Abstract: In one embodiment, a method for forming a metallic nanocrystalline material on a substrate is provided which includes exposing a substrate to a pretreatment process, forming a tunnel dielectric layer on the substrate, exposing the substrate to a post-treatment process, forming a metallic nanocrystalline layer on the tunnel dielectric layer, and forming a dielectric capping layer on the metallic nanocrystalline layer. The method further provides forming the metallic nanocrystalline layer having a nanocrystalline density of at least about 5×1012 cm?2, preferably, at least about 8×1012 cm?2. In one example, the metallic nanocrystalline layer contains platinum, ruthenium, or nickel. In another embodiment, a method for forming a multi-layered metallic nanocrystalline material on a substrate is provided which includes forming a plurality of bi-layers, wherein each bi-layer contains an intermediate dielectric layer deposited on a metallic nanocrystalline layer.

Abstract: A method is disclosed for producing a software application which has at least two layers, including a processing layer and a process layer, wherein each layer is encapsulated and hence platform-independent in terms of execution, and the encapsulated layers communicate with each other via an application programming interface. A system is also disclosed for producing an application including a flexible interconnection interface between encapsulated layers. By virtue of the implementation of an additional configurable interconnection interface in the application programming interface between two encapsulated application layers in each case, the architecture layering can be retained irrespective of the respective deployment, and only the communication profiles of the interconnection interfaces need be adapted to the deployment.

Abstract: The present invention generally relates to the creation of fuel cell components and the method of forming the various fuel cell components that have an improved lifetime, lower production cost and improved process performance. The invention generally includes treating or conditioning a substrate surface by depositing a material layer, or layers, having good adhesion to the substrate, low electrical resistivity (high conductivity) and has good resistance to chemical attack during the operation of fuel cell. The substrate may be, for example, a fuel cell part, a conductive plate, a separator plate, a bipolar plate or an end plate, among others. In one embodiment, the substrate surface is treated or conditioned by exposing at least a portion of it to a gas or liquid comprising ruthenium tetroxide.

Abstract: Access to external service providers is provided through portlets, where each portlet accessible by a user is represented on the display of the user device. Through use of a dynamic content channel, e.g., a portlet, a highly customizable content page may be produced for any individual client system. When a portlet is selected on a user device, the content associated with the portlet is retrieved and automatically transformed into data that can be displayed by that user device. Thus, a particular user device is not limited to accessing content in a format identical to that associated with the user interface in use on the user device. Consequently, the user's ability to access a wide variety of content sources independent of the characteristics of the particular user device is further enhanced.

Abstract: A network portal system includes a web-top manager and a universal content broker system. The web-top manager is configured to receive a content request from a user device, where the content request includes a content provider identifier. The universal content broker system is coupled to the web-top manager. The universal content broker system includes a plurality of content providers. Each content provider in the plurality of content providers is associated with a different content provider identifier. Also, each content provider accesses content having a different raw data format. A universal content broker is coupled to the web-top manager and to the plurality of content providers. Upon the receipt of the content request from the web-top manager, the universal content broker passes the request to a content provider in the plurality of content providers that is associated with the content provider identifier.

Abstract: A physical vapor deposition plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, a process gas inlet coupled to the chamber and a process gas source coupled to the process gas inlet, a metal sputter target at the ceiling, a high voltage D.C. source coupled to the sputter target, an RF plasma source power generator coupled to the wafer support pedestal and having a frequency in a range between about 60 MHz and 81 MHz, and an RF plasma bias power generator coupled to the wafer support pedestal and having a frequency suitable for coupling energy to plasma ions.

Abstract: A base station is provided in a radio communication system by which first communication connections and second communication connections are transmitted. A first radio network controller is provided, by which the first communication connections are transmitted and also a second radio network controller, by which the second communication connections are transmitted. The base station comprises a common high frequency component which processes signals for the first communication connections and signals for the second communication connections. The signals of the first communication connections and the second communication connections are transmitted across an air gap at different carrier frequencies and can be sent by different carriers.

Abstract: A method of performing physical vapor deposition of copper onto an integrated circuit in a vacuum chamber of a plasma reactor includes providing a copper target near a ceiling of the chamber, placing an integrated circuit wafer on a wafer support pedestal facing the target near a floor of the chamber, introducing a carrier gas into the vacuum chamber, maintaining a target-sputtering plasma at the target to produce a stream comprising at least one of copper atoms and copper ions flowing from the target toward the wafer support pedestal for vapor deposition, and maintaining a wafer-sputtering plasma near the wafer support pedestal by capacitively coupling plasma RF source power to the wafer-sputtering plasma. The frequency of the RF source power is sufficiently high to limit ion energy near the surface of the wafer so that the principal portion of the power provides plasma ion generation.

Abstract: A method of performing physical vapor deposition of copper onto an integrated circuit in a vacuum chamber of a plasma reactor includes providing a copper target near a ceiling of the chamber, placing an integrated circuit wafer on a wafer support pedestal facing the target near a floor of the chamber, introducing a carrier gas into the vacuum chamber having an atomic weight substantially less than the atomic weight of copper, maintaining a target-sputtering plasma at the target to produce a stream comprising at least one of copper atoms and copper ions flowing from the target toward the wafer support pedestal for vapor deposition, maintaining a wafer-sputtering plasma near the wafer support pedestal by capacitively coupling plasma RF source power to the wafer-sputtering plasma, and accelerating copper ions of the wafer sputtering plasma in a direction normal to a surface of the wafer support pedestal.

