Patents by Inventor Ryuichi Saito
Ryuichi Saito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11576084Abstract: A resource management system includes a resource management device that manages a usage of a resource, a reservation management device that manages a reservation for the resource, and a communication relay device that communicates with the resource management device. The resource management device receives reservation information transmitted from the reservation management device. The reservation information is information on the reservation for the resource. The resource management device transmits, to the communication relay device, a request for identification information identifying the communication relay device. The resource management device receives the identification information, which is transmitted from the communication relay device in response to the request. The identification information is used to execute an event associated with the reservation information.Type: GrantFiled: May 21, 2021Date of Patent: February 7, 2023Assignee: Ricoh Company, Ltd.Inventor: Ryuichi Saito
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Patent number: 11394885Abstract: A predetermined image processing is carried out on the images that have been taken by the cameras 101 through 108 attached to a side of the cars that form a train before the images are displayed on the monitor 301 that is mounted in the train. That is to say, as a first image processing, among the images to be displayed, a left-right inversion process is carried out on the images where the positional relationship between the cars and the platform in the image is opposite between left and right to the positional relationship as viewed in the direction in which the train is to travel. In addition, as a second image processing, a cutout process is carried out on the images to be displayed so that the cutout regions differ in accordance with the opening and closing state of the doors.Type: GrantFiled: July 31, 2017Date of Patent: July 19, 2022Assignee: Hitachi Kokusai Electric Inc.Inventors: Ryuichi Saito, Yohei Yamamoto, Takahiro Funahashi
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Patent number: 11217431Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.Type: GrantFiled: July 17, 2019Date of Patent: January 4, 2022Assignee: KIOXIA CORPORATIONInventors: Ryuichi Saito, Seiji Morita, Ryosuke Yamamoto
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Publication number: 20210392550Abstract: A resource management system includes a resource management device that manages a usage of a resource, a reservation management device that manages a reservation for the resource, and a communication relay device that communicates with the resource management device. The resource management device receives reservation information transmitted from the reservation management device. The reservation information is information on the reservation for the resource. The resource management device transmits, to the communication relay device, a request for identification information identifying the communication relay device. The resource management device receives the identification information, which is transmitted from the communication relay device in response to the request. The identification information is used to execute an event associated with the reservation information.Type: ApplicationFiled: May 21, 2021Publication date: December 16, 2021Applicant: Ricoh Company, Ltd.Inventor: Ryuichi Saito
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Patent number: 11108994Abstract: A monitoring server of a platform-side monitoring system analyzes an image taken by a plurality of platform monitoring cameras installed on a platform, and transmits information on the results of detection to a car-side monitoring system in the case where an object of attention is detected from the image. A control unit of the car-side monitoring system allows the monitor to display an image taken by the car camera which corresponds to the platform monitoring camera that has taken an image of the object of attention in a mode that is different from that of the images taken by the other car cameras on the basis of the information on the results of detection that has been received from the platform-side monitoring system.Type: GrantFiled: August 20, 2019Date of Patent: August 31, 2021Assignee: Hitachi Kokusai Electric Inc.Inventors: Ryuichi Saito, Yohei Yamamoto
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Publication number: 20210227180Abstract: A monitoring server of a platform-side monitoring system analyzes an image taken by a plurality of platform monitoring cameras installed on a platform, and transmits information on the results of detection to a car-side monitoring system in the case where an object of attention is detected from the image. A control unit of the car-side monitoring system allows the monitor to display an image taken by the car camera which corresponds to the platform monitoring camera that has taken an image of the object of attention in a mode that is different from that of the images taken by the other car cameras on the basis of the information on the results of detection that has been received from the platform-side monitoring system.Type: ApplicationFiled: August 20, 2019Publication date: July 22, 2021Inventors: Ryuichi SAITO, Yohei YAMAMOTO
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Publication number: 20210150423Abstract: A resource reservation system includes an information processing apparatus configured to retain reservation information of resources, and an information processing terminal. The information processing terminal includes a memory and a processor coupled to the memory and configured to receive reservation information of one or more resources among the resources from the information processing apparatus, display the reservation information of the one or more resources, and receive an operation for each of the one or more resources.Type: ApplicationFiled: November 12, 2020Publication date: May 20, 2021Applicant: Ricoh Company, Ltd.Inventors: Ryoh TOMOSUGI, Ryuichi SAITO, Natsumi FUJIMURA
