit for delaying transmission of the pressure data from the pressure sensor and for generating delayed pressure data; and a suction/removal detecting unit for comparing first total data of the delayed pressure data from the delaying circuit and adjustably-set first level difference data with the pressure data from the pressure sensor, to detect suction of the object, and for comparing second total data of the pressure data from the pressure sensor and adjustably-set second level difference data with the delayed pressure data from the delaying circuit, to detect removal of the object. The delaying circuit comprises an integrating circuit which includes a resistor and a capacitor, and removes spike noise.