Patents by Inventor Patricius Aloysius Jacobus Tinnemans

Patricius Aloysius Jacobus Tinnemans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10816909
    Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
    Type: Grant
    Filed: October 3, 2018
    Date of Patent: October 27, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene, Patrick Warnaar
  • Publication number: 20200272061
    Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
    Type: Application
    Filed: September 4, 2018
    Publication date: August 27, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Edo Maria HULSEBOS, Henricus Johannes Lambertus MEGENS, Ahmet Koray ERDAMAR, Loek Johannes Petrus VERHEES, Willem Seine Christian ROELOFS, Wendy Johanna Martina VAN DE VEN, Hadi YAGUBIZADE, Hakki Ergün CEKLI, Ralph BRINKHOF, Tran Thanh Thuy VU, Maikel Robert GOOSEN, Maaike VAN T WESTEINDE, Weitian KOU, Manouk RIJPSTRA, Matthijs COX, Franciscus Godefridus Casper BIJNEN
  • Publication number: 20200249576
    Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.
    Type: Application
    Filed: July 11, 2018
    Publication date: August 6, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patrick WARNAAR, Patricius Aloysius Jacobus TINNEMANS, Grzegorz GRZELA, Everhardus Cornelis MOS, Wim Tjibbo TEL, Marinus JOCHEMSEN, Bart Peter Bert SEGERS, Frank STAALS
  • Publication number: 20200201194
    Abstract: In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements obtained at the time of processing the prior substrates are used with the historical performance measurements to calculate a model mapping. The model mapping is applied to modify the substrate model. The lithographic apparatus is controlled using the process model and the modified substrate model together. Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Edo Maria Hulsebos, Patricius Aloysius Jacobus Tinnemans, Ralph Brinkhof, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees, Ingrid Margaretha Ardina Van Donkelaar, Franciscus Godefridus Casper Bijnen
  • Patent number: 10620549
    Abstract: A lithographic technique that involves obtaining values of parameters of a substrate deformation model, wherein the values are based on positional data obtained from an alignment system for a lithographic apparatus; modifying the values using a mapping operation, wherein the mapping operation is based on a correlation found between the parameters and overlay data for a previous set of substrates; and generating, based on the modified values, electronic data adapted to configure the lithographic apparatus.
    Type: Grant
    Filed: May 10, 2019
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Edo Maria Hulsebos, Patricius Aloysius Jacobus Tinnemans, Ralph Brinkhof, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees, Ingrid Margaretha Ardina Van Donkelaar, Franciscus Godefridus Casper Bijnen
  • Publication number: 20200081356
    Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
    Type: Application
    Filed: November 18, 2019
    Publication date: March 12, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Edo Maria HULSEBOS, Henricus Johannes Lambertus MEGENS, Sudharshanan RAGHUNATHAN, Boris MENCHTCHIKOV, Ahmet Koray ERDAMAR, Loek Johannes Petrus VERHEES, Willem Seine Christian ROELOFS, Wendy Johanna Martina VAN DE VEN, Hadi YAGUBIZADE, Hakki Ergün CEKLI, Ralph BRINKHOF, Tran Thanh Thuy VU, Maikel Robert GOOSEN, Maaike VAN'T WESTEINDE, Weitian KOU, Manouk RIJPSTRA, Matthijs COX, Franciscus Godefridus Casper BIJNEN
  • Patent number: 10585363
    Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: March 10, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Alessandro Polo, Patricius Aloysius Jacobus Tinnemans, Adrianus Johannes Hendrikus Schellekens, Elahe Yeganegi Dastgerdi, Willem Marie Julia Marcel Coene, Erik Willem Bogaart, Simon Reinald Huisman
  • Publication number: 20200041563
    Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.
