Patents by Inventor Ronald D. Voisin

Ronald D. Voisin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150000622
    Abstract: Downstream expansion cylinders are associated with a combustion cylinder such that an overall surface area and displacement volume of the expansion cylinder is sufficient to lower the temperature of fluids associated with the combined engine to such an extent that a radiator can be eliminated in an associated vehicle, or other system. In a separate feature, a catalytic material is placed on surfaces which will “see” the hot exhaust gases such that catalytic conversion of impurities in the gases can be achieved within the engine itself. In yet another feature, water is recovered from a system having both a water injection expansion cylinder, and a combustion cylinder, and the recovered water is re-used for the expansion. In yet another feature, gearing is provided between the expansion cylinder and a combustion cylinder such that the output of the combined engine is optimized, and the two cylinders do not drive the crankshafts in a one-to-one fashion.
    Type: Application
    Filed: September 16, 2014
    Publication date: January 1, 2015
    Inventor: Ronald D. Voisin
  • Patent number: 8851025
    Abstract: Downstream expansion cylinders are associated with a combustion cylinder such that an overall surface area and displacement volume of the expansion cylinder is sufficient to lower the temperature of fluids associated with the combined engine to such an extent that a radiator can be eliminated in an associated vehicle, or other system. In a separate feature, a catalytic material is placed on surfaces which will “see” the hot exhaust gases such that catalytic conversion of impurities in the gases can be achieved within the engine itself. In yet another feature, water is recovered from a system having both a water injection expansion cylinder, and a combustion cylinder, and the recovered water is re-used for the expansion. In yet another feature, gearing is provided between the expansion cylinder and a combustion cylinder such that the output of the combined engine is optimized, and the two cylinders do not drive the crankshafts in a one-to-one fashion.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: October 7, 2014
    Inventor: Ronald D. Voisin
  • Patent number: 8366434
    Abstract: Sets of lithographic templates providing improved lithographic alignment are described. The sets include at least two templates. The first template has an array of first geometries and the second template has an array of second geometries. The second geometries correspond to the first geometries and at least one second geometry is intentionally offset from its corresponding first geometry.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: February 5, 2013
    Assignee: Molecular Imprints, Inc.
    Inventor: Ronald D. Voisin
  • Patent number: 8318066
    Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
    Type: Grant
    Filed: May 16, 2011
    Date of Patent: November 27, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario Johannes Meissl
  • Patent number: 8123514
    Abstract: The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted to a fluid chamber having an inlet and a throughway. The template may be connected to the throughway and the inlet is connected to a fluid source.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: February 28, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Ronald D. Voisin
  • Publication number: 20110221095
    Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
    Type: Application
    Filed: May 16, 2011
    Publication date: September 15, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
  • Patent number: 7943081
    Abstract: Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.
    Type: Grant
    Filed: April 19, 2010
    Date of Patent: May 17, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario Johannes Meissl
  • Publication number: 20100278955
    Abstract: Imprint lithography templates for patterning substrates are described. The templates include a section having a mold, a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional sections may include a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern.
    Type: Application
    Filed: July 13, 2010
    Publication date: November 4, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventor: Ronald D. Voisin
  • Patent number: 7785526
    Abstract: An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where the intentional offset may vary in magnitude and direction from one subfield to the next. The system includes an imprint lithographic machine and first and second lithography templates where the templates are adapted to enable the machine to form first and second features, respectively, and where a second feature is configured to be deliberately offset from a corresponding first feature. The template set includes at least two templates, one having features which are deliberately offset from corresponding features of another template. Also, a method of manufacturing such a template set.
    Type: Grant
    Filed: July 20, 2004
    Date of Patent: August 31, 2010
    Assignee: Molecular Imprints, Inc.
    Inventor: Ronald D. Voisin
  • Publication number: 20100201042
    Abstract: Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.
    Type: Application
    Filed: April 19, 2010
    Publication date: August 12, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P.C. Watts, Mario J. Meissl
  • Publication number: 20100173034
    Abstract: The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted to a fluid chamber having an inlet and a throughway. The template may be connected to the throughway and the inlet is connected to a fluid source.
    Type: Application
    Filed: March 4, 2010
    Publication date: July 8, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Ronald D. Voisin
  • Patent number: 7727453
    Abstract: The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.
    Type: Grant
    Filed: May 11, 2005
    Date of Patent: June 1, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
  • Patent number: 7699598
    Abstract: The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
    Type: Grant
    Filed: January 31, 2007
    Date of Patent: April 20, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Ronald D. Voisin
  • Publication number: 20100077987
    Abstract: Downstream expansion cylinders are associated with a combustion cylinder such that an overall surface area and displacement volume of the expansion cylinder is sufficient to lower the temperature of fluids associated with the combined engine to such an extent that a radiator can be eliminated in an associated vehicle, or other system. In a separate feature, a catalytic material is placed on surfaces which will “see” the hot exhaust gases such that catalytic conversion of impurities in the gases can be achieved within the engine itself. In yet another feature, water is recovered from a system having both a water injection expansion cylinder, and a combustion cylinder, and the recovered water is re-used for the expansion. In yet another feature, gearing is provided between the expansion cylinder and a combustion cylinder such that the output of the combined engine is optimized, and the two cylinders do not drive the crankshafts in a one-to-one fashion.
    Type: Application
    Filed: September 28, 2009
    Publication date: April 1, 2010
    Inventor: Ronald D. Voisin
  • Publication number: 20090214686
    Abstract: The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
    Type: Application
    Filed: May 4, 2009
    Publication date: August 27, 2009
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Ian Matthew McMackin, Byung-Jin Choi, Ronald D. Voisin
  • Patent number: 7547398
    Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: June 16, 2009
    Assignee: Molecular Imprints, Inc.
    Inventors: Gerard M. Schmid, Nicholas A Stacey, Douglas J. Resnick, Ronald D. Voisin, Lawrence J. Myron
  • Patent number: 7531025
    Abstract: The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: May 12, 2009
    Assignees: Molecular Imprints, Inc., Board of Regents, University of Texas System
    Inventors: Ian M. McMackin, Nicholas A. Stacey, Daniel A. Babbs, Duane J. Voth, Mathew P. C. Watts, Van N. Truskett, Frank Y. Xu, Ronald D. Voisin, Pankaj B. Lad
  • Patent number: 7491637
    Abstract: The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
    Type: Grant
    Filed: September 7, 2006
    Date of Patent: February 17, 2009
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Ian M. McMackin, Byung-Jin Choi, Ronald D. Voisin
  • Publication number: 20070243655
    Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
    Type: Application
    Filed: March 29, 2007
    Publication date: October 18, 2007
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Gerard M. Schmid, Nicholas A. Stacey, Douglas J. Resnick, Ronald D. Voisin, Lawrence J. Myron
  • Patent number: 7279113
    Abstract: A method of forming a lithographic template having an elastomer layer positioned between a body and an imprinting layer, the imprinting layer having a pattern formed thereon.
    Type: Grant
    Filed: December 9, 2005
    Date of Patent: October 9, 2007
    Assignee: Molecular Imprints, Inc.
    Inventors: Michael P. C. Watts, Ronald D. Voisin, Sidlgata V. Sreenivasan