Patents by Inventor Otte Van Ommeren

Otte Van Ommeren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor pattern delineation by sputter etching process
    Patent number: 3984300
    Abstract: A layer is patterned by sputter etching using a photoresist as a sputter-etch-mask and using a thin metal layer between the mask and the layer or layer-system to be patterned. The metal layer is extremely thin and consists of a metal that is itself useless as a sputter-etch-mask. The process is especially important in the manufacture of semiconductor devices.
    Type: Grant
    Filed: February 7, 1975
    Date of Patent: October 5, 1976
    Assignee: U.S. Philips Corporation
    Inventor: Otte Van Ommeren
  • Semiconductor pattern delineation by sputter etching process
    Patent number: RE29947
    Abstract: A layer is patterned by sputter etching using a photoresist as a sputter-etch-mask and using a thin metal layer between the mask and the layer or layer-system to be patterned. The metal layer is extremely thin and consists of a metal that is itself useless as a sputter-etch-mask. The process is especially important in the manufacture of semiconductor devices.
    Type: Grant
    Filed: November 23, 1977
    Date of Patent: March 27, 1979
    Assignee: U.S. Philips Corporation
    Inventor: Otte Van Ommeren