Patents by Inventor Peng Ren

Peng Ren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180254727
    Abstract: A method of realizing single direction chaotic rotation speed of permanent magnet synchronous motor is provided powered by a three-phase full-bridge inverter.
    Type: Application
    Filed: February 4, 2016
    Publication date: September 6, 2018
    Applicant: XI'AN UNIVERSITY OF TECHNOLOGY
    Inventor: Hai-Peng REN
  • Patent number: 10019480
    Abstract: Tuning a production database system through the use of a remote mimic. In response to receipt of a query tuning request against a database system, information about that system is obtained and a mimic of the system is set up in a remote system environment. The mimic aims to imitate the database system in all relevant ways with respect to the tuning request. A tuning analysis is then performed on this mimic system such that there is substantially no impact to operations of the original database system. Tuning results are then applied to the original database system. The entire process takes place with little or no human intervention.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: July 10, 2018
    Assignee: International Business Machines Corporation
    Inventors: Steven M. Chamberlin, Ting Y. Leung, Kevin H. Low, Kun Peng Ren, Chi Man J. Sizto, Daniel C. Zilio
  • Publication number: 20180165803
    Abstract: Methods and system for detecting hotspots in semiconductor wafer are provided. At least one semiconductor wafer is inspected to detect a plurality of hotspots of each die in the semiconductor wafer, wherein each of the hotspots has defect coordinates in a layout of the die. The hotspots of the dies are stacked in the layout according to the defect coordinates of the hotspots. A common pattern is obtained according to the stacked hotspots corresponding to a location with specific coordinates in the layout. It is determined whether the common pattern is a known pattern having an individual identification (ID) code. A new ID code is assigned to the common pattern when the common pattern is an unknown pattern.
    Type: Application
    Filed: December 14, 2016
    Publication date: June 14, 2018
    Inventors: Wen-Hao CHENG, Peng-Ren CHEN, Chih-Chiang TU
  • Patent number: 9996582
    Abstract: Tuning a production database system through the use of a remote mimic. In response to receipt of a query tuning request against a database system, information about that system is obtained and a mimic of the system is set up in a remote system environment. The mimic aims to imitate the database system in all relevant ways with respect to the tuning request. A tuning analysis is then performed on this mimic system such that there is substantially no impact to operations of the original database system. Tuning results are then applied to the original database system. The entire process takes place with little or no human intervention.
    Type: Grant
    Filed: June 4, 2015
    Date of Patent: June 12, 2018
    Assignee: International Business Machines Corporation
    Inventors: Steven M. Chamberlin, Ting Y. Leung, Kevin H. Low, Kun Peng Ren, Chi Man J. Sizto, Daniel C. Zilio
  • Publication number: 20170314802
    Abstract: A method for controlling an air conditioner outdoor unit comprises: acquiring the working mode of the air conditioner outdoor unit; acquiring sensor parameters of the air conditioner outdoor unit according to the working mode, the sensor parameters including wind direction parameters read by a wind direction sensor (163) or temperature parameters read by a temperature sensor (161); determining control parameters for the air conditioner outdoor unit by the working mode and the sensor parameters corresponding to the working mode; driving the rotating speed of a fan (121) and the rotating angle of a wind direction adjusting device (125) by use of the control parameters. In addition, a control system for the air conditioner outdoor unit is also related to.
    Type: Application
    Filed: August 21, 2015
    Publication date: November 2, 2017
    Inventors: Xuefen ZHANG, Zhigang ZHAO, Peng REN, Shiyong JIANG, Keqin LIU, Chongyang FENG, Jinrong YUAN, Yingyi JIANG
  • Patent number: 9718682
    Abstract: A method for fabricating a semiconductor structure includes providing a substrate with a first surface and a second surface, wherein at least one soldering pad is formed on the first surface of the substrate. The method also includes forming at least one via to expose each soldering pad by etching the substrate from the second surface, forming a seed layer to cover the second surface of the substrate and the sidewall and the bottom surfaces of each via, and then forming a redistribution metal layer over a portion of the seed layer formed on the sidewall and the bottom surfaces of each via and the second surface of the substrate surrounding each via. The method further includes alternately performing a pre-wetting process and a chemical etching process to completely remove the portion of the seed layer not covered by the redistribution metal layer.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: August 1, 2017
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventor: Peng Ren
  • Publication number: 20170084016
    Abstract: Methods and systems for diagnosing semiconductor wafer are provided. A target image is obtained according to graphic data system (GDS) information of a specific layout in the semiconductor wafer, wherein the target image includes a first contour having a first pattern corresponding to the specific layout. Image-based alignment is performed to capture a raw image from the semiconductor wafer according to the first contour. The semiconductor wafer is analyzed by measuring the raw image, so as to provide a diagnostic result.
