Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: There is provided a gasket comprising a sealing portion and a deformation stopper portion. When the gasket is placed between adjacent surfaces to be sealed of two objects, the sealing portion is engaged by the adjacent surfaces. The deformation stopper portion is engaged by the adjacent surfaces of the objects when the sealing portion has been deformed by a predetermined amount by the adjacent surfaces, thereby preventing excessive deformation of the sealing portion.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: Flow sensors 41 and 42 for detecting a flow load including the presence of a flow of gas are provided in supply lines 2a through 2d for supplying a given gas into a treatment chamber 6. A CPU 40 is provided for previously storing control parameters corresponding to the presence of a flow of gas. The presence of a flow of gas or a flow of IPA is detected by the flow sensors 41, 42 or an IPA supply pump 43, and detected signals are transmitted to the CPU 40. On the basis of a control signal outputted from the CPU 40, a cartridge heater 14, inner and outer tube heaters 25 and 26 and an insulation heater 52 are controlled. Thus, a control parameter adopted in accordance with the presence of a flow of gas to be used is determined, so that the control parameter previously stored in a data table 100 is selected in accordance with a control mode to control the temperature or pressure of the gas.

Abstract: A vapor generating apparatus comprises: a convergent-divergent nozzle 50 having an inlet port 50a and an outlet port 50a for a gas for a vapor medium, the convergent-divergent nozzle 50 comprising a convergent nozzle portion 51a, which is formed so as to be tapered and narrowed from the inlet port 50a toward the outlet port 50b, and a divergent nozzle portion 51c, which is formed so as to be expanded from the convergent nozzle portion 51a toward the outlet port 50b; and a supply port 54 for a liquid to be evaporated, the supply port 54 being open to the divergent nozzle portion 51c of the convergent-divergent nozzle 50. Thus, it is possible to easily produce a gas using a smaller number of control factors, and it is possible to increase the amount of produced gas and decrease the vapor generating time.

Abstract: A drying processing apparatus for supplying a dry gas to a processing chamber 35, which houses therein semiconductor wafers W, to dry the semiconductor wafers W, including a heater 32 for heating N.sub.2 gas serving as a carrier gas; a vapor generator 34 for making IPA misty by using the N.sub.2 gas heated by the heater 32 and for heating the IPA to produce the dry gas; and a flow control element 36 for supplying a predetermined rate of N.sub.2 gas to the processing chamber 35. Thus, it is possible to improve the efficiency of heat transfer of N.sub.2 gas, and it is possible to increase the amount of produced IPA gas and decrease the time to produce IPA gas. In addition, it is possible to prevent the turbulence of atmosphere in the processing chamber 35 after the drying processing is completed.

Abstract: A pressure and flow rate of a gas flowing into or out of a processing chamber are controlled, so as to decrease or increase an atmosphere in the processing chamber higher or lower than a target pressure to obtain a target pressure. During a first period, an opening speed of an opening degree adjusting device provided in an inlet pipe communicating to the processing chamber is controlled to a first target value toward a first predetermined functional approximation line (for example a function of second degree) as ideal value. During the rest of periods other than the first period, the opening speed is controlled stepwise to two or more predetermined target values so that the processing chamber reaches the target pressure. During a period before the first period, the opening speed may be controlled to a second target value among the two or more target values, based on a control amount for the opening degree adjusting device.

Abstract: A diaphragm valve comprises a body with an inflow passage and an outflow passage for fluid, a valve seat disposed around said inflow passage, and a diaphragm which are disposed on said valve seat and opens and closes between said inflow passage and said outflow passage, and a gas flow hole which connects said inflow passage to said outflow passage is disposed in said valve seat.

Abstract: The invention has its object to provide a diaphragm type high pressure shut-off valve which is simple in external shape, can realize miniaturization and is convenient in handling.The shut-off valve comprises a cylindrical housing (10) having a supply unit for compressed air at its end in an axial direction (Q), a piston (19) provided in the housing (10) and adapted to reciprocate in response to the compressed air, a return spring (20) provided in the housing (10) so as to permit the piston (19) to return, a rack portion (19A) provided to extend from the piston (19), a cam pinion (17) having a pinion portion (17B) provided integrally with the pinion portion (17B) and a rotating shaft (18) supported by the housing (10), and a diaphragm (7) adapted for movement in response to displacements of stems (9,13) and abutting against the cam face portion (17A) of the cam pinion (17).

Abstract: A manual control valve apparatus having a structure which is provided with, as a conversion mechanism, a diaphragm compressor which is held between a valve casing and a guide member, arcuate engaging grooves formed in a surface of the diaphragm presser opposite to the valve stem, and rolling elements which engage in a freely rolling manner in the engaging grooves and are supported by the lead end part of the valve stem. The bottom surfaces of the engaging grooves are made cam surfaces for causing reciprocating motion in the axial direction of the valve stem. An indicator possessing opening indicating portions indicating the rotational position of the valve stem is attached to the opposite end of the guide member from the valve casing, and furthermore, windows exposing the opening support portions are provided in an area from the circumferential wall of the handle to the end wall thereof.

Abstract: A diaphragm valve structure which is durable and has high reliability is obtained.In the diaphragm valve structure, a body 11, a valve seat 12, a seat holder 13, and a diaphragm 14, are provided; an inflow passage and an outflow passage for fluids and openings thereof are formed in body 11, valve seat 12 is disposed around the periphery of the opening of the inflow passage, the valve seat is pressed downward into body 11 by seat holder 13, diaphragm 14 comes into contact with valve seat 12 and places the opening in an airtight state, and thereby, movement of fluid between the inflow passage and the outflow passage is halted. At least two projecting parts are formed between the inflow passage and the outflow passage of this diaphragm valve structure; one of these two projecting parts is formed on valve seat 12, and the other projecting part is formed either on valve seat 12 or on seat holder 13.

Abstract: A supply control apparatus for semiconductor process gasses which is capable of accurately switching the timing of the supply state of the gasses flowing in accordance with the open or closed states of a plurality of gas pressure operated valves, which operate in response to a plurality of electromagnetic valves operating in time series. The content volumes of a plurality of gas tubes respectively connecting the plurality of electromagnetic valves to the plurality of drive units of the gas pressure operated valves are determined as a function of the length of time elapsed between the application of the control signal and the time the special gas is supplied to a process unit. The apparatus permits accurate switching of the supply state of the special gasses and avoids the mixing of the semiconductor process gasses.

Abstract: A metal diaphragm valve in which the interior of a valve casing is divided, by means of a metal diaphragm, thereby defining a valve chamber. Inlet hole and outlet hole are connected to the valve chamber. A valve seat is provided between the inlet and outlet holes, inside the valve chamber. A valve disk adapted to rest on the valve seat, is formed integrally with the diaphragm. The valve disk is driven by a drive unit disposed outside of the valve chamber, to open or close the valve.