Abstract: Provided is a composition that may be used for a specific use application, such as a composition for enhancing a breast milk component. A composition containing a bacterium of the genus Bifidobacterium as an active ingredient is described.

Abstract: A composition for promoting development of the intestinal tract, a composition for improving lung function or a composition for improving immune function containing a bacterium belonging to Bifidobacterium longum subsp. infantis is provided. The bacterium is preferably Bifidobacterium longum subsp. infantis M-63 (NITE BP-02623).

Abstract: A problem of the invention is to provide a technique for improving memory ability in later childhood, and the problem is solved by a composition for an infant and/or child for improving memory ability in later childhood, wherein the composition contains Bifidobacterium longum subsp. infantis as an active ingredient.

Abstract: A composition includes cells of Lactobacillus paracasei MCC1849 (NITE BP-01633). The composition is in the form of a pharmaceutical composition, a food, a drink, or a feed. The pharmaceutical composition can be used for treating an inflammatory disease, ulcer, food allergies, bronchial asthma, urticaria, pollinosis, anaphylactic shock or an opportunistic infection.

Abstract: Provided is a composition that may be used for a specific use application, such as a composition for enhancing a breast milk component. A composition containing a bacterium of the genus Bifidobacterium as an active ingredient is described.

Abstract: Provided is a technique that makes it possible to promote proliferation of probiotics having a low ability to assimilate human milk oligosaccharides (HMOs), in the presence of HMOs. Also provided is a nutritional composition containing bacteria belonging to Bifidobacterium bifidum, one or more types of probiotics having a low ability to assimilate human milk oligosaccharides, and human milk oligosaccharides. The nutritional composition according to the present technology may be suitably used for foods/drinks, medicines, quasi-drugs, feeds, and the like.

Abstract: A composition includes cells of Lactobacillus paracasei MCC1849 (NITE BP-01633). The composition is in the form of a pharmaceutical composition, a food, a drink, or a feed. The pharmaceutical composition can be used for treating an inflammatory disease, ulcer, food allergies, bronchial asthma, urticaria, pollinosis, anaphylactic shock or an opportunistic infection.

Abstract: A method for prophylaxis or treatment of a disease includes administering an an effective amount of an agent that contains cells of Lactobacillus paracasei MCC1849 (NITE BP-01633) to a subject in need of such prophylaxis or treatment. The disease can be one or more of an inflammatory disease, ulcer, food allergies, bronchial asthma, urticaria, pollinosis, anaphylactic shock or an opportunistic infection.

Abstract: There is provided a substrate processing apparatus of performing a predetermined substrate process on a plurality of target substrates under a vacuum atmosphere, including: a plurality of processing parts each configured to perform the substrate process on each of the plurality of target substrates; a gas supply mechanism configured to supply a processing gas to each of the plurality of processing parts; a single exhaust mechanism configured to exhaust the processing gas within the plurality of processing parts; and a control part configured to control the single exhaust mechanism to collectively exhaust the processing gas within the plurality of processing parts, and control the gas supply mechanism to separately supply the processing gas into each of the plurality of processing parts such that a difference between internal pressures of the plurality of processing parts is prevented.

Abstract: A method for prophylaxis or treatment of a disease includes administering an an effective amount of an agent that contains cells of Lactobacillus paracasei MCC1849 (NITE BP-01633) to a subject in need of such prophylaxis or treatment. The disease can be one or more of an inflammatory disease, ulcer, food allergies, bronchial asthma, urticaria, pollinosis, anaphylactic shock or an opportunistic infection.

Abstract: The Lactobacillus paracasei MCC1849 (NITE BP-01633) strain, which has a high IL-12 production-promoting action, is used as an ingredient of a drug, food or drink, or feed used for promotion of IL-12 production, immunostimulation, antivirus, or the like.

Abstract: The Lactobacillus paracasei MCC1849 (NITE BP-01633) strain, which has a high IL-12 production-promoting action, is used as an ingredient of a drug, food or drink, or feed used for promotion of IL-12 production, immunostimulation, antivirus, or the like.

Abstract: The Lactobacillus paracasei MCC1849 (NITE BP-01633) strain, which has a high IL-12 production-promoting action, is used as an ingredient of a drug, food or drink, or feed used for promotion of IL-12 production, immunostimulation, antivirus, or the like.

Abstract: There is provided a substrate processing apparatus of performing a predetermined substrate process on a plurality of target substrates under a vacuum atmosphere, including: a plurality of processing parts each configured to perform the substrate process on each of the plurality of target substrates; a gas supply mechanism configured to supply a processing gas to each of the plurality of processing parts; a single exhaust mechanism configured to exhaust the processing gas within the plurality of processing parts; and a control part configured to control the single exhaust mechanism to collectively exhaust the processing gas within the plurality of processing parts, and control the gas supply mechanism to separately supply the processing gas into each of the plurality of processing parts such that a difference between internal pressures of the plurality of processing parts is prevented.

Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.

Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.

Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.

Abstract: A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.

Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.

Abstract: A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.