    Type: Application
    Filed: July 31, 2019
    Publication date: February 6, 2020
    Applicant: Stichting VU
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas Tenner, Maurits Van der schaar
  • Patent number: 10527958
    Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov, Ahmet Koray Erdamar, Loek Johannes Petrus Verhees, Willem Seine Christian Roelofs, Wendy Johanna Martina Van De Ven, Hadi Yagubizade, Hakki Ergün Cekli, Ralph Brinkhof, Tran Thanh Thuy Vu, Maikel Robert Goosen, Maaike Van't Westeinde, Weitian Kou, Manouk Rijpstra, Matthijs Cox, Franciscus Godefridus Casper Bijnen
  • Patent number: 10527955
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Publication number: 20190378012
    Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
    Type: Application
    Filed: May 29, 2019
    Publication date: December 12, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Lorenzo Tripodi, Patrick Warnaar, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans, Scott Anderson Middlebrooks, Adrianus Cornelis Matheus Koopman, Frank Staals, Brennan Peterson, Anton Bernhard Van Oosten
  • Patent number: 10474045
    Abstract: A method of characterizing a deformation of a plurality of substrates is described. The method includes: measuring, for a plurality of n different alignment measurement parameters ? and for a plurality of substrates, a position of the alignment marks; determining a positional deviation as the difference between the n alignment mark position measurements and a nominal alignment mark position; grouping the positional deviations into data sets; determining an average data set; subtracting the average data set from the data sets to obtain a plurality of variable data sets; performing a blind source separation method on the variable data sets, thereby decomposing the variable data sets into a set of eigenwafers representing principal components of the variable data sets; and subdividing the set of eigenwafers into a set of mark deformation eigenwafers and a set of substrate deformation eigenwafers.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: November 12, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma, Irina Anatolievna Lyulina, Edo Maria Hulsebos, Hakki Ergün Cekli, Xing Lan Liu, Loek Johannes Petrus Verhees, Victor Emanuel Calado, Leon Paul Van Dijk
  • Patent number: 10466601
    Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target having a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: November 5, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Alessandro Polo, Simon Gijsbert Josephus Mathijssen, Patricius Aloysius Jacobus Tinnemans, Scott Douglas Coston, Ronan James Havelin
  • Publication number: 20190265598
    Abstract: In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements obtained at the time of processing the prior substrates are used with the historical performance measurements to calculate a model mapping. The model mapping is applied to modify the substrate model. The lithographic apparatus is controlled using the process model and the modified substrate model together. Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.
    Type: Application
    Filed: May 10, 2019
    Publication date: August 29, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Edo Maria HULSEBOS, Patricius Aloysius Jacobus TINNEMANS, Ralp BRINKHOF, Pieter Jacob HERES, Jorn Kjeld LUCAS, Loek Johannes Petrus VERHEES, Ingrid Margaretha Ardina VAN DONKELAAR, Franciscus Godefridus Casper BIJNEN
  • Publication number: 20190265028
    Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.
    Type: Application
    Filed: February 15, 2019
    Publication date: August 29, 2019
    Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
  • Patent number: 10386735
    Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: August 20, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Nitesh Pandey, Patricius Aloysius Jacobus Tinnemans, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
  • Publication number: 20190235397
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Application
    Filed: April 5, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VAN MEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
  • Publication number: 20190227444
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: March 29, 2019
    Publication date: July 25, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob STREEFKERK, Johannes Catharinus Hubertus MULKENS, Erik Theodorus Maria BIJLAART, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Bernardus Antonius SLAGHEKKE, Patricius Aloysius Jacobus TINNEMANS, Helmar VAN SANTEN
  • Patent number: 10346729
    Abstract: A method for converting a vector-based representation of a desired device pattern for an exposure apparatus, a lithography or exposure apparatus, an apparatus and method to provide data to a programmable patterning device, and a device manufacturing method. In an embodiment, the method for converting outputs a rasterized representation of the desired dose pattern of radiation corresponding to the desired device pattern, wherein the vector-based representation includes primitive data identifying one or more primitive patterns; and instance data identifying how at least a portion of the desired device pattern is formed from one or more instances of each identified primitive pattern, the method including forming a rasterized primitive of each primitive pattern identified in the primitive data, and forming the rasterized representation by storing each rasterized primitive in association with the instance data corresponding to that rasterized primitive.
    Type: Grant
    Filed: November 13, 2012
    Date of Patent: July 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Marcel Bontekoe, Patrick Petrus Albertus Arnoldino Peeters
  • Patent number: 10331040
    Abstract: In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements obtained at the time of processing the prior substrates are used with the historical performance measurements to calculate a model mapping. The model mapping is applied to modify the substrate model. The lithographic apparatus is controlled using the process model and the modified substrate model together. Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.
    Type: Grant
    Filed: September 15, 2016
    Date of Patent: June 25, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Edo Maria Hulsebos, Patricius Aloysius Jacobus Tinnemans, Ralph Brinkhof, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees, Ingrid Margaretha Ardina Van Donkelaar, Franciscus Godefridus Casper Bijnen