Patents by Inventor Pavel Stanislavovich Antsiferov

Pavel Stanislavovich Antsiferov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9476841
    Abstract: The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180° C. may be adjusted around the target jet.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: October 25, 2016
    Assignee: OOO “Isteq B.V.”
    Inventors: Pavel Stanislavovich Antsiferov, Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Kryvokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Denis Alexandrovich Glushkov, Samir Ellwi, Pavel Viktorovich Seroglazov
  • Patent number: 9368337
    Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber, and an optical system for collecting plasma radiation.
    Type: Grant
    Filed: August 23, 2013
    Date of Patent: June 14, 2016
    Assignee: OOO “RnD-ISAN”
    Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
  • Patent number: 9357627
    Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and determined radiation power is maintained via an automated control system.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: May 31, 2016
    Assignee: OOO “RnD-ISAN”
    Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
  • Patent number: 9357626
    Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: May 31, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Jozef Johannes Gerardus Anna Maria Smeets, Gerbrand Van Der Zouw
  • Publication number: 20160044774
    Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability, brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and predetermined radiation power is maintained via an automated control system.
    Type: Application
    Filed: April 8, 2014
    Publication date: February 11, 2016
    Inventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH
  • Publication number: 20150311058
    Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber and an optical system for collecting plasma radiation.
    Type: Application
    Filed: August 23, 2013
    Publication date: October 29, 2015
    Applicant: RND-ISAN, LTD
    Inventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH
  • Publication number: 20150108373
    Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
    Type: Application
    Filed: November 20, 2014
    Publication date: April 23, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Henricus Petrus Maria PELLEMANS, Pavel Stanislavovich ANTSIFEROV, Vladimir Mihailovitch KRIVTSUN, Johannes Matheus Marie DE WIT, Ralph Jozef Johannes Gerardus Anna Maria SMEETS, Gerbrand VAN DER ZOUW
  • Patent number: 8921814
    Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: December 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Josef Johannes Gerardus Anna M Smeets, Gerbrand Van Der Zouw
  • Publication number: 20130329204
    Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
    Type: Application
    Filed: May 24, 2013
    Publication date: December 12, 2013
    Inventors: Henricus Petrus Maria PELLEMANS, Pavel Stanislavovich ANTSIFEROV, Vladimir Mihailovitch KRIVTSUN, Johannes Matheus Marie DE WIT, Ralph Jozef Johannes Gerardus Anna Maria SMEETS, Gerbrand VAN DER ZOUW
  • Publication number: 20130070218
    Abstract: A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.
    Type: Application
    Filed: March 3, 2011
    Publication date: March 21, 2013
    Applicant: ASML Netherland B.V.
    Inventors: Vladimir Vitalevich Ivanov, Pavel Stanislavovich Antsiferov, Yurii Victorovitch Sidelnikov, Luigi Scaccabarozzi, Hendrik Antony Johannes Neerhof, Andrei Mikhailovich Yakunin, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Richard Joseph Bruls
  • Patent number: 7872244
    Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
    Type: Grant
    Filed: August 8, 2007
    Date of Patent: January 18, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev
  • Publication number: 20090040492
    Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev
  • Patent number: 6933510
    Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: August 23, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Givi Georgievitch Zukavishvili, Vladimir Vital'Evitch Ivanov, Konstantin Nikolaevitch Koshelev, Evgenil Dmitreevitch Korob, Vadim Yevgenyevich Banine, Pavel Stanislavovich Antsiferov
  • Publication number: 20040141165
    Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.
    Type: Application
    Filed: September 30, 2003
    Publication date: July 22, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Givi Georgievitch Zukavishvili, Vladimir Vital?apos;Evitch Ivanov, Konstantin Nikolaevitch Koshelev, Evgenil Dmitreevitch Korob, Vadim Yevgenyevich Banine, Pavel Stanislavovich Antsiferov