Patents by Inventor Robert D. Tolles

Robert D. Tolles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11772234
    Abstract: In one embodiment, a fluid delivery apparatus includes a vessel body having a first chamber and a second chamber disposed therein, a plurality of first delivery lines fluidly coupled to the first chamber, a dispense nozzle fluidly coupled to the second chamber, a second delivery line fluidly coupled to the second chamber, and a valve disposed between the first and second chambers. Here, fluid communication between the first chamber and the second chamber is controlled by the valve disposed therebetween. Polishing fluid components are flowed into the first chamber through the plurality of first delivery lines fluidly coupled thereto to form a batch of polishing fluid. Once formed, the batch of polishing fluid is transferred to the second chamber by opening the valve.
    Type: Grant
    Filed: February 27, 2020
    Date of Patent: October 3, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Robert D. Tolles, Kirk Liebscher
  • Patent number: 11715193
    Abstract: A metrology technique for analyzing a substrate includes storing data indicating a boundary of an area in a 2-dimensional color space having a pair of color channels including a first color channel and a second color channel as axes of the color space, receiving color data of a substrate from a camera, generating a color image of the substrate from the color data, performing a comparison of a pair of color values for the pair of color channels for the pixel to the boundary of the area in the 2-dimensional color space for each pixel of a plurality of pixels of the color image to determine whether the pair of color values meet thresholds provided by the boundary, and generating a signal to an operator based on results of the comparison for the plurality of pixels.
    Type: Grant
    Filed: January 15, 2020
    Date of Patent: August 1, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Dominic J. Benvegnu, Robert D. Tolles, Boguslaw A. Swedek, Abraham Ravid
  • Publication number: 20210122008
    Abstract: In one embodiment, a fluid delivery apparatus includes a vessel body having a first chamber and a second chamber disposed therein, a plurality of first delivery lines fluidly coupled to the first chamber, a dispense nozzle fluidly coupled to the second chamber, a second delivery line fluidly coupled to the second chamber, and a valve disposed between the first and second chambers. Here, fluid communication between the first chamber and the second chamber is controlled by the valve disposed therebetween. Polishing fluid components are flowed into the first chamber through the plurality of first delivery lines fluidly coupled thereto to form a batch of polishing fluid. Once formed, the batch of polishing fluid is transferred to the second chamber by opening the valve.
    Type: Application
    Filed: February 27, 2020
    Publication date: April 29, 2021
    Inventors: Robert D. TOLLES, Kirk LIEBSCHER
  • Patent number: 10800000
    Abstract: The present disclosure relates generally to a polishing article, and apparatus and methods of chemical mechanical polishing substrates using the polishing article. In some embodiments, the polishing article, such as a polishing pad, includes multiple layers in which one or more layers (i.e., at least the top layer) includes a plurality of nano-fibers that a positioned to contact a substrate during a polishing process. In one embodiment, a polishing article comprises a layer having a thickness less than about 0.032 inches, and the layer comprising fibers having a diameter of about 10 nanometers to about 200 micro meters.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: October 13, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Robert D. Tolles, Mahendra C. Orilall, Fred C. Redeker, Rajeev Bajaj
  • Patent number: 10786885
    Abstract: A method and apparatus for polishing a substrate that includes a polishing article comprising a polymeric sheet having a raised surface texture, which is formed on the surface of the polymeric sheet is provided. According to one or more implementations of the present disclosure, an advanced polishing article has been developed, which does not require abrasive pad conditioning. In some implementations of the present disclosure, the advanced polishing article comprises a polymeric sheet having a polishing surface with a raised surface texture or “micro-features” and/or a plurality of grooves or “macro-features” formed in the polishing surface. In some implementations, the raised surface texture is embossed, etched, machined or otherwise formed in the polishing surface prior to installing and using the advanced polishing article in a polishing system. In one implementation, the raised features have a height within one order of magnitude of the features removed from the substrate during polishing.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: September 29, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Robert D. Tolles, Gregory E. Menk, Eric Davey, You Wang, Huyen Karen Tran, Fred C. Redeker, Veera Raghava Reddy Kakireddy, Ekaterina Mikhaylichenko, Jay Gurusamy
  • Publication number: 20200151868
    Abstract: A metrology technique for analyzing a substrate includes storing data indicating a boundary of an area in a 2-dimensional color space having a pair of color channels including a first color channel and a second color channel as axes of the color space, receiving color data of a substrate from a camera, generating a color image of the substrate from the color data, performing a comparison of a pair of color values for the pair of color channels for the pixel to the boundary of the area in the 2-dimensional color space for each pixel of a plurality of pixels of the color image to determine whether the pair of color values meet thresholds provided by the boundary, and generating a signal to an operator based on results of the comparison for the plurality of pixels.
