Patents by Inventor Paul J. Roman
Paul J. Roman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7427529Abstract: A light emitting display comprising a first electrode layer on a substrate. The electrode layer is patterned to form a plurality of laterally spaced apart strips in a first direction. A plurality of spacedly disposed light emitting organic elements with a second electrode layer atop are disposed on the first electrode layer in a second direction. An undercut structure made of an undercut pattern transfer layer and an overlaying pattern transfer layer. The undercut structure is disposed between the plurality of spacedly disposed light emitting organic elements. A light emitting display having a color isolation well. The color isolation well is characterized by a first well layer and a second well layer in which the first well layer matches a property of an emissive polymer or small molecule dye held by the well whereas the second well layer does not match the property.Type: GrantFiled: April 23, 2003Date of Patent: September 23, 2008Assignee: Simon Fraser UniversityInventors: Paul J. Roman, Jr., Harold O. Madsen
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Patent number: 7074640Abstract: The present invention involves a low-temperature, photoresist-free method of fabricating a barrier layer on a flexible substrate. An embodiment involves the conversion of a precursor into a top-surface imaging layer during a direct patterning step. Preferred precursors are formed from a metal complex comprising at least one ligand selected from the group consisting of acac, carboxylato, alkoxy, azide, carbonyl, nitrato, amine, halide, nitro, and mixtures thereof and at least one metal selected from the group consisting of Li, Al, Si, Ti, V, Cr, Mn, Fe, Ni, Co, Cu, Zn, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Ba, La, Pr, Sm, Eu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Pb, Th, U, Sb, As, Ce, Mg, and mixtures thereof.Type: GrantFiled: May 20, 2003Date of Patent: July 11, 2006Assignee: Simon Fraser UniversityInventors: David J. Maloney, Wai M. Lee, Paul J. Roman, Jr., Michael A. Fury
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Patent number: 7067346Abstract: The present invention involves the formation of titanium carbonate films that exhibit improved hydrolytic stability and photosensitivity. Such films can be used in semiconductor processing to deposit titanium and titanium oxide layers on a substrate and to form patterns without the use of photoresists. Preferred titanium carboxylates are non-branched and branched carboxylates wherein the alkoxide component is an alcohol, branched titanium carboxylates wherein the alkoxide component is a diol, non-branched and branched titanium alpha hydroxy carboxylate compounds, and titanium dicarboxylate compounds.Type: GrantFiled: February 26, 2003Date of Patent: June 27, 2006Assignee: Simon Foster UniversityInventors: Ross H. Hill, Paul J. Roman, Jr., Seigi Suh, Xin Zhang
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Publication number: 20040180292Abstract: The present invention relates generally to a method and apparatus for converting a precursor material, preferably organometallic, to a film, preferably metal-containing, that is adherent to at least a portion of a substrate. Both method and apparatus include a pre-conversion step or section, and a step or section for substantial conversion of a portion of material from the pre-conversion step or section into the form of a predetermined pattern, wherein this substantial conversion results in a metal-containing patterned layer on the substrate.Type: ApplicationFiled: October 29, 2003Publication date: September 16, 2004Applicant: EKC Technology, Inc.Inventors: Wai M. Lee, David J. Maloney, Paul J. Roman, Michael A. Fury, Ross H. Hill, Clifford Henderson, Sean Barstow
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Patent number: 6787198Abstract: The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.Type: GrantFiled: October 23, 2002Date of Patent: September 7, 2004Assignee: EKC Technology, Inc.Inventors: Shyama P. Mukherjee, Harold O. Madsen, Paul J. Roman, Jr., Leo G. Svendsen
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Publication number: 20040164293Abstract: The present invention involves a low-temperature, photoresist-free method of fabricating a barrier layer on a flexible substrate. An embodiment involves the conversion of a precursor into a top-surface imaging layer during a direct patterning step. Preferred precursors are formed from a metal complex comprising at least one ligand selected from the group consisting of acac, carboxylato, alkoxy, azide, carbonyl, nitrato, amine, halide, nitro, and mixtures thereof and at least one metal selected from the group consisting of Li, Al, Si, Ti, V, Cr, Mn, Fe, Ni, Co, Cu, Zn, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Ba, La, Pr, Sm, Eu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Pb, Th, U, Sb, As, Ce, Mg, and mixtures thereof.Type: ApplicationFiled: May 20, 2003Publication date: August 26, 2004Inventors: David J. Maloney, Wai M. Lee, Paul J. Roman, Michael A. Fury