    Type: Application
    Filed: September 18, 2015
    Publication date: March 23, 2017
    Inventors: Peng-Ren CHEN, Shiang-Bau WANG, Wen-Hao CHENG, Yung-Jung CHANG, Wei-Chung HU, Yi-An HUANG, Jyun-Hong CHEN
  • Publication number: 20170029272
    Abstract: A method for fabricating a semiconductor structure includes providing a substrate with a first surface and a second surface, wherein at least one soldering pad is formed on the first surface of the substrate. The method also includes forming at least one via to expose each soldering pad by etching the substrate from the second surface, forming a seed layer to cover the second surface of the substrate and the sidewall and the bottom surfaces of each via, and then forming a redistribution metal layer over a portion of the seed layer formed on the sidewall and the bottom surfaces of each via and the second surface of the substrate surrounding each via. The method further includes alternately performing a pre-wetting process and a chemical etching process to completely remove the portion of the seed layer not covered by the redistribution metal layer.
    Type: Application
    Filed: July 28, 2016
    Publication date: February 2, 2017
    Inventor: PENG REN
  • Publication number: 20160140177
    Abstract: Tuning a production database system through the use of a remote mimic. In response to receipt of a query tuning request against a database system, information about that system is obtained and a mimic of the system is set up in a remote system environment. The mimic aims to imitate the database system in all relevant ways with respect to the tuning request. A tuning analysis is then performed on this mimic system such that there is substantially no impact to operations of the original database system. Tuning results are then applied to the original database system. The entire process takes place with little or no human intervention.
    Type: Application
    Filed: June 4, 2015
    Publication date: May 19, 2016
    Inventors: Steven M. Chamberlin, Ting Y. Leung, Kevin H. Low, Kun Peng Ren, Chi Man J. Sizto, Daniel C. Zilio
  • Publication number: 20160140176
    Abstract: Tuning a production database system through the use of a remote mimic. In response to receipt of a query tuning request against a database system, information about that system is obtained and a mimic of the system is set up in a remote system environment. The mimic aims to imitate the database system in all relevant ways with respect to the tuning request. A tuning analysis is then performed on this mimic system such that there is substantially no impact to operations of the original database system. Tuning results are then applied to the original database system. The entire process takes place with little or no human intervention.
    Type: Application
    Filed: November 14, 2014
    Publication date: May 19, 2016
    Inventors: Steven M. Chamberlin, Ting Y. Leung, Kevin H. Low, Kun Peng Ren, Chi Man J. Sizto, Daniel C. Zilio
  • Patent number: 9169258
    Abstract: The present invention provides a doripenem intermediate compound shown by formula (XIV), wherein PNB is p-nitrobenzyl, and HX is an acid; and when HX is a monobasic acid, n=1; and when HX is a polybasic acid, n=2. The present invention also provides a process for preparing the doripenem intermediate compound (XIV). In addition, the present invention provides a process for preparing doripenem (I) from the doripenem intermediate compound (XIV) in a simple manner, with a high yield and low production costs. The new mono-protected doripenem intermediate compound provided in the present invention contains only one protecting group, reducing the difficulty and complexity in the subsequent de-protection step by catalytic hydrogenation, increasing the yield of the catalytic hydrogenation reaction, and thus reducing the production cost of the final product. The process is easy to operate and suitable for industrialized production.
    Type: Grant
    Filed: September 26, 2012
    Date of Patent: October 27, 2015
    Assignee: Shenzhen Haibin Pharmaceutical Co., Ltd.
    Inventors: Lisong Long, Zhaoqiang Lu, Cheng Ding, Guangcheng Li, Zhili Lv, Congquan Wu, Yanjun Zhang, Peng Ren
  • Patent number: 9136092
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having a main feature; performing an optical proximity correction (OPC) process to the design layout; and thereafter, performing a jog reduction process to the design layout such that jog features of the design layout are reduced.
    Type: Grant
    Filed: April 9, 2012
    Date of Patent: September 15, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Ta Lu, Jia-Guei Jou, Yi-Hsien Chen, Peng-Ren Chen, Dong-Hsu Cheng
  • Publication number: 20150243845
    Abstract: A light-emitting element comprises a light-emitting stacked structure. The light-emitting stacked structure comprises a first type semiconductor layer; an active layer on the first type semiconductor layer; a second type semiconductor layer on the active layer; and a superlattice structure between the active layer and the second type semiconductor layer, comprising a first doped nitride layer and a first undoped nitride layer on the first doped nitride layer.
