Patents by Inventor Russell Arndt

Russell Arndt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SELECTIVE SALICIDATION METHODS
    Publication number: 20050282370
    Abstract: Methods for selective salicidation of a semiconductor device. The invention implements a chemical surface pretreatment by immersion in ozonated water H2O prior to metal deposition. The pretreatment forms an interfacial layer that prevents salicidation over an n-type structure. As a result, the invention does not add any additional process steps to the conventional salicidation processing.
    Type: Application
    Filed: June 21, 2004
    Publication date: December 22, 2005
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Russell Arndt, Kenneth Giewont, Kevin Mello, M. Sciacca
  • Method for improved fabrication of salicide structures
    Patent number: 6475893
    Abstract: A method for preparing a semiconductor material for formation of a silicide layer on selected areas thereupon is disclosed. In an exemplary embodiment of the invention, the method includes removing at least one of a nitride and an oxynitride film from the selected areas, removing metallic particles from the selected areas, removing surface particles from the selected areas, removing organics from the selected areas, and removing an oxide layer from the selected areas.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: November 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Kenneth J. Giewont, Yun Yu Wang, Russell Arndt, Craig Ransom, Judith Coffin, Anthony Domenicucci, Michael MacDonald, Brian E. Johnson
  • METHOD FOR IMPROVED FABRICATION OF SALICIDE STRUCTURES
    Publication number: 20020142616
    Abstract: A method for preparing a semiconductor material for the formation of a silicide layer on selected areas thereupon is disclosed. In an exemplary embodiment of the invention, the method includes removing at least one of a nitride and an oxynitride film from the selected areas, removing metallic particles from the selected areas, removing surface particles from the selected areas, removing organics from the selected areas, and removing an oxide layer from the selected areas.
    Type: Application
    Filed: March 30, 2001
    Publication date: October 3, 2002
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Kenneth J. Giewont, Yun Yu Wang, Russell Arndt, Craig Ransom, Judith Coffin, Anthony Domenicucci, Michael MacDonald, Brian E. Johnson
  • Vapor drying system and method
    Patent number: 5815942
    Abstract: A vapor drying system includes a tank for holding a drying liquid and a heater for boiling the drying liquid in the tank to produce a vapor. A manifold is arranged in the tank for bubbling gas into the drying liquid. A controller is configured to cause the manifold to bubble gas into the drying liquid at a time when substrates to be dried are first introduced into the tank in order to quench the boiling of the drying liquid and generate a saturated vapor at a rate sufficient to achieve condensation of the drying liquid over substantially the entire surface of each of the substrates to be dried. In this way, staining of the substrates is reduced and process yield is improved.
    Type: Grant
    Filed: December 13, 1996
    Date of Patent: October 6, 1998
    Assignees: Kabushiki Kaisha Toshiba, International Business Machines Corporation
    Inventors: Jin Jwang Wu, Soichi Nadahara, Susan L. Cohen, Russell Arndt