Patents by Inventor Pierre Leroux

Pierre Leroux has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10556867
    Abstract: The present invention relates to a novel process for preparing 3-fluoroalkyl-5-pyrazolecarboxylates from ketimines and oxalic acid derivatives which can be further transformed into 3-fluoroalkyl-5-pyrazolecarboxylic acids.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: February 11, 2020
    Assignees: BAYER CROPSCIENCE AKTIENGESELLSCHAFT, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
    Inventors: Sergii Pazenok, Jean-Pierre Vors, Frédéric R. LeRoux, Etienne Schmitt
  • Publication number: 20190323948
    Abstract: A detection of the Gram type of a bacterial strain includes: illumination, in the wavelength range 415 nm-440 nm, of at least one bacterium of said strain having a natural electromagnetic response in said range; acquisition, in the range 415 nm-440 nm, of a light intensity reflected by, or transmitted through, said illuminated bacterium; and determination of the Gram type of the bacterial strain as a function of the light intensity acquired in the range 415 nm-440 nm.
    Type: Application
    Filed: June 13, 2017
    Publication date: October 24, 2019
    Applicant: bioMérieux
    Inventors: Denis LEROUX, Eric LALOUM, Pierre MAHE, Rony MIDAHUEN, Philippine BARLAS
  • Publication number: 20190225586
    Abstract: The present invention relates to a novel process for preparing 3-fluoroalkyl-5-pyrazolecarboxylates from ketimines and oxalic acid derivatives which can be further transformed into 3-fluoroalkyl-5-pyrazolecarboxylic acids.
    Type: Application
    Filed: September 18, 2017
    Publication date: July 25, 2019
    Applicants: BAYER CROPSCIENCE AKTIENGESELLSCHAFT, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
    Inventors: Sergii PAZENOK, Jean-Pierre VORS, Frédéric R. LEROUX, Etienne SCHMITT
  • Patent number: 10274312
    Abstract: A system and device that measures a specimen's surface profile by passing a bright white light source through a series of lenses which generate repeatable chromatic focal shift variations of wavelengths of white light for Z axis measurements. The movement of the sensor along an X-Y raster pattern is controlled by a X-directional and Y-directional scanner used in combination with X and Y actuators. The system and device translate the chromatic focal shifts into digital data which may then be used to both control the position of the lenses along the surface of the specimen and generate a 3D topographical images of the specimens being profiled.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: April 30, 2019
    Assignee: Nanovea, Inc.
    Inventors: Pierre Leroux, Fernando Valenzuela, Curt Deckert
  • Publication number: 20180364031
    Abstract: A system and device that measures a specimen's surface profile by passing a bright white light source through a series of lenses which generate repeatable chromatic focal shift variations of wavelengths of white light for Z axis measurements. The movement of the sensor along an X-Y raster pattern is controlled by a X-directional and Y-directional scanner used in combination with X and Y actuators. The system and device translate the chromatic focal shifts into digital data which may then be used to both control the position of the lenses along the surface of the specimen and generate a 3D topographical images of the specimens being profiled.
    Type: Application
    Filed: August 22, 2018
    Publication date: December 20, 2018
    Inventors: Pierre Leroux, Fernando Valenzuela, Curt Deckert
  • Publication number: 20170014097
    Abstract: A catheter includes a hollow body which extends longitudinally and has at least one first side window and a probe emitting a wave beam, the first side window allowing the radiation of the beam in a region next to the catheter for generating imaging, the catheter also including a longitudinal guiding device allowing a transmission of a movement to an intervention element, the intervention element moving in at least an area of the beam, the intervention angle between the first intervention element and the axis of the catheter being controlled by a remote control system.
    Type: Application
    Filed: January 22, 2015
    Publication date: January 19, 2017
    Inventors: Louis Marc Jean Lucien Labrousse, Lionel Jean Pierre Leroux
  • Publication number: 20160334315
    Abstract: A method for automated parameter and selection testing based on known characteristics of the sample being tested. The method may utilize a software interface that proposes testing parameters based on the characteristics of the sample. The software interface may first guide the client through a series of questions or prompts, specifying the sample under test and may inquire information such as: the type of material, thickness, type of coating, and roughness level. The user may then decide what type of test to perform and the type of indenter from the list prescribed by executable instructions. In various embodiments, the method may, based on the indenter chosen, include a preliminary test to evaluate the depth versus load measurements or maximum load, so that the parameters may be adjusted for the primary test.