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Publication number: 20040101988Abstract: A light emitting display comprising a first electrode layer on a substrate. The electrode layer is patterned to form a plurality of laterally spaced apart strips in a first direction. A plurality of spacedly disposed light emitting organic elements with a second electrode layer atop are disposed on the first electrode layer in a second direction. An undercut structure made of an undercut pattern transfer layer and an overlaying pattern transfer layer. The undercut structure is disposed between the plurality of spacedly disposed light emitting organic elements. A light emitting display having a color isolation well. The color isolation well is characterized by a first well layer and a second well layer in which the first well layer matches a property of an emissive polymer or small molecule dye held by the well whereas the second well layer does not match the property.Type: ApplicationFiled: April 23, 2003Publication date: May 27, 2004Inventors: Paul J. Roman, Harold O. Madsen
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Patent number: 6723388Abstract: This invention comprises methods for making nanostructured and nanoporous thin film structures of various compositions. These films can be directly patterned. In these methods, precursor films are deposited on a surface and different components of the precursor film are reacted under selected conditions, forming a nanostructured or nanoporous film. Such films can be used in a variety of applications, for example, low k dielectrics, sensors, catalysts, conductors or magnetic films. Nanostructured films can be created: (1) using one precursor component and two reactions, (2) using two or more components based on differential rates of photochemical conversion, (3) using two precursors based on the thermal sensitivity of one precursor and the photochemical sensitivity of the other, and (4) by photochemical reaction of a precursor film and selected removal of a largely unreacted component from the film.Type: GrantFiled: September 30, 2002Date of Patent: April 20, 2004Assignee: EKC Technology, Inc.Inventors: Leo G. Svendsen, Shyama P. Mukheriee, Paul J. Roman, Jr., Ross H. Hill, Harold O. Madsen, Xin Zhang, Donna Hohertz
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Patent number: 6696363Abstract: The present invention relates generally to a method and apparatus for converting a precursor material, preferably organometallic, to a film, preferably metal-containing, that is adherent to at least a portion of a substrate. Both method and apparatus include a pre-conversion step or section, and a step or section for substantial conversion of a portion of material from the pre-conversion step or section into the form of a predetermined pattern, wherein this substantial conversion results in a metal-containing patterned layer on the substrate.Type: GrantFiled: June 6, 2001Date of Patent: February 24, 2004Assignee: EKC Technology, Inc.Inventors: Wai M. Lee, David J. Maloney, Paul J. Roman, Michael A. Fury, Ross H. Hill, Clifford Henderson, Sean Barstow
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Publication number: 20030190820Abstract: The present invention involves the formation of titanium carbonate films that exhibit improved hydrolytic stability and photosensitivity. Such films can be used in semiconductor processing to deposit titanium and titanium oxide layers on a substrate and to form patterns without the use of photoresists. Preferred titanium carboxylates are non-branched and branched carboxylates wherein the alkoxide component is an alcohol, branched titanium carboxylates wherein the alkoxide component is a diol, non-branched and branched titanium alpha hydroxy carboxylate compounds, and titanium dicarboxylate compounds.Type: ApplicationFiled: February 26, 2003Publication date: October 9, 2003Inventors: Ross H. Hill, Paul J. Roman, Seigi Suh, Xin Zhang
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Publication number: 20030157250Abstract: The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.Type: ApplicationFiled: October 23, 2002Publication date: August 21, 2003Inventors: Shyama P. Mukherjee, Harold O. Madsen, Paul J. Roman, Leo G. Svendsen
