Patents by Inventor Rahul Sen
Rahul Sen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9448763Abstract: A system operates to manage accessibility of media content items based on a user's performance of a repetitive motion activity. The system can generate rule data based on a rule designed to permit access to certain media content items. The rule data can include information about various conditions to be satisfied to make the media content items accessible for playback. Such conditions can be associated with a user's performance or status of a repetitive motion activity.Type: GrantFiled: October 14, 2015Date of Patent: September 20, 2016Assignee: Spotify ABInventors: Dariusz Dziuk, Rahul Sen, Matilda Hannäs, Nikolaos Toumpelis
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Patent number: 9422651Abstract: A method for arranging nanotube elements within nanotube fabric layers and films is disclosed. A directional force is applied over a nanotube fabric layer to render the fabric layer into an ordered network of nanotube elements. That is, a network of nanotube elements drawn together along their sidewalls and substantially oriented in a uniform direction. In some embodiments this directional force is applied by rolling a cylindrical element over the fabric layer. In other embodiments this directional force is applied by passing a rubbing material over the surface of a nanotube fabric layer. In other embodiments this directional force is applied by running a polishing material over the nanotube fabric layer for a predetermined time. Exemplary rolling, rubbing, and polishing apparatuses are also disclosed.Type: GrantFiled: March 30, 2011Date of Patent: August 23, 2016Assignee: Nantero Inc.Inventors: David A. Roberts, Hao-Yu Lin, Thomas R. Bengtson, Thomas Rueckes, Karl Robinson, H. Montgomery Manning, Rahul Sen, Michel Monteiro
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Publication number: 20160190496Abstract: Methods for passivating a nanotube fabric layer within a nanotube switching device to prevent or otherwise limit the encroachment of an adjacent material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous nanotube fabric layer to fill in the voids within the porous nanotube fabric layer while one or more other material layers are applied adjacent to the nanotube fabric layer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the nanotube fabric layer) is used to form a barrier layer within a nanotube fabric layer. In other embodiments, individual nanotube elements are combined with and nanoscopic particles to limit the porosity of a nanotube fabric layer.Type: ApplicationFiled: March 4, 2016Publication date: June 30, 2016Inventors: Thomas RUECKES, H. Montgomery MANNING, Rahul SEN, JR.
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Patent number: 9281185Abstract: Methods for passivating a nanotube fabric layer within a nanotube switching device to prevent or otherwise limit the encroachment of an adjacent material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous nanotube fabric layer to fill in the voids within the porous nanotube fabric layer while one or more other material layers are applied adjacent to the nanotube fabric layer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the nanotube fabric layer) is used to form a barrier layer within a nanotube fabric layer. In other embodiments, individual nanotube elements are combined with and nanoscopic particles to limit the porosity of a nanotube fabric layer.Type: GrantFiled: November 7, 2014Date of Patent: March 8, 2016Assignee: Nantero Inc.Inventors: Thomas Rueckes, H. Montgomery Manning, Rahul Sen
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Publication number: 20150086771Abstract: The present disclosure provides scalable nanotube fabrics and methods for controlling or otherwise adjusting the nanotube length distribution of a nanotube application solution in order to realize scalable nanotube fabrics. In one aspect of the present disclosure, one or more filtering operations are used to remove relatively long nanotube elements from a nanotube solution until nanotube length distribution of the nanotube solution conforms to a preselected or desired nanotube length distribution profile. In another aspect of the present disclosure, a sono-chemical cutting process is used to break up relatively long nanotube elements within a nanotube application solution into relatively short nanotube elements to realize a pre-selected or desired nanotube length distribution profile.Type: ApplicationFiled: September 20, 2013Publication date: March 26, 2015Applicant: NANTERO INC.Inventors: Rahul SEN, Billy SMITH, J. Thomas KOCAB, Ramesh SIVARAJAN, Peter SITES, Thomas RUECKES, David A. ROBERTS
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Publication number: 20150064886Abstract: Methods for passivating a nanotube fabric layer within a nanotube switching device to prevent or otherwise limit the encroachment of an adjacent material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous nanotube fabric layer to fill in the voids within the porous nanotube fabric layer while one or more other material layers are applied adjacent to the nanotube fabric layer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the nanotube fabric layer) is used to form a barrier layer within a nanotube fabric layer. In other embodiments, individual nanotube elements are combined with and nanoscopic particles to limit the porosity of a nanotube fabric layer.Type: ApplicationFiled: November 7, 2014Publication date: March 5, 2015Inventors: Thomas RUECKES, H. Montgomery MANNING, Rahul SEN
