Abstract: A plasma activated biochar filter is provided. In another aspect, Fluorine-based reactive gas is used in a plasma reactor to activate biochar. A further aspect employs a substrate flocked with plasma activated biochar. Yet another aspect employs plasma activated and fluorinated biochar on a porous substrate to act as an oil-fluid separating filter.

Abstract: An organic compound destruction apparatus and method are provided. In another aspect, a laterally oriented discharge arc generated from an electrode in a reactor, destroys an undesired or contaminant organic molecule in a liquid solution. Another aspect includes a system which uses electrodes and a magnetic field to generate and drive laterally oriented discharge arcs in a reactor to destroy organic compounds, such as PFAS molecules, in a liquid. Another aspect includes using at least one pair of co-axial electrodes submerged in a liquid to concentrate organic contaminants around the center electrode where gas bubbles are generated to capture and transport the contaminants to the plasma region above the liquid surface. Still another aspect includes a system which uses a grid or mesh electrode to create a discharge arc in a plasma chamber to destroy organic compounds, such as PFAS molecules, in a liquid.

Abstract: A magnetic-field-assisted plasma coating system and method are provided. In another aspect, a coating system employs a cathode with a linearly moveable magnetic field. A further aspect employs a workpiece as an anode within which is located an elongated cathode which internally coats a bore of the workpiece. Still another aspect of the present system and method employs an elongated and hollow cathode with at least one magnetic source therein. In yet another aspect, end caps or plates seal against one or more open ends of a workpiece bore to be coated, with a cathode inserted into the bore and a vacuum being created within the bore such that the workpiece itself defines at least a portion of a vacuum chamber.

Abstract: A rotary plasma reactor system is provided. In another aspect, a plasma reactor is rotatable about a generally horizontal axis within a vacuum chamber. A further aspect employs a plasma reactor, a vacuum chamber, and an elongated electrode internally extending within a central area of the reactor. Yet another aspect employs a plasma reactor for use in activating, etching and/or coating tumbling workpiece material.

Abstract: A single beam plasma or ion source apparatus, including multiple and different power sources, is provided. An aspect of the present apparatus and method employs simultaneous excitation of an ion source by DC and AC, or DC and RF power supplies. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape.

Abstract: An electrode apparatus and method remove a polarized molecule in a fluid. In another aspect, a non-uniform electric field is created between an anode and a cathode, the fluid flows within a gap between the cathode and the anode, and the polarized molecule is driven by an electrostatic force to and adsorbed on the anode without experiencing a chemical reaction.

Abstract: A vertically oriented plasma reactor is provided. In another aspect, a plasma reactor includes a vertically elongated vacuum chamber, a wall internally projecting within a middle section of the housing, magnets, electrodes and a radio frequency source. A further aspect employs a workpiece-entry port and an opposite workpiece material-exit port, with one located adjacent a top end and the other adjacent a bottom end of a vertically elongated reactor housing or vacuum chamber. Yet another aspect employs a moving or falling-bed plasma reactor for use in activating biochar material.

Abstract: A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.

Abstract: A magnetic-field-assisted plasma coating system and method are provided. In another aspect, a coating system employs a cathode with a linearly moveable magnetic field. A further aspect employs a workpiece as an anode within which is located an elongated cathode which internally coats a bore of the workpiece. Still another aspect of the present system and method employs an elongated and hollow cathode with at least one magnetic source therein. In yet another aspect, end caps or plates seal against one or more open ends of a workpiece bore to be coated, with a cathode inserted into the bore and a vacuum being created within the bore such that the workpiece itself defines at least a portion of a vacuum chamber.

Abstract: A rotary plasma reactor system is provided. In another aspect, a plasma reactor is rotatable about a generally horizontal axis within a vacuum chamber. A further aspect employs a plasma reactor, a vacuum chamber, and an elongated electrode internally extending within a central area of the reactor. Yet another aspect employs a plasma reactor for use in activating, etching and/or coating tumbling workpiece material.

Abstract: A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.

