Patents by Inventor Roelof Wijnaendts

Roelof Wijnaendts has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9052608
    Abstract: A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: June 9, 2015
    Assignee: Heidelberg Instruments Mikrotechnik GmbH
    Inventors: Roelof Wijnaendts Van Resandt, Roland Kaplan
  • Publication number: 20110273688
    Abstract: A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.
    Type: Application
    Filed: October 23, 2009
    Publication date: November 10, 2011
    Inventors: Roelof Wijnaendts Van Resandt, Roland Kaplan
  • Patent number: 7487069
    Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: February 3, 2009
    Assignee: Heidelberg Instruments Mikrotechnik GmbH
    Inventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
  • Publication number: 20080021671
    Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).
    Type: Application
    Filed: September 27, 2007
    Publication date: January 24, 2008
    Applicant: HEIDELBERG INSTRUMENTS MIKROTECHNIK GmbH
    Inventors: Sven VOGLER, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
  • Publication number: 20080008970
    Abstract: In a lithographic process for producing microstructures by means of a direct-write system, predefined areas are exposed by means of a focused beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focused beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: September 20, 2007
    Publication date: January 10, 2008
    Inventors: Roelof WIJNAENDTS, Christian Buchner
  • Publication number: 20070070318
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focused beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focused beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: November 30, 2006
    Publication date: March 29, 2007
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20070021939
    Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).
    Type: Application
    Filed: September 28, 2006
    Publication date: January 25, 2007
    Applicant: HEIDELBERG INSTRUMENTS MIKROTECHNIK GmbH
    Inventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
  • Publication number: 20060106552
    Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).
    Type: Application
    Filed: December 22, 2005
    Publication date: May 18, 2006
    Applicant: HEIDELBERG INSTRUMENTS MIKROTECHNIK GmbH
    Inventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
  • Publication number: 20060084010
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: September 30, 2005
    Publication date: April 20, 2006
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20050171725
    Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).
    Type: Application
    Filed: March 28, 2005
    Publication date: August 4, 2005
    Applicant: Heidelberg Instruments Mikrotechnik GmbH
    Inventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
  • Publication number: 20050003306
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 6, 2005
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20040024563
    Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (10) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).
    Type: Application
    Filed: July 29, 2003
    Publication date: February 5, 2004
    Applicant: Heidelberg Instruments Mikrotechnik GmbH
    Inventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
  • Publication number: 20030031956
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: October 4, 2002
    Publication date: February 13, 2003
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20030033112
    Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).
    Type: Application
    Filed: July 19, 2002
    Publication date: February 13, 2003
    Applicant: Heidelberg Instruments Mikrotechnik GmbH
    Inventors: Sven Vogler, Roland Kaplan, Robert Weikert, Roelof Wijnaendts-Van-Resandt
  • Publication number: 20010009751
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: February 15, 2001
    Publication date: July 26, 2001
    Applicant: Heidelberg Instruments Mikrotechnik GmbH
    Inventors: Roelof Wijnaendts, Christian Buchner