Abstract: A physical vapor deposition plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, a process gas inlet coupled to the chamber and a process gas source coupled to the process gas inlet, a metal sputter target at the ceiling, a high voltage D.C. source coupled to the sputter target, an RF plasma source power generator coupled to the wafer support pedestal and having a frequency in a range between about 60 MHz and 81 MHz, and an RF plasma bias power generator coupled to the wafer support pedestal and having a frequency suitable for coupling energy to plasma ions.

Abstract: An apparatus, a method and a system arrangement are disclosed for executing an order from a user, in which it is necessary to check authorization to execute the order from the user. The authorization to execute the order is defined in a rights context. When the order is given by a user, the rights context for the order is recorded, checked and frozen for the duration of the order so that it is possible to ensure that the order can be executed fully even when the rights context is changed at the time of execution.

Abstract: A method of detecting a property of an energized gas in a process chamber involves providing a substrate having a hydride precursor in the chamber. The substrate is exposed to an energized gas comprising hydrogen in the chamber to form a hydride compound in the precursor layer. A sheet resistance of the layer is measured to determine the property of the energized gas, such as at least one of the processing uniformity and cleaning ability of the energized gas. One or more process parameters can be selected in relation to the measured sheet resistance to improve the energized gas processing uniformity and cleaning ability.

Abstract: A method for processing data is proposed, particularly image data in a medical system, in which a plurality of imaging modalities for capturing the data and their associated apparatus for locally processing and storing the data are connected to one another via a data transmission unit for the purpose of data interchange. Common data for all modalities are respectively stored locally and are coordinated with one another such that the respective modality remains active regardless of the state of the data transmission unit.

Abstract: An authentication system is proposed, for providing access for at least one subsystem to at least one password-protected main system. The authentication system includes a memory device for storing at least one reference key for the at least one subsystem and at least one reversibly coded password for the main system. It further includes a reception device for receiving a prescribed key stored in the subsystem. In addition, a comparison device is included for comparing the received key with the at least one reference key stored in the memory device. Further, a decoding device is used for reading and decoding the at least one reversibly coded password for the at least one main system which is stored in the memory device, if the requested key matches the reference key. Finally, an output device is included for outputting the decoded password to the main system in order to provide access for the subsystem.

Abstract: A base station is provided in a radio communication system by which first communication connections and second communication connections are transmitted. A first radio network controller is provided, by which the first communication connections are transmitted and also a second radio network controller, by which the second communication connections are transmitted. The base station comprises a common high frequency component which processes signals for the first communication connections and signals for the second communication connections. The signals of the first communication connections and the second communication connections are transmitted across an air gap at different carrier frequencies and can be sent by different carriers.

Abstract: Embodiments include devices and methods for sputtering material onto a workpiece in a chamber which includes a plasma generation area and a target. A coil is positioned to inductively couple energy into the plasma generation area to generate a plasma. A body is positioned between the workpiece and the target to prevent an amount of target material from being sputtered onto the workpiece. The body prevents an amount of target material from being sputtered onto the workpiece. The body may act as a dark space shield and inhibit plasma formation between the body and the target. The body may also act as a physical shield to block sputtered material from accumulating on the workpiece.

Abstract: A filter server receives a request for data, and in responses retrieves a rule set for a plurality of partial filter adapters from a filter registry. A filter is built using said rule set. The filter includes a chain of said plurality of partial filter adapters. Each partial filter adapter includes a generic format independent interface. The generic format independent interface is used in passing data from one partial filter adapter in said plurality of partial filter adapters to another partial filter adapter in said plurality of partial filter adapters.

Abstract: A network portal system includes a web-top manager and a universal content broker system. The web-top manager is configured to receive a content request from a user device, where the content request includes a content provider identifier. The universal content broker system is coupled to the web-top manager. The universal content broker system includes a plurality of content providers. Each content provider in the plurality of content providers is associated with a different content provider identifier. Also, each content provider accesses content having a different raw data format. A universal content broker is coupled to the web-top manager and to the plurality of content providers. Upon the receipt of the content request from the web-top manager, the universal content broker passes the request to a content provider in the plurality of content providers that is associated with the content provider identifier.

Abstract: A user device, a first computer system, includes a lightweight component that receives user input actions for a runtime environment component that is executing on a second computer system. The lightweight component sends a remote input action command to a user interface infrastructure that is executing on the second computer system. In response to the remote input action command, the user interface infrastructure sends a local input action command to the runtime environment component that processes the command, and issues a local output command to the user interface infrastructure that in turn sends a remote output command to the lightweight component on the user device. In response to the remote output command, the lightweight component causes an output on the user device.

Abstract: Access to external service providers is provided through portlets, where each portlet accessible by a user is represented on the display of the user device. Through use of a dynamic content channel, e.g., a portlet, a highly customizable content page may be produced for any individual client system. When a portlet is selected on a user device, the content associated with the portlet is retrieved and automatically transformed into data that can be displayed by that user device. Thus, a particular user device is not limited to accessing content in a format identical to that associated with the user interface in use on the user device. Consequently, the user's ability to access a wide variety of content sources independent of the characteristics of the particular user device is further enhanced. An individual user can personalize the user device by specifying which service providers from among the ones the organization has made available via portlets, the user wants to use.