Abstract: The present invention relates to a method for improving the wettability of a rotating electrode with a liquid medium in a discharge lamp, in particular for the production of EUV radiation or soft X-rays, and a correspondingly designed gas discharge lamp. In the method, the edge surface of the rotating electrode to which the liquid medium is applied is microstructured by means of external processing. This microstructure significantly improves the wettability of the edge surface for the liquid medium. Furthermore, the distribution of the liquid medium over the edge surface can be controlled selectively by suitable choice of the microstructure.

Abstract: The present invention relates to a method and device for generating optical radiation (18), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (9). At least two consecutive pulses (16) are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma (15).

Abstract: The present invention relates to an apparatus for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge, in which a metal or metal melt is provided on a surface close to a discharge gap and evaporated by an energy beam, thereby generating a gaseous medium for ignition of a plasma. A protective component is arranged and shaped to cover at least one slit between parts of different electrical potential during operation. The protective component is moved during operation of the apparatus. Due to this movement the local heat load on the protective component is reduced.

Abstract: The present invention relates to a method for improving the wettability of a rotating electrode with a liquid medium in a discharge lamp, in particular for the production of EUV radiation or soft X-rays, and a correspondingly designed gas discharge lamp. In the method, the edge surface of the rotating electrode to which the liquid medium is applied is microstructured by means of external processing. This microstructure significantly improves the wettability of the edge surface for the liquid medium. Furthermore, the distribution of the liquid medium over the edge surface can be controlled selectively by suitable choice of the microstructure.

Abstract: The present invention relates to a method and device for generating optical radiation (18), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (9). At least two consecutive pulses (16) are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma (15).

Abstract: The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.

Abstract: A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.

Abstract: The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.

Abstract: The present invention relates to a gas discharge source, in particular for EUV radiation and/or soft X-ray radiation, in which, in a vacuum chamber, at least two electrodes with an at least approximately circular periphery are rotatably mounted for rotation, wherein the electrodes at one spatial position have a small spacing for the ignition of a gas discharge and are in each case connected to a reservoir for a liquid, electrically conductive material in such a way that, during rotation, a liquid film of the electrically conductive material can form over the circular periphery of the electrodes and a flow of current to the electrodes is made possible via the reservoirs.