    Type: Application
    Filed: May 12, 2015
    Publication date: November 17, 2016
    Inventors: Pierre Leroux, Fernando Valenzuela
  • Publication number: 20160282249
    Abstract: A method for calculating an indenter area function and quantifying a deviation from the ideal shape of an indenter. The method preferably comprises the steps of: (1) providing a material testing apparatus, an indenter, and a sample; (2) performing one (or very few indentation tests) across a range of loads by applying the indenter to the sample; (3) collecting load data; (4) calculating Martens hardness data (5) normalizing the depth data and Martens hardness data; and (6) analyzing the load data to detect the amount of deviation in the indenter's area function. Preferably, when applying the indenter to the sample, the loading rate will be performed very slowly at low loads. The loading rate will then preferably accelerate as the load increases. This will generally allow the load application tester to produce repeatable data at low loads and a full range test in a reasonably short time.
    Type: Application
    Filed: March 26, 2015
    Publication date: September 29, 2016
    Inventors: Pierre Leroux, Fernando Valenzuela
  • Publication number: 20140298897
    Abstract: The present invention is a nano wear testing apparatus, which preferably includes a linear motor, nano module assembly, piezoelectric member, load cell, tip mounting shaft, stage, and speaker coil. The linear motor preferably repositions the nano module assembly in close contact to the surface of a test sample, which is generally attached to the stage. The piezoelectric member moves the load cell and tip mounting shaft near the surface of the sample, and the load cell detects a contact load defined in the software application. The piezoelectric member continues to increase the load until the predetermined load for the test is reached. Once reached, the speaker coils shifts the stage at a frequency and stroke length set in the software application. During the test, the load cell and piezoelectric table continuously adjusts to keep a constant load during the test. Once the test is finished, the speaker coil stops and the load is then removed. Generally, load and depth data is recorded during the test.
    Type: Application
    Filed: April 9, 2013
    Publication date: October 9, 2014
    Applicant: Nanovea, Inc.
    Inventors: Pierre Leroux, Fernando Valenzuela, Timothy Palermo, Jeffrey Tomita
  • Patent number: 8281648
    Abstract: A non-contact sensor is attached to the indenting module with its working range encompassing the tip of the indenter. The sensor directly measures penetration depth of the indenter during scratch, wear or instrumented hardness testing. During the test, the non-contact sensor records the height of the surface as the indenter penetrates the surface of the testing specimen.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: October 9, 2012
    Assignee: Nanovea, Inc.
    Inventor: Pierre Leroux
  • Patent number: 7868473
    Abstract: A method for determining the centroid of a wafer target. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a target set formed therein. Next, a signal is passed over the target set and over a material separating target shapes in the target set. Then a return signal is reflected, and received, from the surface of the target shapes and the material separating them. A location of at least one maxima point of the return signal is identified. Finally, a centroid is determined as the median of the locations of at least one maxima point.
    Type: Grant
    Filed: April 12, 2005
    Date of Patent: January 11, 2011
    Assignee: NXP B.V.
    Inventors: Bryan Hubbard, Pierre Leroux
  • Patent number: 7709166
    Abstract: In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a method for determining the effect of flare on line shortening. The method comprises, at a first die position on the substrate and in a first exposure, printing a first mask that includes a flare pattern corresponding to one corner of the first mask, and in a second exposure, printing a second mask that includes another flare pattern corresponding to an opposite corner of the second mask. At a second die position on the substrate, a composite mask pattern based on features of the first mask and the second is printed. The printed patterns are developed and measurements are obtained therefrom. The effect of flare is determined as a function of the measurements.
    Type: Grant
    Filed: May 12, 2009
    Date of Patent: May 4, 2010
    Assignee: NXP B.V.
    Inventors: David Ziger, Pierre Leroux
  • Publication number: 20090220870
    Abstract: In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a method for determining the effect of flare on line shortening. The method comprises, at a first die position on the substrate and in a first exposure, printing a first mask that includes a flare pattern corresponding to one corner of the first mask, and in a second exposure, printing a second mask that includes another flare pattern corresponding to an opposite corner of the second mask. At a second die position on the substrate, a composite mask pattern based on features of the first mask and the second is printed. The printed patterns are developed and measurements are obtained therefrom. The effect of flare is determined as a function of the measurements.