    Type: Application
    Filed: January 15, 2020
    Publication date: May 14, 2020
    Inventors: Dominic J. Benvegnu, Robert D. Tolles, Boguslaw A. Swedek, Abraham Ravid
  • Patent number: 10565701
    Abstract: A polishing system includes a polishing station including a platen to support a polishing pad, a support to hold a substrate, an in-line metrology station to measure the substrate before or after polishing of a surface of the substrate in the polishing station, and a controller. The in-line metrology station includes a color line-scan camera, a white light source, a frame supporting the light source and the camera, and a motor to cause relative motion between the camera and the support along a second axis perpendicular to the first axis to cause the light source and the camera to scan across the substrate. The controller is configured to receive a color data from the camera, to generate a 2-dimensional color image from the color data, and to control polishing at the polishing station based on the color image.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: February 18, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Dominic J. Benvegnu, Robert D. Tolles, Boguslaw A. Swedek, Abraham Ravid
  • Publication number: 20190030677
    Abstract: Implementations described herein generally relate to methods and apparatus for polishing substrates, more particularly, to methods and apparatus for identifying and/or tracking polishing material in a roll-to-roll polishing system. In one implementation, a method of polishing a substrate is provided. The method comprises advancing a polishing material across a surface of a platen. The polishing material has a polishing surface and an opposing backside surface and the backside surface has a pattern of identifying features formed thereon. The method further comprises sensing the movement of the pattern of identifying features past a detector assembly. The method further comprises controlling a position of the polishing material relative to the platen based on data received from the sensed movement of the pattern of identifying features.
    Type: Application
    Filed: July 17, 2018
    Publication date: January 31, 2019
    Inventors: Jeonghoon OH, David J. LISCHKA, Erik RONDUM, Jay GURUSAMY, Robert D. TOLLES, Steven M. ZUNIGA, Steven M. REEDY, Wai- Ming KAN
  • Publication number: 20180207770
    Abstract: A method and apparatus for polishing a substrate that includes a polishing article comprising a polymeric sheet having a raised surface texture, which is formed on the surface of the polymeric sheet is provided. According to one or more implementations of the present disclosure, an advanced polishing article has been developed, which does not require abrasive pad conditioning. In some implementations of the present disclosure, the advanced polishing article comprises a polymeric sheet having a polishing surface with a raised surface texture or “micro-features” and/or a plurality of grooves or “macro-features” formed in the polishing surface. In some implementations, the raised surface texture is embossed, etched, machined or otherwise formed in the polishing surface prior to installing and using the advanced polishing article in a polishing system. In one implementation, the raised features have a height within one order of magnitude of the features removed from the substrate during polishing.
    Type: Application
    Filed: January 19, 2018
    Publication date: July 26, 2018
    Inventors: Robert D. TOLLES, Gregory E. MENK, Eric DAVEY, You WANG, Huyen Karen TRAN, Fred C. REDEKER, Veera Raghava Reddy KAKIREDDY, Ekaterina MIKHAYLICHENKO, Jay GURUSAMY
  • Publication number: 20180009079
    Abstract: The present disclosure relates generally to a polishing article, and apparatus and methods of chemical mechanical polishing substrates using the polishing article. In some embodiments, the polishing article, such as a polishing pad, includes multiple layers in which one or more layers (i.e., at least the top layer) includes a plurality of nano-fibers that a positioned to contact a substrate during a polishing process. In one embodiment, a polishing article comprises a layer having a thickness less than about 0.032 inches, and the layer comprising fibers having a diameter of about 10 nanometers to about 200 micro meters.
    Type: Application
    Filed: January 29, 2016
    Publication date: January 11, 2018
    Inventors: Robert D. TOLLES, Mahendra C. ORILALL, Fred C. REDEKER, Rajeev BAJAJ
  • Publication number: 20170140525
    Abstract: A polishing system includes a polishing station including a platen to support a polishing pad, a support to hold a substrate, an in-line metrology station to measure the substrate before or after polishing of a surface of the substrate in the polishing station, and a controller. The in-line metrology station includes a color line-scan camera, a white light source, a frame supporting the light source and the camera, and a motor to cause relative motion between the camera and the support along a second axis perpendicular to the first axis to cause the light source and the camera to scan across the substrate. The controller is configured to receive a color data from the camera, to generate a 2-dimensional color image from the color data, and to control polishing at the polishing station based on the color image.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 18, 2017
    Inventors: Dominic J. Benvegnu, Robert D. Tolles, Boguslaw A. Swedek, Abraham Ravid
  • Patent number: 8545660
    Abstract: A bonding apparatus and method holds first and second bodies peripherally, one above the other, on respective shelves. A lower heat-transfer body is configured to lift the first body from below and press the first and second bodies against an upper heat-transfer body to enable bonding between the first and second bodies.
