Patents by Inventor Roelof Wijnaendts
Roelof Wijnaendts has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9052608Abstract: A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.Type: GrantFiled: October 23, 2009Date of Patent: June 9, 2015Assignee: Heidelberg Instruments Mikrotechnik GmbHInventors: Roelof Wijnaendts Van Resandt, Roland Kaplan
-
Publication number: 20110273688Abstract: A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.Type: ApplicationFiled: October 23, 2009Publication date: November 10, 2011Inventors: Roelof Wijnaendts Van Resandt, Roland Kaplan
-
Patent number: 7487069Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).Type: GrantFiled: September 27, 2007Date of Patent: February 3, 2009Assignee: Heidelberg Instruments Mikrotechnik GmbHInventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
-
Publication number: 20080021671Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).Type: ApplicationFiled: September 27, 2007Publication date: January 24, 2008Applicant: HEIDELBERG INSTRUMENTS MIKROTECHNIK GmbHInventors: Sven VOGLER, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
-
Publication number: 20080008970Abstract: In a lithographic process for producing microstructures by means of a direct-write system, predefined areas are exposed by means of a focused beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focused beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.Type: ApplicationFiled: September 20, 2007Publication date: January 10, 2008Inventors: Roelof WIJNAENDTS, Christian Buchner
-
Publication number: 20070070318Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focused beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focused beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.Type: ApplicationFiled: November 30, 2006Publication date: March 29, 2007Inventors: Roelof Wijnaendts, Christian Buchner
-
Publication number: 20070021939Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).Type: ApplicationFiled: September 28, 2006Publication date: January 25, 2007Applicant: HEIDELBERG INSTRUMENTS MIKROTECHNIK GmbHInventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
-
Publication number: 20060106552Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).Type: ApplicationFiled: December 22, 2005Publication date: May 18, 2006Applicant: HEIDELBERG INSTRUMENTS MIKROTECHNIK GmbHInventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
-
Publication number: 20060084010Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.Type: ApplicationFiled: September 30, 2005Publication date: April 20, 2006Inventors: Roelof Wijnaendts, Christian Buchner
-
Publication number: 20050171725Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).Type: ApplicationFiled: March 28, 2005Publication date: August 4, 2005Applicant: Heidelberg Instruments Mikrotechnik GmbHInventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
-
Publication number: 20050003306Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.Type: ApplicationFiled: August 2, 2004Publication date: January 6, 2005Inventors: Roelof Wijnaendts, Christian Buchner
-
Publication number: 20040024563Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (10) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).Type: ApplicationFiled: July 29, 2003Publication date: February 5, 2004Applicant: Heidelberg Instruments Mikrotechnik GmbHInventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
-
Publication number: 20030033112Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).Type: ApplicationFiled: July 19, 2002Publication date: February 13, 2003Applicant: Heidelberg Instruments Mikrotechnik GmbHInventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
-
Publication number: 20030031956Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.Type: ApplicationFiled: October 4, 2002Publication date: February 13, 2003Inventors: Roelof Wijnaendts, Christian Buchner
-
Publication number: 20010009751Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.Type: ApplicationFiled: February 15, 2001Publication date: July 26, 2001Applicant: Heidelberg Instruments Mikrotechnik GmbHInventors: Roelof Wijnaendts, Christian Buchner