Abstract: A vacuum arc plasma gun deposition system includes a cathode, several anode assemblies that define a plasma channel, a current source for causing electrical current to flow from the anode assemblies to the cathode, a mechanism for moving the anode axially to keep the active surface of the cathode substantially at a fixed position relative to the anode assemblies, mechanisms for moving the anode assemblies to keep the cross sectional size of the plasma channel substantially constant, a mechanism for cooling the cathode by conducting heat away from lateral surfaces of the cathode, and mechanisms for ensuring that a non-flat substrate is coated uniformly. The scope of the invention includes methods of making coated products by depositing coatings on substrates using this vacuum arc plasma gun deposition system, and the coated products so made.

Abstract: A method for forming nanostructures on a workpiece includes the steps of: positioning a counter-electrode and a workpiece electrode arrangement relative to each other, such that, there is a gap between the counter-electrode and the workpiece electrode arrangement; and applying an electrical pulse between the workpiece electrode arrangement and the counter electrode, such that, an electrical discharge in produced in the gap. The electrical discharge forms at least one nanostructure in a first region of a surface of the workpiece electrode arrangement. The electrical pulse has a duration of less than one millisecond. The first region is selectively determined by a shape of the counter-electrode and a relative positioning of the workpiece electrode arrangement and the counter-electrode. The scope of the invention also includes a system for performing this method.

Abstract: A vacuum arc plasma gun deposition system includes a cathode, several anode assemblies that define a plasma channel, a current source for causing electrical current to flow from the anode assemblies to the cathode, a mechanism for moving the anode axially to keep the active surface of the cathode substantially at a fixed position relative to the anode assemblies, mechanisms for moving the anode assemblies to keep the cross sectional size of the plasma channel substantially constant, a mechanism for cooling the cathode by conducting heat away from lateral surfaces of the cathode, and mechanisms for ensuring that a non-flat substrate is coated uniformly. The scope of the invention includes methods of making coated products by depositing coatings on substrates using this vacuum arc plasma gun deposition system, and the coated products so made.