    Type: Application
    Filed: May 12, 2009
    Publication date: September 3, 2009
    Inventors: DAVID ZIGER, PIERRE LEROUX
  • Patent number: 7556900
    Abstract: In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a method (600) for determining the effect of flare on line shortening. The method (600) comprises, at a first die position on the substrate and in a first exposure, printing a first mask (610) that includes a flare pattern (110) corresponding to one corner of the first mask (610), and in a second exposure, printing a second mask (620) that includes another flare pattern corresponding to an opposite corner of the second mask. At a second die position on the substrate, a composite mask pattern (630) based on features of the first mask and the second is printed. The printed patterns (640) are developed and measurements (650) are obtained therefrom. The effect of flare (660) is determined as a function of the measurements.
    Type: Grant
    Filed: July 31, 2004
    Date of Patent: July 7, 2009
    Assignee: NXP B.V.
    Inventors: David Ziger, Pierre Leroux
  • Patent number: 7556893
    Abstract: A system and method for fabricating integrated circuits using four fine alignment targets per stepper shot. The four alignment targets are disposed within the scribe line on each side of a four-sided stepper shot. The targets on opposites sides of the region are located in mirror-image positions. For example, in a square or rectangular region, the targets could be at the mid-point of each side, or at each corner. Because the scribe lines for adjoining stepper shots overlap, a target in one shot will overlay a target from a preceding shot. In a positive resist process, for example, the target resulting from the overlay will be reduced in size by an amount corresponding to the amount of rotational error, if any. However, the target will still indicate the center of the stepper shot, thereby compensating for the rotational error with no further measurements.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: July 7, 2009
    Assignee: NXP, B.V.
    Inventor: Pierre Leroux
  • Publication number: 20090158826
    Abstract: A non-contact sensor is attached to the indenting module with its working range encompassing the tip of the indenter. The sensor directly measures penetration depth of the indenter during scratch, wear or instrumented hardness testing. During the test, the non-contact sensor records the height of the surface as the indenter penetrates the surface of the testing specimen.
    Type: Application
    Filed: December 17, 2008
    Publication date: June 25, 2009
    Applicant: Micro Photonics, Inc.
    Inventor: Pierre Leroux
  • Patent number: 7442474
    Abstract: A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a first pattern and an error-free fine alignment target, in the stepper. In another step, the wafer is aligned in the stepper using the error-free fine alignment target. Then a second pattern is created on the wafer overlaying said first pattern. In another step, the rotational error portion of the total misalignment error is determined by measuring the circumferential misalignment between the first pattern and the second pattern.
    Type: Grant
    Filed: April 29, 2005
    Date of Patent: October 28, 2008
    Assignee: NXP B.V.
    Inventor: Pierre Leroux
  • Patent number: 7332255
    Abstract: The present invention enables the user to measure process line shortening (PLS) on an overlay tool. In an example embodiment (900), to obtain the PLS, the user applies a method to determine the misalignment (MA) of a composite image on a substrate (940a), from the composite image the user may determine the total line (940b) shortening (TLS) and the equipment line (940c) shortening (ELS). The process line shortening (PLS) is determined (940d) as a function of TLS and ELS.
    Type: Grant
    Filed: May 7, 2004
    Date of Patent: February 19, 2008
    Assignee: NXP B.V.
    Inventors: Yuji Yamaguchi, Pierre Leroux
  • Publication number: 20060210885
    Abstract: In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a method (600) for determining the effect of flare on line shortening. The method (600) comprises, at a first die position on the substrate and in a first exposure, printing a first mask (610) that includes a flare pattern (110) corresponding to one corner of the first mask (610), and in a second exposure, printing a second mask (620) that includes another flare pattern corresponding to an opposite corner of the second mask. At a second die position on the substrate, a composite mask pattern (630) based on features of the first mask and the second is printed. The printed patterns (640) are developed and measurements (650) are obtained therefrom. The effect of flare (660) is determined as a function of the measurements.
    Type: Application
    Filed: July 31, 2004
    Publication date: September 21, 2006
    Inventors: David Ziger, Pierre Leroux
  • Publication number: 20060192302
    Abstract: A system and method for fabricating integrated circuits using four fine alignment targets per stepper shot. The four alignment targets are disposed within the scribe line on each side of a four-sided stepper shot. The targets on opposites sides of the region are located in mirror-image positions. For example, in a square or rectangular region, the targets could be at the mid-point of each side, or at each corner. Because the scribe lines for adjoining stepper shots overlap, a target in one shot will overlay a target from a preceding shot. In a positive resist process, for example, the target resulting from the overlay will be reduced in size by an amount corresponding to the amount of rotational error, if any. However, the target will still indicate the center of the stepper shot, thereby compensating for the rotational error with no further measurements.
    Type: Application
    Filed: April 26, 2006
    Publication date: August 31, 2006
    Inventor: Pierre Leroux