Patents by Inventor Richard Blume

Richard Blume has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170340525
    Abstract: Methods for reclaiming formula components of an antiperspirant composition and recycling formula into its component parts for recycling into an antiperspirant composition.
    Type: Application
    Filed: December 4, 2014
    Publication date: November 30, 2017
    Applicant: Colgate-Palmolive Company
    Inventors: Steven MISNER, Pablo MOLINA, Richard BLUME, Ronald GROWE, JR., Frederick ECKERT, Peter WISNIEWSKI
  • Publication number: 20130295029
    Abstract: Disclosed is a package for a personal care composition, the package comprising a container containing a personal care composition, the container having a base comprising a base face for standing the package on a planar surface, and a cap removably connected to and covering a dispensing end of the container opposite to the base. The cap has an end face which is inclined to the base face, and the container and cap are shaped to permit the package, independent of the amount of the personal care composition contained within the container, selectively to be stood on the base face in an upright orientation on the planar surface or on the end face in an inverted orientation on the planar surface.
    Type: Application
    Filed: July 9, 2013
    Publication date: November 7, 2013
    Inventors: Steven Misner, Richard Adams, Richard Blume, Nilsa Rodriguez, Ronald Edward Growe
  • Patent number: 8529919
    Abstract: Disclosed is a package for a personal care composition, the package comprising a container containing a personal care composition, the container having a base comprising a base face for standing the package on a planar surface, and a cap removably connected to and covering a dispensing end of the container opposite to the base. The cap has an end face which is inclined to the base face, and the container and cap are shaped to permit the package, independent of the amount of the personal care composition contained within the container, selectively to be stood on the base face in an upright orientation on the planar surface or on the end face in an inverted orientation on the planar surface.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: September 10, 2013
    Assignee: Colgate-Palmolive Company
    Inventors: Steve Misner, Richard Adams, Richard Blume, Nilsa Rodriguez, Ronald Edward Growe, Jr.
  • Publication number: 20120009135
    Abstract: Disclosed is a package for a personal care composition, the package comprising a container containing a personal care composition, the container having a base comprising a base face for standing the package on a planar surface, and a cap removably connected to and covering a dispensing end of the container opposite to the base. The cap has an end face which is inclined to the base face, and the container and cap are shaped to permit the package, independent of the amount of the personal care composition contained within the container, selectively to be stood on the base face in an upright orientation on the planar surface or on the end face in an inverted orientation on the planar surface.
    Type: Application
    Filed: July 6, 2010
    Publication date: January 12, 2012
    Applicant: CXologate-Palmolive Company
    Inventors: Steve Misner, Richard Adams, Richard Blume, Nilsa Rodriguez
  • Patent number: 6513452
    Abstract: A method of adjusting the cathode DC bias in a plasma chamber for fabricating semiconductor devices. A dielectric shield is positioned between the plasma and a selected portion of the electrically grounded components of the chamber, such as the electrically grounded chamber wall. The cathode DC bias is adjusted by controlling one or more of the following parameters: (1) the surface area of the chamber wall or other grounded components which is blocked by the dielectric shield; (2) the thickness of the dielectric; (3) the gap between the shield and the chamber wall; and (4) the dielectric constant of the dielectric material. In an apparatus aspect, the invention is a plasma chamber for fabricating semiconductor devices having an exhaust baffle with a number of sinuous passages. Each passage is sufficiently long and sinuous that no portion of the plasma within the chamber can extend beyond the outlet of the passage.
    Type: Grant
    Filed: April 24, 2001
    Date of Patent: February 4, 2003
    Assignee: Applied Materials Inc.