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Patent number: 8895950Abstract: Methods for passivating a carbonic nanolayer (that is, material layers comprised of low dimensional carbon structures with delocalized electrons such as carbon nanotubes and nanoscopic graphene flecks) to prevent or otherwise limit the encroachment of another material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous carbonic nanolayer to fill in the voids within the porous carbonic nanolayer while one or more other material layers are applied over or alongside the carbonic nanolayer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the carbonic nanolayer) is used to form a barrier layer within a carbonic nanolayer. In other embodiments, carbon structures are combined with and nanoscopic particles to limit the porosity of a carbonic nanolayer.Type: GrantFiled: September 6, 2013Date of Patent: November 25, 2014Assignee: Nantero Inc.Inventors: Thomas Rueckes, H. Montgomery Manning, Rahul Sen
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Publication number: 20140329430Abstract: The present disclosure provides methods for removing defects nanotube application solutions and providing low defect, highly uniform nanotube fabrics. In one aspect, a degassing process is performed on a suspension of nanotubes to remove air bubbles present in the solution. In another aspect, a continuous flow centrifugation (CFC) process is used to remove small scale defects from the solution. In another aspect, a depth filter is used to remove large scale defects from the solution. According to the present disclosure, these three methods can be used alone or combined to realize a low defect nanotube application solutions and fabrics.Type: ApplicationFiled: April 30, 2014Publication date: November 6, 2014Applicant: Nantero Inc.Inventors: J. Thomas Kocab, Thomas R. Bengtson, Sanjin Hosic, Rahul Sen, Billy Smith, David A. Roberts, Peter Sites
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Patent number: 8771628Abstract: Certain applicator liquids and method of making the applicator liquids are described. The applicator liquids can be used to form nanotube films or fabrics of controlled properties. An applicator liquid for preparation of a nanotube film or fabric includes a controlled concentration of nanotubes dispersed in a liquid medium containing water. The controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity.Type: GrantFiled: November 4, 2009Date of Patent: July 8, 2014Assignee: Nantero Inc.Inventors: Ramesh Sivarajan, Thomas Rueckes, Rahul Sen, Brent M. Segal, Eliodor G. Ghenciu, Jonathan W. Ward, Tzong-Ru T. Han
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Patent number: 8628692Abstract: Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid for formation of a nanotube film includes a liquid medium containing a controlled concentration of purified nanotubes, wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, and wherein the spin-coatable liquid comprises less than 1×1018 atoms/cm3 of metal impurities. The spin-coatable liquid is substantially free of particle impurities having a diameter of greater than about 500 nm.Type: GrantFiled: May 25, 2012Date of Patent: January 14, 2014Assignee: Nantero Inc.Inventors: Rahul Sen, Ramesh Sivarajan, Thomas Rueckes, Brent M. Segal
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Publication number: 20140001433Abstract: Methods for passivating a carbonic nanolayer (that is, material layers comprised of low dimensional carbon structures with delocalized electrons such as carbon nanotubes and nanoscopic graphene flecks) to prevent or otherwise limit the encroachment of another material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous carbonic nanolayer to fill in the voids within the porous carbonic nanolayer while one or more other material layers are applied over or alongside the carbonic nanolayer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the carbonic nanolayer) is used to form a barrier layer within a carbonic nanolayer. In other embodiments, carbon structures are combined with and nanoscopic particles to limit the porosity of a carbonic nanolayer.Type: ApplicationFiled: September 6, 2013Publication date: January 2, 2014Applicant: NANTERO INC.Inventors: Thomas RUECKES, H. Montgomery MANNING, Rahul SEN
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Patent number: 8574673Abstract: Methods for forming anisotropic nanotube fabrics are disclosed. In one aspect, a nanotube application solution is rendered into a nematic state prior to its application over a substrate. In another aspect, a pump and narrow nozzle assembly are employed to realize a flow induced alignment of a plurality of individual nanotube elements as they are deposited onto a substrate element. In another aspect, nanotube adhesion promoter materials are used to form a patterned nanotube application layer, providing narrow channels over which nanotube elements will self align during an application process. Specific dip coating processes which are well suited for aiding in the creation of anisotropic nanotube fabrics are also disclosed.Type: GrantFiled: July 31, 2009Date of Patent: November 5, 2013Assignee: Nantero Inc.Inventors: Thomas Rueckes, Ramesh Sivarajan, Rahul Sen
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Patent number: 8551806Abstract: Methods for passivating a carbonic nanolayer (that is, material layers comprised of low dimensional carbon structures with delocalized electrons such as carbon nanotubes and nano-scopic graphene flecks) to prevent or otherwise limit the encroachment of another material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous carbonic nanolayer to fill in the voids within the porous carbonic nanolayer while one or more other material layers are applied over or alongside the carbonic nanolayer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the carbonic nanolayer) is used to form a barrier layer within a carbonic nanolayer. In other embodiments, carbon structures are combined with and nanoscopic particles to limit the porosity of a carbonic nanolayer.Type: GrantFiled: October 22, 2010Date of Patent: October 8, 2013Assignee: Nantero Inc.Inventors: Thomas Rueckes, H. Montgomery Manning, Rahul Sen