    Type: Grant
    Filed: March 20, 2012
    Date of Patent: October 1, 2013
    Assignee: GTAT Corporation
    Inventors: Steven M. Zuniga, Robert D. Tolles, Derek G. Aqui, Andrew J. Nagengast, Anthony J. Senn, Keenan Leon Guerrero
  • Patent number: 8151852
    Abstract: A bonding apparatus and method holds first and second bodies peripherally, one above the other, on respective shelves. A lower heat-transfer body is configured to lift the first body from below and press the first and second bodies against an upper heat-transfer body to enable bonding between the first and second bodies.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: April 10, 2012
    Assignee: Twin Creeks Technologies, Inc.
    Inventors: Steven M. Zuniga, Robert D. Tolles, Derek G. Aqui, Andrew J. Nagengast, Anthony J. Senn, Keenan Leon Guerrero
  • Patent number: 8079894
    Abstract: A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.
    Type: Grant
    Filed: October 16, 2009
    Date of Patent: December 20, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Robert D. Tolles, Norman Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg, Harry Q. Lee
  • Publication number: 20100330776
    Abstract: A bonding apparatus and method holds first and second bodies peripherally, one above the other, on respective shelves. A lower heat-transfer body is configured to lift the first body from below and press the first and second bodies against an upper heat-transfer body to enable bonding between the first and second bodies.
    Type: Application
    Filed: June 30, 2009
    Publication date: December 30, 2010
    Inventors: Steven M. Zuniga, Robert D. Tolles, Derek G. Aqui, Andrew J. Nagengast, Anthony J. Senn, Keenan Leon Guerrero
  • Patent number: 7754519
    Abstract: In some embodiments, a method of forming a photovoltaic cell includes (1) forming a cleave plane in a donor body so as to define a lamina to be bonded to a receiver element and exfoliated from the donor body; (2) prior to bonding, pre-heating the donor body without the receiver element to a temperature of greater than about 200° C. for a first time period that is less than a time period required for exfoliation of the lamina from the donor body; (3) cooling the donor body after pre-heating the donor body; (4) bonding the donor body to the receiver element; and (5) heating the bonded donor body and receiver element for a second time period so as to complete the exfoliation of the lamina from the donor body. Numerous other aspects are provided.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: July 13, 2010
    Assignee: Twin Creeks Technologies, Inc.
    Inventors: Robert D. Tolles, Aditya Agarwal, Orion Leland
  • Patent number: 7677959
    Abstract: A polishing pad has a polishing layer with a polishing surface and a first registration mark, and a backing layer connected to the polishing layer and having a second registration mark aligned with the first registration mark. The polishing pad may have a window that includes an aperture in the backing layer aligned with a solid transparent portion in the polishing layer.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: March 16, 2010
    Assignee: Applied Materials, Inc.
    Inventor: Robert D. Tolles
  • Publication number: 20100035526
    Abstract: A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.
    Type: Application
    Filed: October 16, 2009
    Publication date: February 11, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Robert D. Tolles, Norman Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg, Harry Q. Lee
  • Patent number: 7614939
    Abstract: A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.
    Type: Grant
    Filed: June 7, 2007
    Date of Patent: November 10, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Robert D. Tolles, Norman Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg, Harry Q. Lee
  • Publication number: 20090044838
    Abstract: In a first aspect, an apparatus adapted to clean a semiconductor device manufacturing component is provided. The apparatus includes an ozone module adapted to (1) obtain Ozone; (2) combine the Ozone with a fluid to generate ozonated fluid; and (3) deliver the ozonated fluid to the semiconductor device manufacturing component so as to clean the semiconductor device manufacturing component. Numerous other aspects are provided.
    Type: Application
    Filed: October 12, 2008
    Publication date: February 19, 2009
    Inventors: Bruce Willing, Daniel P. Forster, David Datong Huo, Robert D. Tolles, Christopher L. Haynes, Steven T. Mear, David Paul, William M. Evans