Patents by Inventor Roger F. Sinta
Roger F. Sinta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7632630Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.Type: GrantFiled: May 3, 2006Date of Patent: December 15, 2009Assignee: Rohm and Haas Electronic Materials LLCInventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
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Publication number: 20090220888Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.Type: ApplicationFiled: December 12, 2008Publication date: September 3, 2009Applicant: Shipley Company, L.L.C.Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
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Patent number: 7482107Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.Type: GrantFiled: March 23, 2006Date of Patent: January 27, 2009Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 7147983Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.Type: GrantFiled: October 7, 1996Date of Patent: December 12, 2006Assignee: Shipley Company, L.L.C.Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manuel doCanto
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Patent number: 7026093Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.Type: GrantFiled: June 9, 2003Date of Patent: April 11, 2006Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 6770413Abstract: The present invention relates to new copolymers and use of such copolymer as a resin binder component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention include repeat units of 1) meta-hydroxystyrene groups, 2) para-hydroxystyrene groups, and 3) photoacid-labile groups.Type: GrantFiled: January 12, 1999Date of Patent: August 3, 2004Assignee: Shipley Company, L.L.C.Inventors: Hiroshi Ito, Ashish Pandya, Roger F. Sinta
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Patent number: 6706461Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a low molecular weight anthracene dye compounds. It has been found that these dye compounds can significantly reduce or even eliminate undesired reflections of exposure radiation, particularly deep U.V. exposure radiation such as 248 nm, as well as function as effective sensitizer compounds, enabling effective imaging at higher wavelengths, particularly I-line exposures.Type: GrantFiled: June 15, 1999Date of Patent: March 16, 2004Assignee: Shipley Company, L.L.C.Inventors: Roger F. Sinta, Thomas M. Zydowsky
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Publication number: 20030215748Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.Type: ApplicationFiled: June 9, 2003Publication date: November 20, 2003Applicant: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 6645698Abstract: The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has found that linewidth variation is substantially reduced when using the halogenated sulfonic aced generator in a process involving a high temperature post exposure bake.Type: GrantFiled: December 22, 1999Date of Patent: November 11, 2003Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 6602652Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.Type: GrantFiled: April 20, 2002Date of Patent: August 5, 2003Assignee: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III
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Publication number: 20030073042Abstract: The invention is for a method and composition for forming one or more patterned layers of functional material over a substrate. The method comprising providing a coating composition comprising a photopatterning material containing a particulate filler of a functional material. The particulate filler is one that is essentially transparent to activating radiation. Once formed, the coating is exposed to activating radiation in an image pattern and developed to form the patterned layer of functional material. The organic components of the coating can be removed if desired.Type: ApplicationFiled: October 17, 2001Publication date: April 17, 2003Inventors: George J. Cernigliaro, Roger F. Sinta
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Publication number: 20020172896Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.Type: ApplicationFiled: April 20, 2002Publication date: November 21, 2002Applicant: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas
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Patent number: 6410209Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.Type: GrantFiled: September 15, 1998Date of Patent: June 25, 2002Assignee: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III
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Publication number: 20020012869Abstract: The invention provides novel cross-linked polymers and positive chemically-amplified photoresist compositions that comprise a photoactive component and such crosslinked polymers. Resists of the invention can exhibit enhanced lithographic results relative to comparable compositions where the polymers are not crosslinked.Type: ApplicationFiled: February 9, 2001Publication date: January 31, 2002Applicant: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Martha M. Rajaratnam, Ashish A. Pandya, Roger F. Sinta, Pushkara R. Varanasi, Kathleen Cornett, Ahmad D. Katnani
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Patent number: 6107425Abstract: The invention provides inter alia new methods to produce aqueous developable resin binders for negative-acting photoresists. The methods in general comprise free radical polymerization of one or more types of monomers in the presence of a free radical polymerization control agent, particularly a nitroxide polymerization control agent such as a piperidinyloxy (N-oxy) free radical, and wherein at least one of the monomer types contains a moiety that enables aqueous solution development of a photoresist composition containing the formed polymer.Type: GrantFiled: February 6, 1998Date of Patent: August 22, 2000Assignee: Shipley Company, L.L.C.Inventors: Roger F. Sinta, George G. Barclay, Jacque H. Georger, Jr., Mark D. Denison, Sheri L. Ablaza
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Patent number: 6077643Abstract: The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include acid labile groups that contain isobornyl moieties and groups that contribute to aqueous development of a photoresist such as phenolic groups.Type: GrantFiled: August 28, 1997Date of Patent: June 20, 2000Assignee: Shipley Company, L.L.C.Inventors: Uday Kumar, Charles R. Szmanda, Roger F. Sinta, Leonard E. Bogan, Jr.
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Patent number: 6048672Abstract: The invention includes use of a positive chemically amplified photoresist composition that produces a strong photogenerated acid. The resist is coated onto a metal substrate that has been subjected to a stringent bake step, e.g. heating of the substrate at about at least 140.degree. C. for more than 60 seconds. The combined use of strong photogenerated acid and stringent pre-coating substrate bake provides highly resolved resist relief images, including on metal substrates.Type: GrantFiled: February 20, 1998Date of Patent: April 11, 2000Assignee: Shipley Company, L.L.C.Inventors: James F. Cameron, Martha M. Rajaratnam, Roger F. Sinta, James W. Thackeray
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Patent number: 6037107Abstract: The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has been found that linewidth variation is substantially reduced when using the halogenated sulfonic acid generator in a process involving a high temperature post exposure bake.Type: GrantFiled: August 28, 1997Date of Patent: March 14, 2000Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 6033830Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.Type: GrantFiled: November 7, 1997Date of Patent: March 7, 2000Assignee: Shipley Company, L.L.C.Inventors: Roger F. Sinta, Timothy G. Adams, James Michael Mori
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Patent number: RE38980Abstract: The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has been found that linewidth variation is substantially reduced when using the halogenated sulfonic acid generator in a process involving a high temperature post exposure bake.Type: GrantFiled: March 14, 2002Date of Patent: February 14, 2006Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta