Patents by Inventor Paul Luehrmann

Paul Luehrmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Publication number: 20060066855
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Application
    Filed: August 15, 2005
    Publication date: March 30, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Boef, Arno Bleeker, Youri Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Kiers, Paul Luehrmann, Henricus Pellemans, Maurits Schaar, Cedric Grouwstra, Markus Van Kraaij
  • Lithographic processing cell, lithographic apparatus, track and device manufacturing method
    Publication number: 20050206868
    Abstract: A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.
    Type: Application
    Filed: October 15, 2004
    Publication date: September 22, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stefan Kruijswijk, Rard De Leeuw, Paul Luehrmann, Wim Tel, Paul Van Wijnen, Kars Troost