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Publication number: 20130243954Abstract: Solutions of carbon nanotubes and methods for purifying the solutions are provided. The methods include mixing, for example, at least one complexing agents, at least one ionic species, and/or at least one buffer oxide etch (BOE) with a liquid medium containing carbon nanotubes and different types of contaminants, such as metal impurities, amorphous carbon, and/or silica particles, and performing a filtration process to the liquid medium so as to remove or reduce the contaminants in the liquid medium. As a result, carbon nanotube solutions of low contaminants are produced. In some embodiments, the solutions of this disclosure include a high concentration of carbon nanotubes and are substantially free from metal, amorphous carbon, and/or silica impurities.Type: ApplicationFiled: September 20, 2011Publication date: September 19, 2013Applicant: Nantero Inc.Inventors: David A. Roberts, Rahul Sen, J. Thomas Kocab, Billy Smith, Feng Gu
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Publication number: 20130224934Abstract: The present disclosure provides a nanotube solution being treated with a molecular additive, a nanotube film having enhanced adhesion property due to the treatment of the molecular additive, and methods for forming the nanotube solution and the nanotube film. The nanotube solution includes a liquid medium, nanotubes in the liquid medium, and a molecular additive in the liquid medium, wherein the molecular additive includes molecules that provide source elements for forming a group IV oxide within the nanotube solution. The molecular additive can introduce silicon (Si) and/or germanium (Ge) in the liquid medium, such that nominal silicon and/or germanium concentrations of the nanotube solution ranges from about 5 ppm to about 60 ppm.Type: ApplicationFiled: March 9, 2012Publication date: August 29, 2013Applicant: NANTERO INC.Inventors: David A. ROBERTS, Rahul SEN, Peter SITES, J. Thomas KOCAB, Billy Smith, Feng GU
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Publication number: 20130052449Abstract: A method for controlling density, porosity and/or gap size within a nanotube fabric layer is disclosed. In one aspect, this can be accomplished by controlling the degree of rafting in a nanotube fabric. In one aspect, the method includes adjusting the concentration of individual nanotube elements dispersed in a nanotube application solution. A high concentration of individual nanotube elements will tend to promote rafting in a nanotube fabric layer formed using such a nanotube application solution, whereas a lower concentration will tend to discourage rafting. In another aspect, the method includes adjusting the concentration of ionic particles dispersed in a nanotube application solution. A low concentration of ionic particles will tend to promote rafting in a nanotube fabric layer formed using such a nanotube application solution, whereas a higher concentration will tend to discourage rafting. In other aspects, both concentration parameters are adjusted.Type: ApplicationFiled: February 14, 2011Publication date: February 28, 2013Applicant: NANTERO INC.Inventors: Rahul Sen, J. Thomas Kocab, Feng Gu
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Publication number: 20130009109Abstract: Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid for formation of a nanotube film includes a liquid medium containing a controlled concentration of purified nanotubes, wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, and wherein the spin-coatable liquid comprises less than 1×1018 atoms/cm3 of metal impurities. The spin-coatable liquid is substantially free of particle impurities having a diameter of greater than about 500 nm.Type: ApplicationFiled: May 25, 2012Publication date: January 10, 2013Applicant: Nantero Inc.Inventors: Rahul SEN, Ramesh SIVARAJAN, Thomas RUECKES, Brent M. SEGAL
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Patent number: 8187502Abstract: Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid for formation of a nanotube film includes a liquid medium containing a controlled concentration of purified nanotubes, wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, and wherein the spin-coatable liquid comprises less than 1×1018 atoms/cm3 of metal impurities. The spin-coatable liquid is substantially free of particle impurities having a diameter of greater than about 500 nm.Type: GrantFiled: July 25, 2007Date of Patent: May 29, 2012Assignee: Nantero Inc.Inventors: Rahul Sen, Ramesh Sivarajan, Thomas Rueckes, Brent M. Segal
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Patent number: 8147722Abstract: Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid for formation of a nanotube film includes a liquid medium containing a controlled concentration of purified nanotubes, wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, and wherein the spin-coatable liquid comprises less than 1×1018 atoms/cm3 of metal impurities. The spin-coatable liquid is substantially free of particle impurities having a diameter of greater than about 500 nm.Type: GrantFiled: July 25, 2007Date of Patent: April 3, 2012Assignee: Nantero Inc.Inventors: Rahul Sen, Ramesh Sivarajan, Thomas Rueckes, Brent M. Segal
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Patent number: 8128993Abstract: Methods for forming anisotropic nanotube fabrics are disclosed. In one aspect, a nanotube application solution is rendered into a nematic state prior to its application over a substrate. In another aspect, a pump and narrow nozzle assembly are employed to realize a flow induced alignment of a plurality of individual nanotube elements as they are deposited onto a substrate element. In another aspect, nanotube adhesion promoter materials are used to form a patterned nanotube application layer, providing narrow channels over which nanotube elements will self align during an application process. Specific dip coating processes which are well suited for aiding in the creation of anisotropic nanotube fabrics are also disclosed.Type: GrantFiled: July 31, 2009Date of Patent: March 6, 2012Assignee: Nantero Inc.Inventors: Thomas Rueckes, Ramesh Sivarajan, Rahul Sen