    Type: Application
    Filed: February 26, 2014
    Publication date: August 27, 2015
    Applicant: EPISTAR CORPORATION
    Inventors: Peng-Ren CHEN, Wen-Ming TSAO, Chih-Chun KE
  • Publication number: 20150038700
    Abstract: The present invention provides a doripenem intermediate compound shown by formula (XIV), wherein PNB is p-nitrobenzyl, and HX is an acid; and when HX is a monobasic acid, n=1; and when HX is a polybasic acid, n=2. The present invention also provides a process for preparing the doripenem intermediate compound (XIV). In addition, the present invention provides a process for preparing doripenem (I) from the doripenem intermediate compound (XIV) in a simple manner, with a high yield and low production costs. The new mono-protected doripenem intermediate compound provided in the present invention contains only one protecting group, reducing the difficulty and complexity in the subsequent de-protection step by catalytic hydrogenation, increasing the yield of the catalytic hydrogenation reaction, and thus reducing the production cost of the final product. The process is easy to operate and suitable for industrialized production.
    Type: Application
    Filed: September 26, 2012
    Publication date: February 5, 2015
    Inventors: Lisong Long, Zhaoqiang Lu, Cheng Ding, Guangcheng Li, Zhili Lv, Congquan Wu, Yanjun Zhang, Peng Ren
  • Patent number: 8650511
    Abstract: The present disclosure provides for many different embodiments. A mask fabrication method and system is provided. The method and system identify critical areas of an integrated circuit (IC) design layout that has undergone optical proximity correction. The critical areas are areas of the OPCed IC design layout that are at risk for hot spots. A lithography process check is then performed on the critical areas of the OPCed IC design layout.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: February 11, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Ta Lu, Peng-Ren Chen, Dong-Hsu Cheng, Chang-Jyh Hsieh
  • Patent number: 8645356
    Abstract: An adaptive query execution plan enhancement is provided by: selecting a sample of literal sets from an execution history of a query statement; determining a plurality of access paths by applying each literal set in the sample to the query statement; for each given access path of the plurality of access paths, determining a total execution cost by applying each literal set in the sample to the given access path; and selecting a preferred access path from the plurality of access paths based on the total execution costs for each given access path. A plurality of preferred access paths for a plurality of query statements in an application workload is collected and may be presented as a query execution plan enhancement recommendation to users.
    Type: Grant
    Filed: March 28, 2012
    Date of Patent: February 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Patrick D Bossman, Curt L. Cotner, You-Chin Fuh, Adarsh R. Pannu, Kun Peng Ren
  • Publication number: 20130268901
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having a main feature; performing an optical proximity correction (OPC) process to the design layout; and thereafter, performing a jog reduction process to the design layout such that jog features of the design layout are reduced.
    Type: Application
    Filed: April 9, 2012
    Publication date: October 10, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chi-Ta Lu, Jia-Guei Jou, Yi-Hsien Chen, Peng-Ren Chen, Dong-Hsu Cheng
  • Patent number: 8555211
    Abstract: A method of making a mask includes receiving an IC design layout from a designer, applying an logic operation (LOP) correction, performing an OPC correction, fracturing the modified data into a plurality of main features in an electron beam format, and sending the electron beam format data to a mask writer for a mask fabrication. An XOR operation is implemented into the method to check and verify if a pattern is lost during OPC modification and/or data fracture. A BACKBONE XOR operation is also implemented into the method for a plurality of main features with a critical dimension (CD) size smaller than the max OPC correction to check and verify if a small pattern feature is lost during OPC modification and/or data fracture for 45 nm and beyond semiconductor technologies.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: October 8, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jia-Guei Jou, Kuan-Chi Chen, Peng-Ren Chen, Dong-Hsu Cheng
  • Publication number: 20130262435
    Abstract: An adaptive query execution plan enhancement is provided by: selecting a sample of literal sets from an execution history of a query statement; determining a plurality of access paths by applying each literal set in the sample to the query statement; for each given access path of the plurality of access paths, determining a total execution cost by applying each literal set in the sample to the given access path; and selecting a preferred access path from the plurality of access paths based on the total execution costs for each given access path. A plurality of preferred access paths for a plurality of query statements in an application workload is collected and may be presented as a query execution plan enhancement recommendation to users.
    Type: Application
    Filed: March 28, 2012
    Publication date: October 3, 2013
    Applicant: International Business Machines Corporation
    Inventors: Patrick D. BOSSMAN, Curt L. COTNER, You-Chin FUH, Adarsh S. PANNU, Kun Peng REN
  • Publication number: 20130239072
    Abstract: A method of making a mask includes receiving an IC design layout from a designer, applying an logic operation (LOP) correction, performing an OPC correction, fracturing the modified data into a plurality of main features in an electron beam format, and sending the electron beam format data to a mask writer for a mask fabrication. An XOR operation is implemented into the method to check and verify if a pattern is lost during OPC modification and/or data fracture. A BACKBONE XOR operation is also implemented into the method for a plurality of main features with a critical dimension (CD) size smaller than the max OPC correction to check and verify if a small pattern feature is lost during OPC modification and/or data fracture for 45 nm and beyond semiconductor technologies.
    Type: Application
    Filed: March 9, 2012
    Publication date: September 12, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jia-Guei Jou, Kuan-Chi Chen, Peng-Ren Chen, Dong-Hsu Cheng