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Publication number: 20030118743Abstract: This invention comprises methods for making nanostructured and nanoporous thin film structures of various compositions. These films can be directly patterned. In these methods, precursor films are deposited on a surface and different components of the precursor film are reacted under selected conditions, forming a nanostructured or nanoporous film. Such films can be used in a variety of applications, for example, low k dielectrics, sensors, catalysts, conductors or magnetic films. Nanostructured films can be created: (1) using one precursor component and two reactions, (2) using two or more components based on differential rates of photochemical conversion, (3) using two precursors based on the thermal sensitivity of one precursor and the photochemical sensitivity of the other, and (4) by photochemical reaction of a precursor film and selected removal of a largely unreacted component from the film.Type: ApplicationFiled: September 30, 2002Publication date: June 26, 2003Inventors: Leo G. Svendsen, Shyama P. Mukherjee, Paul J. Roman, Ross H. Hill, Harold O. Madsen, Xin Zhang, Donna Hohertz
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Patent number: 6566276Abstract: The present invention involves fabrication of a hard mask. An embodiment involves the conversion of a precursor into a top-surface imaging layer during a direct patterning step. Another embodiment of the present invention is a method of forming an etched pattern in a substrate. A further embodiment of the present invention is a method of forming an implanted region in a substrate. Preferred precursors are formed from a metal complex comprising at least one ligand selected from the group consisting of acac, carboxylato, alkoxy, azide, carbonyl, nitrato, amine, halide, nitro, and mixtures thereof and at least one metal selected from the group consisting of Li, Al, Si, Ti, V, Cr, Mn, Fe, Ni, Co, Cu, Zn, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Ba, La, Pr, Sm, Eu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Pb, Th, U, Sb, As, Ce, Mg, and mixtures thereof.Type: GrantFiled: June 6, 2001Date of Patent: May 20, 2003Assignee: EKC Technology, Inc.Inventors: David J. Maloney, Wai M. Lee, Paul J. Roman, Jr., Michael A. Fury, Ross H. Hill
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Publication number: 20020076495Abstract: The present invention involves fabrication of a hard mask. An embodiment involves the conversion of a precursor into a top-surface imaging layer during a direct patterning step. Another embodiment of the present invention is a method of forming an etched pattern in a substrate. A further embodiment of the present invention is a method of forming an implanted region in a substrate. Preferred precursors are formed from a metal complex comprising at least one ligand selected from the group consisting of acac, carboxylato, alkoxy, azide, carbonyl, nitrato, amine, halide, nitro, and mixtures thereof and at least one metal selected from the group consisting of Li, Al, Si, Ti, V, Cr, Mn, Fe, Ni, Co, Cu, Zn, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Ba, La, Pr, Sm, Eu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Pb, Th, U, Sb, As, Ce, Mg, and mixtures thereof.Type: ApplicationFiled: June 6, 2001Publication date: June 20, 2002Inventors: David J. Maloney, Wai M. Lee, Paul J. Roman, Michael A. Fury, Ross H. Hill
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Publication number: 20020037481Abstract: The present invention relates generally to a method and apparatus for converting a precursor material, preferably organometallic, to a film, preferably metal-containing, that is adherent to at least a portion of a substrate. Both method and apparatus include a pre-conversion step or section, and a step or section for substantial conversion of a portion of material from the pre-conversion step or section into the form of a predetermined pattern, wherein this substantial conversion results in a metal-containing patterned layer on the substrate.Type: ApplicationFiled: June 6, 2001Publication date: March 28, 2002Inventors: Wai M. Lee, David J. Maloney, Paul J. Roman, Michael A. Fury, Ross H. Hill, Clifford Henderson, Sean Barstow
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Patent number: 6018078Abstract: N-nitrosohydroxylamine compounds exhibiting minimal or no degradation are disclosed. The N-nitrosohydroxylamines can be stabilized in the presence of a compound capable of removing water from the environment.Type: GrantFiled: June 23, 1999Date of Patent: January 25, 2000Assignee: First Chemical CorporationInventors: Darrell V. Harris, Paul J. Roman, Jr., Zhihong Wu, Earl G. Adams, Eric L. Williams