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Patent number: 10966355Abstract: An electric power conversion apparatus includes a channel case in which a cooling water channel is formed; a double side cooling semiconductor module that has an upper and lower arms series circuit of an inverter circuit; a capacitor module; a direct current connector; and an alternate current connector. The semiconductor module includes first and second heat dissipation metals whose outer surfaces are heat dissipation surfaces, the upper and lower arms series circuit is disposed tightly between the first heat dissipation metal and the second heat dissipation metal, and the semiconductor module further includes a direct current positive terminal, a direct current negative terminal, and an alternate current terminal which protrude to outside. The channel case is provided with the cooling water channel which extends from a cooling water inlet to a cooling water outlet, and a first opening which opens into the cooling water channel.Type: GrantFiled: November 18, 2019Date of Patent: March 30, 2021Assignee: Hitachi, Ltd.Inventors: Takeshi Tokuyama, Kinya Nakatsu, Ryuichi Saito, Keisuke Horiuchi, Toshiya Satoh, Hideki Miyazaki
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Publication number: 20210011704Abstract: A progress management system in which a plurality of progress management terminals that execute browser software and an information processing apparatus communicate with each other, terminals, the one of the progress management terminals sends an issue that the progress is updated to the information processing apparatus, and the information processing apparatus, when the issue that the progress is updated is received, reflects the issue that the progress is updated on other one or ones of the progress management terminals that display a same screen as that of the one of the progress management terminals using bidirectional communications, and browser software of the other one or ones of the progress management terminals automatically update the same screen as that of the one of the progress management terminals.Type: ApplicationFiled: June 25, 2020Publication date: January 14, 2021Applicant: Ricoh Company, Ltd.Inventor: Ryuichi SAITO
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Publication number: 20210012249Abstract: A resource management system in which a progress management terminal and an information processing terminal communicate with an information processing apparatus through a network, the progress management terminal sending, in a case where the progress management terminal receives depressing of a first button on a screen for managing a resource displayed by the progress management terminal, a first issue indicating that the first button is depressed, to the information processing apparatus, the information processing apparatus including a processor which performs, in a case where the first issue is received, a same process as a process which is performed when the information processing apparatus receives a second issue indicating that a second button on a screen for receiving a use of the resource displayed on the information processing terminal is depressed, from the information processing terminal, even when the second issue is received from the information processing terminal.Type: ApplicationFiled: June 30, 2020Publication date: January 14, 2021Applicant: Ricoh Company, Ltd.Inventor: Ryuichi SAITO
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Patent number: 10856450Abstract: Technology leading to a size reduction in a power conversion apparatus comprising a cooling function and technology relating to enhancing productivity and enhancing reliability necessary for commercial production are provided. Series circuits comprising an upper arm and lower arm of an inverter circuit are built in a single semiconductor module 500. The semiconductor module has cooling metal on two sides. An upper arm semiconductor chip and lower arm semiconductor chip are wedged between the cooling metals. The semiconductor module is inserted inside a channel case main unit 214. A DC positive electrode terminal 532, a DC negative electrode terminal 572, and an alternating current terminal 582 of a semiconductor chip are disposed in the semiconductor module. The DC terminals 532 and 572 are electrically connected with a terminal of a capacitor module. The alternating current terminal 582 is electrically connected with a motor generator via an AC connector.Type: GrantFiled: February 4, 2019Date of Patent: December 1, 2020Assignee: HITACHI, LTD.Inventors: Takeshi Tokuyama, Kinya Nakatsu, Ryuichi Saito
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Patent number: 10811252Abstract: A pattern-forming method includes forming a first film above a material to be processed, processing the first film into a pattern to be formed in the material to be processed, providing a second film on the first film and the material to be processed, supplying a precursor containing at least one of a metal material or a semiconductor material to the second film, removing the first film, and processing the material to be processed using the second film impregnated with at least one of the metal material and the semiconductor material, as a mask.Type: GrantFiled: August 30, 2018Date of Patent: October 20, 2020Assignee: TOSHIBA MEMORY CORPORATIONInventors: Ryosuke Yamamoto, Ryuichi Saito, Seiji Morita, Ryoichi Suzuki, Takeharu Motokawa, Shinichi Ito, Soichi Inoue
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Patent number: 10811268Abstract: According to one embodiment, a substrate processing apparatus comprises a chamber for a substrate that has a target film thereon. The apparatus includes a first gas introducing unit to introduce a precursor gas into the chamber, a second gas introducing unit that introduces a etching gas for etching the target film into the chamber, and a controller configured to control the first gas introducing unit and the second gas introducing unit to cause the first gas and the second gas to be alternately introduced to the chamber.Type: GrantFiled: August 13, 2018Date of Patent: October 20, 2020Assignee: TOSHIBA MEMORY CORPORATIONInventors: Yusuke Kasahara, Shinichi Ito, Seiji Morita, Ryosuke Yamamoto, Ryuichi Saito
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Publication number: 20200213519Abstract: A predetermined image processing is carried out on the images that have been taken by the cameras 101 through 108 attached to a side of the cars that form a train before the images are displayed on the monitor 301 that is mounted in the train. That is to say, as a first image processing, among the images to be displayed, a left-right inversion process is carried out on the images where the positional relationship between the cars and the platform in the image is opposite between left and right to the positional relationship as viewed in the direction in which the train is to travel. In addition, as a second image processing, a cutout process is carried out on the images to be displayed so that the cutout regions differ in accordance with the opening and closing state of the doors.Type: ApplicationFiled: July 31, 2017Publication date: July 2, 2020Inventors: Ryuichi SAITO, Yohei YAMAMOTO, Takahiro FUNAHASHI
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Publication number: 20200093039Abstract: An electric power conversion apparatus includes a channel case in which a cooling water channel is formed; a double side cooling semiconductor module that has an upper and lower arms series circuit of an inverter circuit; a capacitor module; a direct current connector; and an alternate current connector. The semiconductor module includes first and second heat dissipation metals whose outer surfaces are heat dissipation surfaces, the upper and lower arms series circuit is disposed tightly between the first heat dissipation metal and the second heat dissipation metal, and the semiconductor module further includes a direct current positive terminal, a direct current negative terminal, and an alternate current terminal which protrude to outside. The channel case is provided with the cooling water channel which extends from a cooling water inlet to a cooling water outlet, and a first opening which opens into the cooling water channel.Type: ApplicationFiled: November 18, 2019Publication date: March 19, 2020Inventors: Takeshi TOKUYAMA, Kinya NAKATSU, Ryuichi SAITO, Keisuke HORIUCHI, Toshiya SATOH, Hideki MIYAZAKI
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Patent number: 10524398Abstract: An electric power conversion apparatus includes a channel case in which a cooling water channel is formed; a double side cooling semiconductor module that has an upper and lower arms series circuit of an inverter circuit; a capacitor module; a direct current connector; and an alternate current connector. The semiconductor module includes first and second heat dissipation metals whose outer surfaces are heat dissipation surfaces, the upper and lower arms series circuit is disposed tightly between the first heat dissipation metal and the second heat dissipation metal, and the semiconductor module further includes a direct current positive terminal, a direct current negative terminal, and an alternate current terminal which protrude to outside. The channel case is provided with the cooling water channel which extends from a cooling water inlet to a cooling water outlet, and a first opening which opens into the cooling water channel.Type: GrantFiled: April 10, 2017Date of Patent: December 31, 2019Assignee: Hitachi, Ltd.Inventors: Takeshi Tokuyama, Kinya Nakatsu, Ryuichi Saito, Keisuke Horiuchi, Toshiya Satoh, Hideki Miyazaki
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Publication number: 20190341229Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.Type: ApplicationFiled: July 17, 2019Publication date: November 7, 2019Applicant: Toshiba Memory CorporationInventors: Ryuichi SAITO, Seiji MORITA, Ryosuke YAMAMOTO
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Publication number: 20190287809Abstract: According to one embodiment, a substrate processing apparatus comprises a chamber for a substrate that has a target film thereon. The apparatus includes a first gas introducing unit to introduce a precursor gas into the chamber, a second gas introducing unit that introduces a etching gas for etching the target film into the chamber, and a controller configured to control the first gas introducing unit and the second gas introducing unit to cause the first gas and the second gas to be alternately introduced to the chamber.Type: ApplicationFiled: August 13, 2018Publication date: September 19, 2019Inventors: Yusuke KASAHARA, Shinichi ITO, Seiji MORITA, Ryosuke YAMAMOTO, Ryuichi SAITO
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Patent number: 10395899Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.Type: GrantFiled: February 8, 2018Date of Patent: August 27, 2019Assignee: Toshiba Memory CorporationInventors: Ryuichi Saito, Seiji Morita, Ryosuke Yamamoto
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Publication number: 20190259606Abstract: A pattern-forming method includes forming a first film above a material to be processed, processing the first film into a pattern to be formed in the material to be processed, providing a second film on the first film and the material to be processed, supplying a precursor containing at least one of a metal material or a semiconductor material to the second film, removing the first film, and processing the material to be processed using the second film impregnated with at least one of the metal material and the semiconductor material, as a mask.Type: ApplicationFiled: August 30, 2018Publication date: August 22, 2019Inventors: Ryosuke YAMAMOTO, Ryuichi SAITO, Seiji MORITA, Ryoichi SUZUKI, Takeharu MOTOKAWA, Shinichi ITO, Soichi INOUE