Patents by Inventor Sadao Fujikura

Sadao Fujikura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6468726
    Abstract: A photothermographic image-recording material having a good adhesion between a subbing layer and a support or an image-forming layer is described, which comprises a support, at least one subbing layer comprising a polyester provided on at least one side of the support and an image-forming layer provided on the subbing layer, wherein the polyester is a polyester having a glass transition temperature of from 40° C. to 100° C.
    Type: Grant
    Filed: July 18, 2001
    Date of Patent: October 22, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Haraoka, Sadao Fujikura
  • Patent number: 6413705
    Abstract: A heat-developable recording material comprises a support, at least one undercoat layer and at least one image-forming layer, in this order, wherein the undercoat layer comprises: polyester resins containing at least two kinds of water-soluble and water-dispersible polyester resins, each of which has a different glass transition temperature (Tg); and fine particles having an average particle diameter (k) of from 0.1 &mgr;m to 2.0 &mgr;m, and the undercoat layer has an average film thickness (d) of from 0.05 &mgr;m to 1.0 &mgr;m, and (k)/(d) is in the range from 2.0 to 10.0.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: July 2, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Hiroshi Haraoka
  • Publication number: 20020076663
    Abstract: A heat-developable recording material comprises a support, at least one undercoat layer and at least one image-forming layer, in this order, wherein the undercoat layer comprises: polyester resins containing at least two kinds of water-soluble and water-dispersible polyester resins, each of which has a different glass transition temperature (Tg); and fine particles having an average particle diameter (k) of from 0.1 &mgr;m to 2.0 &mgr;m, and the undercoat layer has an average film thickness (d) of from 0.05 &mgr;m to 1.0 &mgr;m, and (k)/(d) is in the range from 2.0 to 10.0.
    Type: Application
    Filed: October 16, 2001
    Publication date: June 20, 2002
    Inventors: Sadao Fujikura, Hiroshi Haraoka
  • Publication number: 20020042031
    Abstract: A photothermographic image-recording material having a good adhesion between a subbing layer and a support or an image-forming layer is described, which comprises a support, at least one subbing layer comprising a polyester provided on at least one side of the support and an image-forming layer provided on the subbing layer, wherein the polyester is a polyester having a glass transition temperature of from 40° C. to 100° C.
    Type: Application
    Filed: July 18, 2001
    Publication date: April 11, 2002
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Hiroshi Haraoka, Sadao Fujikura
  • Patent number: 5916714
    Abstract: A pixel sheet provided with black matrix is prepared by the steps of: preparing a pixel sheet by forming pixels on a light-transmissive support under the condition that a space area is left between the pixels; covering the pixels and the space area of the pixel sheet with a photosensitive black resin layer; exposing to light the pixel sheet having the black resin layer on the side of the support; bringing the light-exposed pixel sheet in contact with a developing solution to peel the black resin layer on the pixels off, while keeping the black resin layer on the support in the space area; and heating the developed pixel sheet so that the black resin layer in the space area is fully cured.
    Type: Grant
    Filed: July 22, 1997
    Date of Patent: June 29, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Morimasa Sato, Sadao Fujikura, Masayuki Iwasaki
  • Patent number: 5578413
    Abstract: A photosensitive transfer material is disclosed including a temporary substrate having provided thereon an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer in this order, the transfer material having an interlaminar adhesion which is lowest between the thermoplastic resin layer and the temporary substrate, wherein the alkali-soluble thermoplastic resin layer contains (A) an alkali-soluble thermoplastic resin having a weight average molecular weight of from 50,000 to 500,000 and a glass transition temperature of from 0.degree. to 140.degree. C. and (B) an alkali-soluble thermoplastic resin layer having a weight average molecular weight of from 3,000 to 30,000 and a glass transition temperature of from 30.degree. to 170.degree. C. at an (A)/(B) weight ratio of from 5/95 to 95/5. The transfer material can be transferred to a permanent substrate at a high speed without entrapping air bubbles due to unevenness on the permanent substrate.
