Patents by Inventor Pavel Stanislavovich Antsiferov
Pavel Stanislavovich Antsiferov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9476841Abstract: The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180° C. may be adjusted around the target jet.Type: GrantFiled: June 14, 2016Date of Patent: October 25, 2016Assignee: OOO “Isteq B.V.”Inventors: Pavel Stanislavovich Antsiferov, Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Kryvokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Denis Alexandrovich Glushkov, Samir Ellwi, Pavel Viktorovich Seroglazov
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Patent number: 9368337Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber, and an optical system for collecting plasma radiation.Type: GrantFiled: August 23, 2013Date of Patent: June 14, 2016Assignee: OOO “RnD-ISAN”Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
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Patent number: 9357626Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.Type: GrantFiled: November 20, 2014Date of Patent: May 31, 2016Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Jozef Johannes Gerardus Anna Maria Smeets, Gerbrand Van Der Zouw
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Patent number: 9357627Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and determined radiation power is maintained via an automated control system.Type: GrantFiled: April 8, 2014Date of Patent: May 31, 2016Assignee: OOO “RnD-ISAN”Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
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Publication number: 20160044774Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability, brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and predetermined radiation power is maintained via an automated control system.Type: ApplicationFiled: April 8, 2014Publication date: February 11, 2016Inventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH
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Publication number: 20150311058Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber and an optical system for collecting plasma radiation.Type: ApplicationFiled: August 23, 2013Publication date: October 29, 2015Applicant: RND-ISAN, LTDInventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH
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Publication number: 20150108373Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.Type: ApplicationFiled: November 20, 2014Publication date: April 23, 2015Applicant: ASML Netherlands B.V.Inventors: Henricus Petrus Maria PELLEMANS, Pavel Stanislavovich ANTSIFEROV, Vladimir Mihailovitch KRIVTSUN, Johannes Matheus Marie DE WIT, Ralph Jozef Johannes Gerardus Anna Maria SMEETS, Gerbrand VAN DER ZOUW
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Patent number: 8921814Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.Type: GrantFiled: May 24, 2013Date of Patent: December 30, 2014Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Josef Johannes Gerardus Anna M Smeets, Gerbrand Van Der Zouw
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Publication number: 20130329204Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.Type: ApplicationFiled: May 24, 2013Publication date: December 12, 2013Inventors: Henricus Petrus Maria PELLEMANS, Pavel Stanislavovich ANTSIFEROV, Vladimir Mihailovitch KRIVTSUN, Johannes Matheus Marie DE WIT, Ralph Jozef Johannes Gerardus Anna Maria SMEETS, Gerbrand VAN DER ZOUW
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Publication number: 20130070218Abstract: A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.Type: ApplicationFiled: March 3, 2011Publication date: March 21, 2013Applicant: ASML Netherland B.V.Inventors: Vladimir Vitalevich Ivanov, Pavel Stanislavovich Antsiferov, Yurii Victorovitch Sidelnikov, Luigi Scaccabarozzi, Hendrik Antony Johannes Neerhof, Andrei Mikhailovich Yakunin, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Richard Joseph Bruls
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Patent number: 7872244Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.Type: GrantFiled: August 8, 2007Date of Patent: January 18, 2011Assignee: ASML Netherlands B.V.Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev
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Publication number: 20090040492Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.Type: ApplicationFiled: August 8, 2007Publication date: February 12, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev
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Patent number: 6933510Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.Type: GrantFiled: September 30, 2003Date of Patent: August 23, 2005Assignee: ASML Netherlands B.V.Inventors: Givi Georgievitch Zukavishvili, Vladimir Vital'Evitch Ivanov, Konstantin Nikolaevitch Koshelev, Evgenil Dmitreevitch Korob, Vadim Yevgenyevich Banine, Pavel Stanislavovich Antsiferov
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Publication number: 20040141165Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.Type: ApplicationFiled: September 30, 2003Publication date: July 22, 2004Applicant: ASML Netherlands B.V.Inventors: Givi Georgievitch Zukavishvili, Vladimir Vital?apos;Evitch Ivanov, Konstantin Nikolaevitch Koshelev, Evgenil Dmitreevitch Korob, Vadim Yevgenyevich Banine, Pavel Stanislavovich Antsiferov