Patents by Inventor Paul Cornelius Hubertus Aben

Paul Cornelius Hubertus Aben has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for calculating substrate model parameters and controlling lithographic processing
    Patent number: 10495990
    Abstract: Metrology measurements are performed on substrates that have been subjected to lithographic processing. Model parameters are calculated by fitting the measurements to an extended high-order substrate model defined using a combination of basis functions that include an edge basis function related to a substrate edge. A radial edge basis function may be expressed in terms of distance from a substrate edge. The edge basis function may, for example, be an exponential decay function or a rational function. Lithographic processing of a subsequent substrate is controlled using the calculated high-order substrate model parameters, in combination with low-order substrate model parameters obtained by fitting inline measurements to a low order model.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jasper Menger, Paul Cornelius Hubertus Aben, Everhardus Cornelis Mos