Patents by Inventor Ryota Iwai

Ryota Iwai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11504443
    Abstract: The present invention provides an odor-modulating agent that modulates malodors generated in daily living environments or industries to different odors so that harm caused by the malodors can be easily solved, and an odor-modulating method. Specifically, the present invention provides an odor-modulating agent comprising at least one oxygen-containing cyclic compound selected from the group consisting of furan compounds, pyran compounds, and cyclopentanone derivatives.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: November 22, 2022
    Assignees: YAMAMOTO PERFUMERY CO., LTD., SHIKIBO LTD., TOPPAN PRINTING CO., LTD.
    Inventors: Ryota Iwai, Yutaka Tsujimoto, Yoshikuni Yamamoto, Takakazu Hige, Shoichiro Kudoh, Toshiki Fujihara
  • Patent number: 10438418
    Abstract: A method includes generating first virtual space data for defining a first virtual space. The first virtual space includes a first avatar associated with a first user terminal; and a first virtual room including the first avatar and a first virtual screen. The method includes detecting a movement of a head mounted device (HMD) included in the first user terminal. The method includes identifying a visual field in accordance with the detected movement of the HMD. The method includes displaying, on the HMD, a visual-field image corresponding to the visual field. The method includes receiving, from a second user terminal, a visiting request signal requesting that a second avatar associated with the second user terminal visit the first virtual room. The method includes updating the first virtual space data by updating a size of the first virtual screen based on a number of avatars arranged in the first virtual room.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: October 8, 2019
    Assignee: COLOPL, INC.
    Inventors: Ryota Iwai, Ryuji Okazaki
  • Publication number: 20190175777
    Abstract: The present invention provides an odor-modulating agent that modulates malodors generated in daily living environments or industries to different odors so that harm caused by the malodors can be easily solved, and an odor-modulating method. Specifically, the present invention provides an odor-modulating agent comprising at least one oxygen-containing cyclic compound selected from the group consisting of furan compounds, pyran compounds, and cyclopentanone derivatives.
    Type: Application
    Filed: May 25, 2017
    Publication date: June 13, 2019
    Applicants: YAMAMOTO PERFUMERY CO., LTD., SHIKIBO LTD., TOPPAN PRINTING CO., LTD.
    Inventors: Ryota Iwai, Yutaka Tsujimoto, Yoshikuni Yamamoto, Takakazu Hige, Shoichiro Kudoh, Toshiki Fujihara
  • Publication number: 20180165887
    Abstract: A method includes generating first virtual space data for defining a first virtual space. The first virtual space includes a first avatar associated with a first user terminal; and a first virtual room including the first avatar and a first virtual screen. The method includes detecting a movement of a head mounted device (HMD) included in the first user terminal. The method includes identifying a visual field in accordance with the detected movement of the HMD. The method includes displaying, on the HMD, a visual-field image corresponding to the visual field. The method includes receiving, from a second user terminal, a visiting request signal requesting that a second avatar associated with the second user terminal visit the first virtual room. The method includes updating the first virtual space data by updating a size of the first virtual screen based on a number of avatars arranged in the first virtual room.
    Type: Application
    Filed: December 7, 2017
    Publication date: June 14, 2018
    Inventors: Ryota IWAI, Ryuji OKAZAKI
  • Patent number: 9345145
    Abstract: An electroless gold plating solution with which one or more openings formed in a resist overlying a substrate can be filled in a short time, the openings having a width on the order of micrometer, in particular, 100 ?m or smaller, in terms of the width of the exposed substrate area, and having a height of 3 ?m or larger. The electroless gold plating solution contains a deposition accelerator for deposition in fine areas, and a microfine pattern of 100 ?m or finer is formed therefrom.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: May 17, 2016
    Assignee: Kanto Kagaku Kabushiki Kaisha
    Inventors: Ryota Iwai, Tomoaki Tokuhisa, Masaru Kato, Tokihiko Yokoshima, Masahiro Aoyagi, Yasuhiro Yamaji, Katsuya Kikuchi, Hiroshi Nakagawa
  • Publication number: 20120119352
    Abstract: An electroless gold plating solution with which one or more openings formed in a resist overlying a substrate can be filled in a short time, the openings having a width on the order of micrometer, in particular, 100 ?m or smaller, in terms of the width of the exposed substrate area, and having a height of 3 ?m or larger. The electroless gold plating solution contains a deposition accelerator for deposition in fine areas, and a microfine pattern of 100 ?m or finer is formed therefrom.
    Type: Application
    Filed: March 10, 2010
    Publication date: May 17, 2012
    Applicant: Kanto Kagaku Kabushiki Kaisha
    Inventors: Ryota Iwai, Tomoaki Tokuhisa, Masaru Kato, Tokihiro Yokoshima, Masahiro Aoyagi, Yasuhiro Yamaji, Katsuya Kikuchi, Hiroshi Nakagawa
  • Publication number: 20120031764
    Abstract: Disclosed is a microcrystalline-to-amorphous gold alloy-plated film having excellent electrical properties and excellent mechanical properties. Physical properties including both the advantageous properties of a crystalline structure and the advantageous properties of an amorphous structure can be obtained by allowing a microcrystalline phase and an amorphous phase to exist in a mixed state at a specific ratio. The average particle diameter of the microcrystals is 30 nm or smaller, the volume fraction of the microcrystals is 10 to 90%, the knoop hardness is Hk 180 or more, the specific resistivity is 200 ??-cm or less. In the film, hardness and abrasion resistance can be improved while maintaining a good specific resistivity value and chemical stability both inherent to gold at practically insignificant levels. Therefore, the film is useful as a material for connecting an electric or electronic component such as a connector and a relay.
    Type: Application
    Filed: February 17, 2010
    Publication date: February 9, 2012
    Applicants: Kanto Kagaku Kabushiki Kaisha, Waseda University
    Inventors: Tetsuya Osaka, Yutaka Okinaka, Kazutaka Senda, Ryota Iwai, Masaru Kato
  • Patent number: 7022169
    Abstract: An electroless gold plating solution is provided that contains no cyanide compound as a source of gold and that contains a decomposition inhibitor represented by general formula (1), provided that, in a case in which the solution contains a gold complex of sulfite and the decomposition inhibitor is cytosine, the pH 6.0 or less is excluded. In the formula, R1 to R4 denote hydrogen atom(s), alkyl group(s) having 1 to 10 carbon atom(s), which may have substituent(s), aryl group(s) having 6 to 10 carbon atoms, which may have substituent(s), alkoxy group(s) having 1 to 10 carbon atom(s), which may have substituent(s), amino group(s) (—NH2), hydroxyl group(s) (—OH), ?O, or halogen atom(s), R2 and R3 or R3 and R4 may crosslink with each other and form a saturated or unsaturated ring and the saturated or unsaturated ring may include oxygen, sulfur or nitrogen atom(s), each of the above-mentioned substituents may be a halogen atom or a cyano group, and may be a single bond or a double bond.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: April 4, 2006
    Assignee: Kanto Kagaku Kabushiki Kaisha
    Inventors: Ryota Iwai, Tomoaki Tokuhisa, Masaru Kato
  • Patent number: 6855191
    Abstract: An electroless gold plating solution is provided in which an amount of gold deposited by a displacement reaction is at least 15 ?g/cm2, and the electroless gold plating solution includes a reducing agent that is oxidized by gold, and a reducing agent that is of the same type as or is a different type from the above reducing agent and is oxidized by a substrate metal. The solution can form a uniform gold coating having good adhesion and low porosity in one step.
    Type: Grant
    Filed: January 29, 2003
    Date of Patent: February 15, 2005
    Assignee: Kanto Kagaku Kabushiki Kaisha
    Inventors: Masaru Kato, Ryota Iwai
  • Publication number: 20040118317
    Abstract: An electroless gold plating solution is provided that contains no cyanide compound as a source of gold and that contains a decomposition inhibitor represented by general formula (1) (provided that a case in which the solution contains a gold complex of sulfite, the decomposition inhibitor is cytosine, and the pH is 6.
    Type: Application
    Filed: December 10, 2003
    Publication date: June 24, 2004
    Applicant: Kanto Kagaku Kabushiki Kaisha
    Inventors: Ryota Iwai, Tomoaki Tokuhisa, Tomoaki Tokuhisa
  • Publication number: 20030150353
    Abstract: An electroless gold plating solution is provided in which an amount of gold deposited by a displacement reaction is at least 15 &mgr;g/cm2, and the electroless gold plating solution includes a reducing agent that is oxidized by gold, and a reducing agent that is of the same type as or is a different type from the above reducing agent and is oxidized by a substrate metal. The solution can form a uniform gold coating having good adhesion and low porosity in one step.
    Type: Application
    Filed: January 29, 2003
    Publication date: August 14, 2003
    Applicant: Kanto Kagaku Kabushiki Kaisha
    Inventors: Masaru Kato, Ryota Iwai