Patents by Inventor Peter Paul Hempenius

Peter Paul Hempenius has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240071713
    Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.
    Type: Application
    Filed: December 9, 2021
    Publication date: February 29, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Niels Johannes Maria BOSCH, Xu WANG, Peter Paul HEMPENIUS, Yongqiang WANG, Hans BUTLER, Youjin WANG, Jasper Hendrik GRASMAN, Jianzi SUI, Tianming CHEN, Aimin WU
  • Patent number: 11798777
    Abstract: A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets on a sample. A first portion of the array of beamlets is focused onto a focus plane, and a second portion of the array of beamlets has at least one beamlet with a defocusing level with respect to the focus plane. The charged particle beam apparatus also includes a detector configured to detect an image of the sample formed by the array of beamlets, and a processor configured to estimate a level of separation between the focus plane and the sample based on the detected image and then reduce the level of separation based on the estimated level.
    Type: Grant
    Filed: March 19, 2020
    Date of Patent: October 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Gerardus Maria Johannes Maassen, Peter Paul Hempenius, Weiming Ren, Zhongwei Chen
  • Patent number: 11764030
    Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: September 19, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Hubertus Antonius Van De Rijdt, Peter Paul Hempenius, Allard Eelco Kooiker, Jef Goossens, Petrus Wilhelmus Vleeshouwers
  • Publication number: 20230114067
    Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.
    Type: Application
    Filed: February 4, 2021
    Publication date: April 13, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Long DI, Chenxi FU, Lucas KUINDERSMA, Kuo-Feng TSENG, Peter Paul HEMPENIUS, Yu LIU, Ying LUO
  • Patent number: 11621142
    Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
    Type: Grant
    Filed: August 12, 2020
    Date of Patent: April 4, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Koenraad Marie Baggen, Peter Paul Hempenius, Maarten Frans Janus Kremers, Robertus Jacobus Theodorus Van Kempen, Sven Antoin Johan Hol, Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Niels Johannes Maria Bosch, Maarten Hartger Kimman
  • Patent number: 11315752
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Grant
    Filed: December 10, 2020
    Date of Patent: April 26, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
  • Patent number: 11302512
    Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Koenraad Marie Baggen, Antonius Henricus Arends, Lucas Kuindersma, Johannes Hubertus Antonius Van De Rijdt, Peter Paul Hempenius, Robertus Jacobus Theodorus Van Kempen, Niels Johannes Maria Bosch, Henricus Martinus Johannes Van De Groes, Kuo-Feng Tseng, Hans Butler, Michael Johannes Christiaan Ronde
  • Publication number: 20210151282
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Application
    Filed: December 10, 2020
    Publication date: May 20, 2021
    Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN
  • Patent number: 10867770
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: December 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
  • Publication number: 20200373118
    Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
    Type: Application
    Filed: August 12, 2020
    Publication date: November 26, 2020
    Inventors: Marcel Koenraad Marie BAGGEN, Peter Paul HEMPENIUS, Maarten Frans Janus KREMERS, Robertus Jacobus Theodorus VAN KEMPEN, Sven Antoin Johan HOL, Henricus Martinus Johannes VAN DE GROES, Johannes Hubertus Antonius VAN DE RIJDT, Niels Johannes Maria BOSCH, Maarten Hartger KIMMAN
  • Patent number: 10809634
    Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: October 20, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Hempenius, Marcel Koenraad Marie Baggen, Thomas Jan De Hoog, Sinar Juliana, Henricus Martinus Johannes Van De Groes
  • Publication number: 20200303158
    Abstract: The invention relates to a particle beam apparatus comprising: a particle beam source configured to generate a particle beam; a magnetic coil configured to emit a magnetic field to manipulate the particle beam; an object table configured to hold a substrate; a positioning device comprising ferromagnetic material, the positioning device further comprising at least one motor configured to position the object table with respect to the particle beam; and a controller configured to provide a control signal to the at least one motor to at least partly compensate for a magnetic force induced by the magnetic field acting on the positioning device.
    Type: Application
    Filed: May 8, 2020
    Publication date: September 24, 2020
    Inventors: Niels Johannes Maria Bosch, Peter Paul Hempenius, Sven Antoin Johan HOL, Marcel Koenrood Marie Baggen
  • Publication number: 20200286707
    Abstract: A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets on a sample. A first portion of the array of beamlets is focused onto a focus plane, and a second portion of the array of beamlets has at least one beamlet with a defocusing level with respect to the focus plane. The charged particle beam apparatus also includes a detector configured to detect an image of the sample formed by the array of beamlets, and a processor configured to estimate a level of separation between the focus plane and the sample based on the detected image and then reduce the level of separation based on the estimated level.
    Type: Application
    Filed: March 19, 2020
    Publication date: September 10, 2020
    Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Peter Paul HEMPENIUS, Weiming REN, Zhongwei CHEN
  • Publication number: 20200203118
    Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Inventors: Marcel Koenraad Marie BAGGEN, Antonius Henricus ARENDS, Lucas KUINDERSMA, Johannes Hubertus, Antonius VAN DE RIJDT, Peter Paul HEMPENIUS, Robertus Jacobus, Theodorus VAN KEMPEN, Niels Johannes, Maria BOSCH, Henricus Martinus, Johannes VAN DE GROES, Kuo-Feng TSENG, Hans BUTLER, Michael Johannes, Christiaan RONDE
  • Publication number: 20200194222
    Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.
    Type: Application
    Filed: December 13, 2019
    Publication date: June 18, 2020
    Inventors: Johannes Hubertus Antonius VAN DE RIJDT, Peter Paul HEMPENIUS, Allard Eelco KOOIKER, Jef GOOSSENS, Petrus Wilhelmus VLEESHOUWERS
  • Publication number: 20190341224
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Application
    Filed: May 2, 2019
    Publication date: November 7, 2019
    Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN
  • Patent number: 10191396
    Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.
    Type: Grant
    Filed: May 21, 2015
    Date of Patent: January 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Paul Corné Henri De Wit, Stijn Willem Boere, Youssef Karel Maria De Vos, Peter Paul Hempenius, Nicolaas Rudolf Kemper, Robertus Mathijs Gerardus Rijs, Frits Van Der Meulen
  • Publication number: 20180267410
    Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.
    Type: Application
    Filed: March 14, 2018
    Publication date: September 20, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Peter Paul HEMPENIUS, Marcel Koenraad Marie BAGGEN, Thomas Jan DE HOOG, Sinar JULIANA, Henricus Martinus Johannes VAN DE GROES
  • Publication number: 20180149986
    Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.
    Type: Application
    Filed: May 21, 2015
    Publication date: May 31, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul Corné Henri DE WIT, Stijn Willem BOERE, Youssef Karel Maria DE VOS, Peter Paul HEMPENIUS, Nicolaas Rudolf KEMPER, Robertus Mathijs Gerardus RIJS, Frits VAN DER MEULEN
  • Patent number: 9946172
    Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: April 17, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Peter Paul Hempenius, Martijn Houben, Nicolaas Rudolf Kemper, Robertus Mathijs Gerardus Rijs, Paul Corné Henri De Wit, Stijn Willem Boere, Youssef Karel Maria De Vos, Frits Van Der Meulen