Patents by Inventor Reinaldo Mario Machado

Reinaldo Mario Machado has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10894906
    Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: January 19, 2021
    Assignee: Versum Materials US, LLC
    Inventors: Hongjun Zhou, John Edward Quincy Hughes, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli
  • Patent number: 10669449
    Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.
    Type: Grant
    Filed: September 9, 2018
    Date of Patent: June 2, 2020
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Hongjun Zhou, Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella, Steven Charles Winchester, John Edward Quincy Hughes, Mark Leonard O'Neill, Andrew J. Dodd, Dnyanesh Chandrakant Tamboli, Reinaldo Mario Machado
  • Publication number: 20200115590
    Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.
    Type: Application
    Filed: September 9, 2018
    Publication date: April 16, 2020
    Applicant: Versum Materials US, LLC
    Inventors: Hongjun Zhou, Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella, Steven Charles Winchester, John Edward Quincy Hughes, Mark Leonard O'Neill, Andrew J. Dodd, Dnyanesh Chandrakant Tamboli, Reinaldo Mario Machado
  • Publication number: 20200024515
    Abstract: This invention pertains to slurries, methods and systems that can be used in chemical mechanical planarization (CMP) of tungsten containing semiconductor device. Using the CMP slurries with additives to counter lowering of pH by tungsten polishing byproducts and maintain pH 4 or higher, the erosion of dense metal (such as tungsten) structures can be greatly diminished.
    Type: Application
    Filed: July 12, 2019
    Publication date: January 23, 2020
    Applicant: Versum Materials US, LLC
    Inventors: Chun Lu, Xiaobo Shi, Dnyanesh Chandrakant Tamboli, Reinaldo Mario Machado, Mark Leonard O'Neill, Matthias Stender
  • Publication number: 20190359868
    Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.
    Type: Application
    Filed: August 6, 2019
    Publication date: November 28, 2019
    Applicant: Versum Materials US, LLC.
    Inventors: Hongjun Zhou, John Edward Quincy Hughes, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli
  • Patent number: 10421890
    Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: September 24, 2019
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Hongjun Zhou, John Edward Quincy Hughes, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli
  • Patent number: 10109493
    Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: October 23, 2018
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Hongjun Zhou, Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella, Steven Charles Winchester, John Edward Quincy Hughes, Mark Leonard O'Neill, Andrew J. Dodd, Dnyanesh Chandrakant Tamboli, Reinaldo Mario Machado
  • Publication number: 20170283673
    Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.
    Type: Application
    Filed: March 17, 2017
    Publication date: October 5, 2017
    Applicant: Versum Materials US, LLC
    Inventors: Hongjun Zhou, John Edward Quincy Hughes, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli
  • Patent number: 9738982
    Abstract: This invention is an apparatus and a method for continuously generating a hydride gas of M1 which is substantially free of oxygen in a divided electrochemical cell. An impermeable partition or a combination of an impermeable partition and a porous diaphragm can be used to divide the electrochemical cell. The divided electrochemical cell has an anode chamber and a cathode chamber, wherein the cathode chamber has a cathode comprising M1, the anode chamber has an anode comprising M2 and is capable of generating oxygen, an aqueous electrolyte solution comprising a hydroxide M3OH partially filling the divided electrochemical cell. Hydride gas generated in the cathode chamber and oxygen generated in the anode chamber are removed through independent outlets. M1 can be selenium, phosphorous, silicon, metal or metal alloy, M2 is metal or metal alloy suitable for anionic oxygen generation, and M3 is NH4 or an alkali or alkaline earth metal.
    Type: Grant
    Filed: August 10, 2015
    Date of Patent: August 22, 2017
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Reinaldo Mario Machado, Athanasios Georgios Tsirukis, Christopher L. Hartz, James Robert Leenhouts, William F. Schulze
  • Patent number: 9528191
    Abstract: An electrolytic cell which is partitioned into one or more anode chambers and cathode chambers by one or more partition walls between each anode chamber and cathode chamber, wherein each anode chamber comprises one or more anodes comprising an inner surface and an outer surface, and each cathode chamber comprises one or more cathodes, wherein the anode chamber and the cathode chamber are configured such that any one of the one or more cathodes is adjacent to the outer surface of the one or more anodes and there is no cathode adjacent to the inner surface of the one or more anodes; a molten salt electrolyte surrounding the one or more anodes and the one or more cathodes; at least one anode gas outlet for withdrawing gas from the anode chamber; and at least one cathode gas outlet for withdrawing gas from the cathode chamber.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: December 27, 2016
    Assignee: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Steven Arnold Krouse, Reinaldo Mario Machado, James Joseph Hart, James Patrick Nehlsen
  • Publication number: 20160200944
    Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.
    Type: Application
    Filed: January 12, 2016
    Publication date: July 14, 2016
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Hongjun Zhou, Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella, Steven Charles Winchester, John Edward Quincy Hughes, Mark Leonard O'Neill, Andrew J. Dodd, Dnyanesh Chandrakant Tamboli, Reinaldo Mario Machado
  • Publication number: 20150345037
    Abstract: This invention is an apparatus and a method for continuously generating a hydride gas of M1 which is substantially free of oxygen in a divided electrochemical cell. An impermeable partition or a combination of an impermeable partition and a porous diaphragm can be used to divide the electrochemical cell. The divided electrochemical cell has an anode chamber and a cathode chamber, wherein the cathode chamber has a cathode comprising M1, the anode chamber has an anode comprising M2 and is capable of generating oxygen, an aqueous electrolyte solution comprising a hydroxide M3OH partially filling the divided electrochemical cell. Hydride gas generated in the cathode chamber and oxygen generated in the anode chamber are removed through independent outlets. M1 can be selenium, phosphorous, silicon, metal or metal alloy, M2 is metal or metal alloy suitable for anionic oxygen generation, and M3 is NH4 or an alkali or alkaline earth metal.
    Type: Application
    Filed: August 10, 2015
    Publication date: December 3, 2015
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Reinaldo Mario Machado, Athanasios Georgios Tsirukis, Christopher L. Hartz, James Robert Leenhouts, William F. Schulze
  • Publication number: 20150240367
    Abstract: An electrolytic cell which is partitioned into one or more anode chambers and cathode chambers by one or more partition walls between each anode chamber and cathode chamber, wherein each anode chamber comprises one or more anodes comprising an inner surface and an outer surface, and each cathode chamber comprises one or more cathodes, wherein the anode chamber and the cathode chamber are configured such that any one of the one or more cathodes is adjacent to the outer surface of the one or more anodes and there is no cathode adjacent to the inner surface of the one or more anodes; a molten salt electrolyte surrounding the one or more anodes and the one or more cathodes; at least one anode gas outlet for withdrawing gas from the anode chamber; and at least one cathode gas outlet for withdrawing gas from the cathode chamber.
    Type: Application
    Filed: December 4, 2014
    Publication date: August 27, 2015
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Steven Arnold Krouse, Reinaldo Mario Machado, James Joseph Hart, James Patrick Nehlsen
  • Patent number: 8945367
    Abstract: An electrolytic cell and system used for making nitrogen trifluoride consisting of a computer and an electrolytic cell having a body, an electrolyte, at least one anode chamber that produces an anode product gas, at least one cathode chamber, and one or more fluorine adjustment means to maintain fluorine or hydrogen in the anode product gas within a target amount by adjusting the concentration of fluorine in said anode product gas, and the process that controls the system.
    Type: Grant
    Filed: January 18, 2011
    Date of Patent: February 3, 2015
    Assignee: Air Products and Chemicals, Inc.
    Inventors: James Joseph Hart, Reinaldo Mario Machado, Howard Paul Withers, Jr., Sai-Hong A. Lo, Edward Jay Cialkowski, Krishnakumar Jambunathan
  • Publication number: 20140110269
    Abstract: A process and an anode for the production of nitrogen trifluoride or fluorine where the anode in the electrolytic cell is made primarily from parallel ordered anisotropic carbon, including needle coke and/or mesocarbon microbeads. The parallel ordered anisotropic carbon anodes minimize the production of CF4 and improve the purity of the nitrogen trifluoride or fluorine gas produced. Additionally, the anodes may be molded, instead of extruded or machined, providing for improved dimensional and mechanical integrity of the anode.
    Type: Application
    Filed: October 4, 2013
    Publication date: April 24, 2014
    Applicant: Air Products and Chemicals, Inc.
    Inventors: James Patrick Nehlsen, Kerry Renard Berger, Reinaldo Mario Machado, Kyoung-Ho Choi
  • Publication number: 20140110267
    Abstract: A process and an anode for the production of nitrogen trifluoride or fluorine where the anode in the electrolytic cell is made primarily from mesocarbon microbeads. The mesocarbon microbead anodes minimize the production of CF4 and improve the purity of the nitrogen trifluoride or fluorine gas produced. Additionally, the anodes may be molded, instead of extruded or machined, providing for improved dimensional and mechanical integrity of the anode.
    Type: Application
    Filed: April 9, 2013
    Publication date: April 24, 2014
    Applicant: Air Products and Chemicals, Inc.
    Inventors: James Patrick Nehlsen, Kerry Renard Berger, Reinaldo Mario Machado, Kyoung-Ho Choi
  • Patent number: 8591720
    Abstract: A method for generating hydride gas of metal M1 in electrochemical cell comprising cathode comprising metal M1, sacrificial anode comprising metal M2, an initial concentration of aqueous electrolyte solution comprising metal hydroxide M3OH, wherein the sacrificial metal anode electrochemically oxidizes in the presence of the aqueous electrolyte solution to form metal salt, and hydride gas of metal M1 is formed by reducing the metal M1 of the cathode. The method also comprises steps of determining solubility profile curves of metal salt as M3OH is consumed and metal oxide is formed by oxidation reaction at various concentrations of M3OH; determining the maximum concentration of M3OH that does not yield a concentration of metal salt that precipitates out of the electrolyte solution; and choosing a concentration of M3OH that is in the range of at and within 5% less than the maximum concentration of M3OH to be the initial concentration of M3OH.
    Type: Grant
    Filed: August 12, 2011
    Date of Patent: November 26, 2013
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Reinaldo Mario Machado, Christopher L. Hartz, James E. Hollen, Rebecca J. Mohr, George L. Ryals
  • Patent number: 8361303
    Abstract: The invention relates to the electrolysis of aqueous electrolyte solutions containing GeO2; hydroxide and water with metal alloy electrodes, such as, copper or tin rich alloy electrodes with alloying elements such as Sn, Pb, Zn, Cu etc, to generate Germane (GeH4). Cu-rich alloy electrodes have been demonstrated to increase the GeH4 current efficiency by almost 20% compared to Cu metal electrodes. Germanium deposition has been found to be either absent or minimal by using Cu-rich alloy electrodes. Several different methods for maintaining the cell performance or restoring the cell performance after a reduction in current efficiency over time, have been identified. A titration-based method for the analysis of the electrolyte, to obtain the concentration of GeO2 and the concentration of hydroxide has also been disclosed.
    Type: Grant
    Filed: September 2, 2010
    Date of Patent: January 29, 2013
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Krishnakumar Jambunathan, Kerry Renard Berger, Reinaldo Mario Machado, Daniel James Ragsdale
  • Publication number: 20120205252
    Abstract: A method for generating hydride gas of metal M1 in electrochemical cell comprising cathode comprising metal M1, sacrificial anode comprising metal M2, an initial concentration of aqueous electrolyte solution comprising metal hydroxide M3OH, wherein the sacrificial metal anode electrochemically oxidizes in the presence of the aqueous electrolyte solution to form metal salt, and hydride gas of metal M1 is formed by reducing the metal M1 of the cathode. The method also comprises steps of determining solubility profile curves of metal salt as M3OH is consumed and metal oxide is formed by oxidation reaction at various concentrations of M3OH; determining the maximum concentration of M3OH that does not yield a concentration of metal salt that precipitates out of the electrolyte solution; and choosing a concentration of M3OH that is in the range of at and within 5% less than the maximum concentration of M3OH to be the initial concentration of M3OH.
    Type: Application
    Filed: August 12, 2011
    Publication date: August 16, 2012
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Reinaldo Mario Machado, Christopher L. Hartz, James E. Hollen, Rebecca J. Mohr, George L. Ryals
  • Publication number: 20120181182
    Abstract: An electrolytic cell and system used for making nitrogen trifluoride consisting of a computer and an electrolytic cell having a body, an electrolyte, at least one anode chamber that produces an anode product gas, at least one cathode chamber, and one or more fluorine adjustment means to maintain fluorine or hydrogen in the anode product gas within a target amount by adjusting the concentration of fluorine in said anode product gas, and the process that controls the system.
    Type: Application
    Filed: January 18, 2011
    Publication date: July 19, 2012
    Applicant: Air Products and Chemicals, Inc.
    Inventors: James Joseph Hart, Reinaldo Mario Machado, Howard Paul Withers, JR., Sai-Hong A. Lo, Edward Jay Cialkowski, Krishnakumar Jambunathan