Abstract: A material processing apparatus includes a vacuum chamber, an electrically grounded shield and/or workpiece, multiple radio frequency-powered electrodes within the vacuum chamber, magnets, and a gas inlet operable to flow a precursor gas to a plasma area located between the electrodes. In another aspect, magnets and spaced apart radio frequency-powered electrodes are operable to create a magnetic field and a radio frequency field within a plasma, which causes a plasma enhanced chemical vapor deposition of coating material onto a workpiece or substrate within a vacuum chamber.

Abstract: A method, system and equipment (31) for activating biochar (29) includes flowing a reactive gas into a chamber (33; 305), using an electrical field to create a plasma (75) in the chamber, using a magnetic field (105) to increase density of the plasma and activating biochar with the plasma in the chamber. Use of inductive magnetic coil(s) (131) with an essentially closed loop magnetic field, and/or a permanent magnet(s) (101; 317) are also provided in a further aspect of the present method and apparatus. Another aspect causes magnetic densification of one or multiple plasmas in a chamber (305) to treat a previously produced layer of thin film (303).

Abstract: A method for using plasma to activate biochar is disclosed where reactive gas(es) are excited by external power; biochar set on a sample holder is electrically biased or set at a floating potential so that charged particles of a certain type are attracted to the biochar, leading to intensive chemical reactions.

Abstract: A method for using plasma to activate biochar is disclosed where reactive gas(es) are excited by external power; biochar set on a sample holder is electrically biased or set at a floating potential so that charged particles of a certain type are attracted to the biochar, leading to intensive chemical reactions.

Abstract: The present invention describes a non-aqueous organic solution for Electrophoretic Deposition (EPD) of nanoparticles onto thin films, including method of using said non-aqueous organic solution and EPD to produce films containing such nanoparticles for use in LED devices, Li ion batteries, as solar absorbers, and as thin film transistors.

Abstract: Disclosed are methods for forming nanoparticle films using electrophoretic deposition. The methods comprise exposing a substrate to a solution, the solution comprising substantially dispersed nanoparticles, an organic solvent, and a polymer characterized by a backbone comprising Si—O groups. The methods further comprise applying an electric field to the solution, whereby a nanoparticle film is deposited on the substrate. Suitable polymers include polysiloxanes, polysilsesquioxanes and polysilicates. Coated glass windows and methods of forming the coated glass windows using the solutions are also disclosed.

Abstract: A system for reducing damage to solar cells during a process for depositing a conductive material on a solar cell is disclosed where an electrical bias or floating potential is applied to the solar cell; and/or an electrical bias is applied to an external electrode(s) so that charged particles of a certain type are redirected away from the solar cells, avoiding the creation of a sufficiently high reverse bias on the solar cell to breakdown the cell.

Abstract: The present invention discloses a novel rectangular sputtering magnetron cathode that significantly improves target utilization and sputtering efficiency. Different from conventional magnatron design that considers only magnetic field distribution and is, therefore, qualitive or empirical, the present magnetron cathode is developed through computer-aided simulation of plasma discharge. The magnetic and electric fields are optimized in a combined manner by quantitatively simulating electron trajectories, electron/Ar collisions, space charge distribution, and target erosion profile. Sputtering tests with Cu target show a target utilization of 55%˜65%, much higher than conventional target utilization which is about 40%. Meanwhile, high sputtering efficiency is achieved by maintaining a relatively strong magnetic field over the surface of the target, which can be thicker than 12 mm, as a result of effective confinement of high-energy electrons.

Abstract: The present invention discloses a novel rectangular sputtering magnetron cathode that significantly improves target utilization and sputtering efficiency. Different from conventional magnetron design that considers only magnetic field distribution and is, therefore, qualitative or empirical, the present magnetron cathode is developed through computer-aided simulation of plasma discharge. The magnetic and electric fields are optimized in a combined manner by quantitatively simulating electron trajectories, electron/Ar collisions, space charge distribution, and target erosion profile. Sputtering tests with Cu target show a target utilization of 55%˜65%, much higher than conventional target utilization which is about 40%. Meanwhile, high sputtering efficiency is achieved by maintaining a relatively strong magnetic field over the surface of the target, which can be thicker than 12 mm, as a result of effective confinement of high-energy electrons.