    Inventors: Hongching Shan, Evans Y. Lee, Michael D. Welch, Robert W. Wu, Bryan Y. Pu, Paul E. Luscher, James D. Carducci, Richard Blume
  • Publication number: 20010014540
    Abstract: A method of adjusting the cathode DC bias in a plasma chamber for fabricating semiconductor devices. A dielectric shield is positioned between the plasma and a selected portion of the electrically grounded components of the chamber, such as the electrically grounded chamber wall. The cathode DC bias is adjusted by controlling one or more of the following parameters: (1) the surface area of the chamber wall or other grounded components which is blocked by the dielectric shield; (2) the thickness of the dielectric; (3) the gap between the shield and the chamber wall; and (4) the dielectric constant of the dielectric material. In an apparatus aspect, the invention is a plasma chamber for fabricating semiconductor devices having an exhaust baffle with a number of sinuous passages. Each passage is sufficiently long and sinuous that no portion of the plasma within the chamber can extend beyond the outlet of the passage.
    Type: Application
    Filed: April 24, 2001
    Publication date: August 16, 2001
    Applicant: Applied Materials, Inc.
    Inventors: Hongching Shan, Evans Y. Lee, Michael D. Welch, Robert W. Wu, Bryan Y. Pu, Paul E. Luscher, James D. Carducci, Richard Blume
  • Patent number: 6221782
    Abstract: A method of adjusting the cathode DC bias in a plasma chamber for fabricating semiconductor devices. A dielectric shield is positioned between the plasma and a selected portion of the electrically grounded components of the chamber, such as the electrically grounded chamber wall. The cathode DC bias is adjusted by controlling one or more of the following parameters: (1) the surface area of the chamber wall or other grounded components which is blocked by the dielectric shield; (2) the thickness of the dielectric; (3) the gap between the shield and the chamber wall; and (4) the dielectric constant of the dielectric material. In an apparatus aspect, the invention is a plasma chamber for fabricating semiconductor devices having an exhaust baffle with a number of sinuous passages. Each passage is sufficiently long and sinuous that no portion of the plasma within the chamber can extend beyond the outlet of the passage.
    Type: Grant
    Filed: April 6, 1999
    Date of Patent: April 24, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Hongching Shan, Evans Y. Lee, Michael D. Welch, Robert W. Wu, Bryan Y. Pu, Paul E. Luscher, James D. Carducci, Richard Blume
  • Patent number: 5891350
    Abstract: A method of adjusting the cathode DC bias in a plasma chamber for fabricating semiconductor devices. A dielectric shield is positioned between the plasma and a selected portion of the electrically grounded components of the chamber, such as the electrically grounded chamber wall. The cathode DC bias is adjusted by controlling one or more of the following parameters: (1) the surface area of the chamber wall or other grounded components which is blocked by the dielectric shield; (2) the thickness of the dielectric; (3) the gap between the shield and the chamber wall; and (4) the dielectric constant of the dielectric material. In an apparatus aspect, the invention is a plasma chamber for fabricating semiconductor devices having an exhaust baffle with a number of sinuous passages. Each passage is sufficiently long and sinuous that no portion of the plasma within the chamber can extend beyond the outlet of the passage.
    Type: Grant
    Filed: June 20, 1996
    Date of Patent: April 6, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Hong Ching Shan, Evans Yip Lee, Michael D Welch, Robert W Wu, Bryan Pu, Paul Ernest Luscher, James David Carducci, Richard Blume
  • Patent number: 5871321
    Abstract: An improved, process compatible fastener is especially useful for securing a member, such as a wafer clamp ring, to an assembly for use in a process environment. The fastener is of a simple design, such that it is readily manufactured, and such that it is not a source of contamination. In particular, an integrated fastener includes both a metal fastener and a cone shaped metal lock washer within a single fastener assembly, such that a single fastener is used for accomplish the function of a screw and a washer. All surfaces of the fastener that are exposed within the process environment are encapsulated in a process compatible material. In this way, the fastener may be secured in the process environment in a single operation without leaving any gaps or partially exposed surfaces that may introduce contaminants into the process environment, such that the integrated fastener also provides the function of a process compatible cap.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: February 16, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Michael Dutcher, Richard Blume, Hans Petrusk