Patents by Inventor Rivka Maoz

Rivka Maoz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Constructive nanolithography
    Patent number: 7374813
    Abstract: A patterned organic monolayer or multiplayer film self-assembled on a solid substrate, the pattern consisting in a site-defined surface chemical modification non-destructively inscribed in the organic monolayer or multilayer by means of an electrically biased conducting scanning probe device, stamping device and/or liquid metal or metal alloy or any other device that can touch the organic monolayer or multilayer surface and inscribe therein a chemical modification pattern upon application of an electrical bias.
    Type: Grant
    Filed: February 19, 2001
    Date of Patent: May 20, 2008
    Assignee: Yeda Research and Development, Co.
    Inventors: Jacob Sagiv, Rivka Maoz, Sidney R. Cohen, Eli Frydman
  • Constructive nanolithography
    Publication number: 20030021967
    Abstract: A patterned organic monolayer or multiplayer film self-assembled on a solid substrate, the pattern consisting in a site-defined surface chemical modification non-destructively inscribed in the organic monolayer or multiplayer by means of an electrically biased conducting scanning probe device, stamping device and/or liquid metal or metal alloy or any other device that can touch the organic monolayer or multiplayer surface and inscribe therein a chemical modification pattern upon application of an electrical bias.
    Type: Application
    Filed: February 6, 2002
    Publication date: January 30, 2003
    Inventors: Jacob Sagiv, Rivka Maoz, Sidney R. Rehovot, Eji Frydamn