Patents by Inventor Rintaro MIYATA

Rintaro MIYATA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250034751
    Abstract: Provided are a method of producing single crystal AlN, single crystal AlN, and a single crystal AlN production apparatus with which single crystal AlN can be cheaply and continuously produced. The method of producing single crystal AlN includes a melt formation step of heating and melting an alloy to form a melt of the alloy and a deposition step of cooling a portion of the melt and providing a temperature gradient in the melt while causing deposition of single crystal AlN. In the deposition step, a nitrogen-containing gas is brought into contact with a high-temperature portion of the melt and a single crystal AlN seed crystal or a substrate for crystal growth is held in a low-temperature portion of the melt so as to continue to take nitrogen into the melt in the high-temperature portion while causing deposition of single crystal AlN.
    Type: Application
    Filed: February 20, 2023
    Publication date: January 30, 2025
    Applicants: TOHOKU UNIVERSITY, DOWA HOLDINGS Co., Ltd.
    Inventors: Hiroyuki FUKUYAMA, Makoto OHTSUKA, Masayoshi ADACHI, Rintaro MIYATA, Yasuhiro WATANABE