    Type: Grant
    Filed: March 15, 1996
    Date of Patent: November 26, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Minoru Wada
  • Patent number: 5525454
    Abstract: A photosensitive transfer material is disclosed including a temporary substrate having provided thereon an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer in this order, the transfer material having an interlaminar adhesion which is lowest between the thermoplastic resin layer and the temporary substrate, wherein the alkali-soluble thermoplastic resin layer contains (A) an alkali-soluble thermoplastic resin having a weight average molecular weight of from 50,000 to 500,000 and a glass transition temperature of from 0.degree. to 140.degree. C. and (B) an alkali-soluble thermoplastic resin layer having a weight average molecular weight of from 3,000 to 30,000 and a glass transition temperature of from 30.degree. to 170.degree. C. at an (A)/(B) weight ratio of from 5/95 to 95/5. The transfer material can be transferred to a permanent substrate at a high speed without entrapping air bubbles due to unevenness on the permanent substrate.
    Type: Grant
    Filed: July 8, 1994
    Date of Patent: June 11, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Minoru Wada
  • Patent number: 5328803
    Abstract: A photopolymerizable composition developable with an alkali aqueous solution which comprises a carboxyl group-containing high polymer binder, a photopolymerizable monomer, a photopolymerization initiator system and a compound of a specific structure is disclosed. The photopolymerizable composition shows a good keeping stability in a state of lamination on a metal board and thus is highly useful in the production of, for example, dry films for print basic boards, photoresists, photomasks, lithograph boards and resin relief boards.
    Type: Grant
    Filed: September 11, 1991
    Date of Patent: July 12, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Masayuki Iwasaki, Yuichi Wakata
  • Patent number: 5300401
    Abstract: The photopolymerizable resin material of the present invention includes (1) a support, (2) a water soluble intermediate layer of 0.1 to 50 .mu.m in thickness superposed on the support and (3) a photopolymerizable resin layer superposed on the intermediate layer which contains at least one carboxyl group-containing binder in an amount of from 40 to 90% by weight based on the solid content in the photopolymerizable resin layer, wherein the intermediate layer includes a cellulose derivative which has a polymerization degree of from 20 to 1,000 and is selected from the group consisting of an aqueous alkali solution soluble hydroxyalkyl cellulose, carboxyalkyl cellulose and cellulose ether. The present invention is also directed to a process for preparing a printed circuit which includes laminating the photopolymerizable material on a board, peeling off the support and then effecting pattern exposure and development.
    Type: Grant
    Filed: June 9, 1993
    Date of Patent: April 5, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Masayuki Iwasaki
  • Patent number: 5096799
    Abstract: A photopolymerizable composition capable of being developed with an aqueous alkali solution, comprising(1) a carboxyl group-containing polymer binder,(2) a photopolymerization initiator system containing a lophine dimer, and(3) a carboxy group-containing compound having the weight-average molecular weight of from more than 300 to about 1000 represented by formula (Ia) or (Ib): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 , and Y.sub.4, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group having from 1 to 12 carbon atoms, or an aryl group having from 6 to 10 carbon atoms, and with respect to formula (Ib), Y.sub.1 and Y.sub.4 may form an aromatic hydrocarbon ring having from 6 to 10 carbon atoms, andwhereinR.sub.1, R.sub.2, R.sub.3, R.sub.4, and R.sub.
    Type: Grant
    Filed: September 21, 1990
    Date of Patent: March 17, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Yuichi Wakata, Masayuki Iwasaki
  • Patent number: 5030548
    Abstract: A photo-polymerizable composition is disclosed, which comprisesa thermoplastic polymeric binder;a non-gaseous ethylenically unsaturated compound;a photo-polymerization initiator system composed of 4,4'-bis(dialkylamino)benzophenone, aromatic ketone and lophine dimer;an organic halogen compound; and a leuco dye.
