Patents by Inventor Ralph Schlief

Ralph Schlief has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Test pattern for feature cross-sectioning
    Patent number: 9397012
    Abstract: A method includes forming a first plurality of instances of a first pattern on a substrate. The first pattern includes a plurality of features defining a first spacing between features in a first direction. The instances in the first plurality are offset from one another at least in a second direction other than the first direction. The substrate is cleaved along a cleavage line. At least a first critical dimension of a feature in the first plurality of instances intersected by the cleavage line is measured.
    Type: Grant
    Filed: June 27, 2014
    Date of Patent: July 19, 2016
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Deniz E. Civay, Ralph Schlief
  • TEST PATTERN FOR FEATURE CROSS-SECTIONING
    Publication number: 20150380320
    Abstract: A method includes forming a first plurality of instances of a first pattern on a substrate. The first pattern includes a plurality of features defining a first spacing between features in a first direction. The instances in the first plurality are offset from one another at least in a second direction other than the first direction. The substrate is cleaved along a cleavage line. At least a first critical dimension of a feature in the first plurality of instances intersected by the cleavage line is measured.
    Type: Application
    Filed: June 27, 2014
    Publication date: December 31, 2015
    Inventors: Deniz E. Civay, Ralph Schlief
  • Method of two dimensional feature model calibration and optimization
    Patent number: 7820341
    Abstract: A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system.
    Type: Grant
    Filed: January 22, 2007
    Date of Patent: October 26, 2010
    Assignee: ASML MaskTools B. V.
    Inventors: Thomas Laidig, Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler
  • Method of two dimensional feature model calibration and optimization
    Publication number: 20070117030
    Abstract: A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system.
    Type: Application
    Filed: January 22, 2007
    Publication date: May 24, 2007
    Applicant: ASML MASKTOOLS B. V.
    Inventors: Thomas Laidig, Jang Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt Wampler
  • Method of two dimensional feature model calibration and optimization
    Patent number: 7175940
    Abstract: A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: February 13, 2007
    Assignee: ASML Masktools B.V.
    Inventors: Thomas Laidig, Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler
  • Method of two dimensional feature model calibration and optimization
    Publication number: 20030082463
    Abstract: A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system.
    Type: Application
    Filed: October 9, 2002
    Publication date: May 1, 2003
    Inventors: Thomas Laidig, Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler