Abstract: A method is provided for manufacturing a magneto-resistive device, comprising the steps of: extracting at least one subset of bars from at least one bar section of a wafer; obtaining a magnetic performance of the at least one subset of the bars; determining an angle based on the magnetic performance; and processing remaining bars from the at least one bar section of the wafer based on the determined angle.

Abstract: Systems and methods for correcting fabrication error in magnetic recording heads using magnetic write width (MWW) measurements are provided. One such method includes separating a wafer into sections containing row bars, each row bar including magnetic recording heads, selecting a first row bar from a first section of the sections, lapping the first row bar to form sliders, performing a test of a magnetic write width (MWW) on each of the sliders, calculating a first error profile for the first row bar based on results of the magnetic write width tests, generating a second error profile for a stripe height of a component of the sliders based on the first error profile, where the component is selected from a magnetic read head and a magnetic write head, and lapping a second row bar from the row bars of the first section using the second error profile.

Abstract: Systems and methods are provided for manufacturing magneto-resistive devices utilized in magneto-resistive read elements by depositing a plurality of rows of magnetic transducers on a wafer. The wafer may then be diced/cut into bars of active device regions for incorporation into a magnetic recording head. Sampling of a subset of bars from one or more bar sections of the wafer may be processed to obtain feedback associated with magnetic erase width (MEW). An air bearing surface (ABS) tilt angle based on the MEW feedback may then be applied to the one or more bar sections of the water during subsequent processing to optimize the magnetic performance of each resulting magneto-resistive device.