Patents by Inventor Paul Gräupner

Paul Gräupner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180164691
    Abstract: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other.
    Type: Application
    Filed: January 19, 2018
    Publication date: June 14, 2018
    Inventor: Paul Graeupner
  • Patent number: 9885958
    Abstract: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other.
    Type: Grant
    Filed: December 1, 2014
    Date of Patent: February 6, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Paul Graeupner
  • Patent number: 9690203
    Abstract: Method for setting an illumination setting in an illumination optical unit comprising at least one controllable correction device, which includes a multiplicity of adjustable correction elements for influencing the transmission, wherein the illumination setting is varied for adapting a predetermined imaging parameter in the region of an image field.
    Type: Grant
    Filed: January 6, 2015
    Date of Patent: June 27, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joerg Zimmermann, Ralf Stuetzle, Paul Graeupner, Olaf Conradi
  • Patent number: 9285685
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: March 15, 2016
    Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbH
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Gräupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Patent number: 9146475
    Abstract: A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: September 29, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Paul Gräupner, Olaf Conradi, Christoph Zaczek, Wilhelm Ulrich, Helmut Beierl, Toralf Gruner, Volker Graeschus
  • Publication number: 20150160565
    Abstract: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other.
    Type: Application
    Filed: December 1, 2014
    Publication date: June 11, 2015
    Inventor: Paul Graeupner
  • Publication number: 20150153652
    Abstract: Method for setting an illumination setting in an illumination optical unit comprising at least one controllable correction device, which includes a multiplicity of adjustable correction elements for influencing the transmission, wherein the illumination setting is varied for adapting a predetermined imaging parameter in the region of an image field.
    Type: Application
    Filed: January 6, 2015
    Publication date: June 4, 2015
    Inventors: Joerg Zimmermann, Ralf Stuetzle, Paul Graeupner, Olaf Conradi
  • Patent number: 8917379
    Abstract: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other. The poles of the dipolar intensity distribution can each have an azimuthal width defined by a pole angle ?, and a pole area APOLE according to: 0.6<APOLE/AOPT<1.
    Type: Grant
    Filed: June 12, 2009
    Date of Patent: December 23, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Paul Graeupner
  • Publication number: 20140293248
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: April 24, 2014
    Publication date: October 2, 2014
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Jozef Maria FINDERS, Paul GRÄUPNER, Johannes Catharinus Hubertus MULKENS, Jan Bernard Plechelmus VAN SCHOOT
  • Patent number: 8711330
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: May 6, 2011
    Date of Patent: April 29, 2014
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Patent number: 8605257
    Abstract: In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: December 10, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann, Paul Graeupner, Hans-Juergen Rostalski, Wolfgang Singer, Guenter Scheible, Sigrid Scheible
  • Publication number: 20130114056
    Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
    Type: Application
    Filed: August 2, 2012
    Publication date: May 9, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Paul Graeupner
  • Patent number: 8416390
    Abstract: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
    Type: Grant
    Filed: July 31, 2009
    Date of Patent: April 9, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Deguenther, Paul Graeupner, Juergen Fischer
  • Patent number: 8405907
    Abstract: A system and associated method employ a first projection objective including at least one optical proximity correction (OPC) filter with a filter function adapted to a particular pattern. The first projection objective has at least essentially the same imaging properties as a second projection objective in the system, for the particular pattern, to which the filter function of the optical proximity correction (OPC) filter is adapted. The first projection objective differs from the second projection objective with respect to optical imaging properties for the particular pattern when the optical proximity correction (OPC) filter is not present in the first projection objective.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: March 26, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Paul Graeupner
  • Patent number: 8237915
    Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
    Type: Grant
    Filed: September 3, 2008
    Date of Patent: August 7, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Paul Graeupner
  • Publication number: 20120013985
    Abstract: A system provided with a first projection objective including at least one optical proximity correction (OPC) filter having a filter function adapted to a particular pattern. The first projection objective and a second projection objective in the system have, for the particular pattern, to which the filter function of the optical proximity correction (OPC) filter is adapted, at least essentially the same imaging properties. The first projection objective differs from the second projection objective with respect to optical imaging properties for the particular pattern when the optical proximity correction (OPC) filter is not present in the first projection objective. An associated method is also disclosed.
    Type: Application
    Filed: September 12, 2011
    Publication date: January 19, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Paul GRAEUPNER
  • Patent number: 8027091
    Abstract: In a method for correcting optical proximity effects (Optical Proximity Correction, OPC) when imaging a pattern, arranged in the object surface of a projection objective, into the image surface of the projection objective with the aid of a projection objective, a multiplicity of optical elements and at least one pupil surface that is Fourier-transformed to the image surface are arranged between the object surface and the image surface. An optical filtering of the light used for the imaging is carried out with the aid of at least one OPC filter inserted between the object surface and the image surface in accordance with an OPC filter function that is adapted to the pattern and corresponds to a spatially dependent transmission filtering in the region of the pupil surface of the imaging system.
    Type: Grant
    Filed: May 18, 2007
    Date of Patent: September 27, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Paul Graeupner
  • Publication number: 20110211181
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: May 6, 2011
    Publication date: September 1, 2011
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Patent number: 7961293
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: March 17, 2008
    Date of Patent: June 14, 2011
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hebertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Patent number: 7800732
    Abstract: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval.
    Type: Grant
    Filed: December 21, 2009
    Date of Patent: September 21, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Joerg Zimmermann, Heiko Feldmann, Tilmann Heil, Paul Graeupner, Ulrich Gebhardt