Abstract: A transistor is disclosed. In an embodiment a transistor includes a first semiconductor region of a substrate, a first trench delimiting the first semiconductor region on a first side, a first electrically-conductive element located in the first trench, a channel area in contact with the first semiconductor region and a first area of contact with the first semiconductor region, wherein the channel area and the first area of contact are on the same surface side of the substrate.

Abstract: A transistor is disclosed. In an embodiment a transistor includes a first semiconductor region of a substrate, a first trench delimiting the first semiconductor region on a first side, a first electrically-conductive element located in the first trench, a channel area in contact with the first semiconductor region and a first area of contact with the first semiconductor region, wherein the channel area and the first area of contact are on the same surface side of the substrate.

Abstract: An embodiment transistor comprises a semiconductor drain region delimited by a first trench, and, in the first trench, a first electrically conductive element electrically coupled to a node of application of a potential closer to a drain potential of the transistor than to a source potential of the transistor.

Abstract: The present description concerns an electronic device comprising a semiconductor substrate, transistors having their gates contained in first trenches extending in the substrate, and at least one electronic component, different from a transistor, at least partly formed in a first semiconductor region contained in a second trench extending in the semiconductor substrate parallel to the first trenches.

Abstract: The present disclosure relates to an electronic device comprising a semiconductor substrate and transistors having their gates contained in trenches extending in the semiconductor substrate, each transistor comprising a doped semiconductor well of a first conductivity type, the well being buried in the semiconductor substrate and in contact with two adjacent trenches among said trenches, a first doped semiconductor region of a second conductivity type, covering the well, in contact with the well, and in contact with the two adjacent trenches, a second doped semiconductor region of the second conductivity type more heavily doped than the first semiconductor region, extending in the first semiconductor region, and a third doped semiconductor region of the first conductivity type, more heavily doped than the well, covering the well, in contact with the first region, and extending in the semiconductor substrate in contact with the well.

Abstract: An embodiment transistor comprises a semiconductor drain region delimited by a first trench, and, in the first trench, a first electrically conductive element electrically coupled to a node of application of a potential closer to a drain potential of the transistor than to a source potential of the transistor.

Abstract: A transistor is disclosed. In an embodiment a transistor includes a first semiconductor region of a substrate, a first trench delimiting the first semiconductor region on a first side, a first electrically-conductive element located in the first trench, a channel area in contact with the first semiconductor region and a first area of contact with the first semiconductor region, wherein the channel area and the first area of contact are on the same surface side of the substrate.

Abstract: An integrated power device includes a semiconductor body of a first conductivity type comprising a first region accommodating a start-up structure, and a second region accommodating a power structure. The two structures are separated from one another by an edge structure and are arranged in a mirror configuration with respect to a symmetry line of the edge structure. Both the start-up structure and the power structure are obtained using MOSFET devices. Both MOSFET devices are multi-drain MOSFET devices, having mesh regions, source regions and gate regions separated from one another. In addition, both MOSFET devices have drain regions delimited by columns that repeat periodically at a fixed distance. Between the two MOSFET devices there is an electrical insulation of at least 25 V.

Abstract: An integrated power device includes a semiconductor body of a first conductivity type comprising a first region accommodating a start-up structure, and a second region accommodating a power structure. The two structures are separated from one another by an edge structure and are arranged in a mirror configuration with respect to a symmetry line of the edge structure. Both the start-up structure and the power structure are obtained using MOSFET devices. Both MOSFET devices are multi-drain MOSFET devices, having mesh regions, source regions and gate regions separated from one another. In addition, both MOSFET devices have drain regions delimited by columns that repeat periodically at a fixed distance. Between the two MOSFET devices there is an electrical insulation of at least 25 V.

Abstract: The invention relates to an integrated CMOS circuit comprising, in a semiconductor substrate (1) with a first type of conductivity, a casing (2) of a second type of retrograde-doped conductivity, the end of said casing being covered by an inter-casing insulating region (4). The components contained in said casing are separated from each other by means of intra-casing insulating regions (6,7). The first insulating elements (15) of the second type of high-level doping conductivity extend under each intra-casing insulating region. A second region (21) of the second type of high-level doping conductivity partially extends under the inter-casing insulator beyond the periphery of each casing.

Abstract: The invention relates to an integrated CMOS circuit comprising, in a semiconductor substrate (1) with a first type of conductivity, a casing (2) of a second type of retrograde-doped conductivity, the end of said casing being covered by an inter-casing insulating region (4). The components contained in said casing are separated from each other by means of intra-casing insulating regions (6,7). The first insulating elements (15) of the second type of high-level doping conductivity extend under each intra-casing insulating region. A second region (21) of the second type of high-level doping conductivity partially extends under the inter-casing insulator beyond the periphery of each casing.

Abstract: A MOS power transistor formed in an epitaxial layer of a first conductivity type, the MOS power transistor being formed on the front surface of a heavily-doped substrate of the first conductivity type, including a plurality of alternate drain and source fingers of the second conductivity type separated by a channel, conductive fingers covering each of the source fingers and of the drain fingers, a second metal level connecting all the drain metal fingers and substantially covering the entire source-drain structure. Each source finger includes a heavily-doped area of the first conductivity type in contact with the epitaxial layer and with the corresponding source finger, and the rear surface of the substrate is coated with a source metallization.

Abstract: A MOS power transistor formed in an epitaxial layer of a first conductivity type, the MOS power transistor being formed on the front surface of a heavily-doped substrate of the first conductivity type, including a plurality of alternate drain and source fingers of the second conductivity type separated by a channel, conductive fingers covering each of the source fingers and of the drain fingers, a second metal level connecting all the drain metal fingers and substantially covering the entire source-drain structure. Each source finger includes a heavily-doped area of the first conductivity type in contact with the epitaxial layer and with the corresponding source finger, and the rear surface of the substrate is coated with a source metallization.