    Type: Grant
    Filed: August 10, 1989
    Date of Patent: July 9, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Masayuki Iwasaki, Minoru Maeda, Minoru Wada
  • Patent number: 4948700
    Abstract: A liquid heat- and light-sensitive resinous composition which contains as main components (A) a photopolymerizable compound prepared by reacting a novolak type epoxy compound with successively, an unsaturated monocarboxylic acid represented by at least one of formula (I) and (II) and a saturated or unsaturated polybasic acid anhydride, (B) a photopolymerizable compound having at least one ethylenic unsaturated double bond, (C) an epoxy compound having at least one epoxy group, (D) a photopolymerization initiator, (E) a thermosetting catalysts capable of making an epoxy group undergo a thermal reaction, and (F) an organic solvent; ##STR1## wherein R represents -H or -CH.sub.3 ; R.sup.1, R.sup.2 and R.sup.3 each represents an unsubstituted or substituted alkylene group, an unsubstituted or substituted arylene group, or an unsubstituted or substituted aralkylene group; and X represents -COO-, -OCO- or -O-.
    Type: Grant
    Filed: August 3, 1989
    Date of Patent: August 14, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Minoru Maeda, Yuichi Wakata, Sadao Fujikura, Masayuki Iwasaki
  • Patent number: 4925768
    Abstract: A photopolymerizable composition comprising an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds in the molecule, a photopolymerization initiator, and a binder, wherein the binder is a tetrapolymer having a weight average molecular weight of from 10,000 to 50,000 represented by formula (I): ##STR1## wherein R represents a hydrogen atom or a methyl group; and w, x, y and z each represents mol percent (mol %), w ranging from about 45 to 65; x ranging from about 5 to 18; y ranging from about 2 to 10; and z ranging from about 20 to 40 and where C.sub.4 H.sub.9 (n) represents an n-butyl group. The photopolymerizable composition can be developed with a weakly alkaline aqueous solution, has sufficient flexibility to be laminated on a base as a dry film, high adhesiveness to a base and reduced surface tackiness.
    Type: Grant
    Filed: June 12, 1989
    Date of Patent: May 15, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Iwasaki, Sadao Fujikura, Yuichi Wakata, Yasunori Takata
  • Patent number: 4923781
    Abstract: A photopolymerizable composition comprises a polyfunctional monomer, a photopolymerization initiator, an organic halogen compound and a 3,6-diaminofluoran derivative. The 3,6-diaminofluoran has the formula (I): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 is hydrogen, an alkyl group, a cycloalkyl group, an aralkyl group, an aryl group or a heterocyclic group, R.sup.1 and R.sup.2 (also R.sup.3 and R.sup.4 may form a heterocyclic ring in conjunction with the adjoining nitrogen atom, provided that at least two of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are aryl groups, or at least one group of the group containing R.sup.1 and R.sup.2 and the group containing R.sup.3 and R.sup.4 forms in conjunction with the adjoining nitrogen atom a heterocyclic ring; each of R.sup.5, R.sup.6 and R.sup.
    Type: Grant
    Filed: October 23, 1989
    Date of Patent: May 8, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Sadao Fujikura, Masayuki Iwasaki, Minoru Maeda, Ken Iwakura
  • Patent number: 4657942
    Abstract: A photopolymerizable composition is described, comprising an addition polymerizable compound having at least two ethylenically unsaturated bonds in the molecule, at least one photopolymerization initiator, and at least one of 2-mercapto-5-substituted thiadiazole compounds represented by formulae (I) and (II) ##STR1## wherein R represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylthio group, or a substituted or unsubstituted aralkylthio group; and R' represents a substituted or unsubstituted alkylene group. The composition has a remarkably good photosensitivity.
    Type: Grant
    Filed: January 27, 1986
    Date of Patent: April 14, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Iwasaki, Minoru Maeda, Sadao Fujikura