Patents by Inventor Sander Frederik Wuister

Sander Frederik Wuister has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10551736
    Abstract: A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jozef Maria Finders, Tamara Druzhinina, Emiel Peeters, Sander Frederik Wuister, Christianus Martinus Van Heesch, Eddy Cornelis Antonius Van Der Heijden, Henri Marie Joseph Boots
  • Patent number: 10538859
    Abstract: A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.
    Type: Grant
    Filed: December 9, 2011
    Date of Patent: January 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Emiel Peeters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Johan Frederik Dijksman, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch
  • Publication number: 20190377265
    Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
    Type: Application
    Filed: August 26, 2019
    Publication date: December 12, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Catharinus DE SCHIFFART, Michael Jozef Mathijs RENKENS, Gerard VAN SCHOTHORST, Andre Bernardus JEUNINK, Gregor Edward VAN BAARS, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN, Norbert Erwin Therenzo JANSEN, Toon HARDEMAN, George Arie Jan DE FOCKERT, Johan Frederik DIJKSMAN
  • Publication number: 20190339615
    Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovsikte material.
    Type: Application
    Filed: July 16, 2019
    Publication date: November 7, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Sander Frederik WUISTER, Oktay YiLDiRiM, Gijsbert RISPENS, Alexey Olegovich POLYAKOV
  • Patent number: 10416555
    Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovsikte material.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: September 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Frederik Wuister, Oktay Yildirim, Gijsbert Rispens, Alexey Olegovich Polyakov
  • Patent number: 10410914
    Abstract: A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: September 10, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Frederik Wuister, Andre Bernardus Jeunink, Emiel Peeters
  • Patent number: 10339260
    Abstract: A method of determining a characteristic of a guiding template for guiding self-assembly of block copolymer to form an entirety of a design layout, or a portion thereof, including a plurality of design features, each design feature including one or more elemental features, the method including selecting a characteristic of a guiding template for each of the one or more elemental features of the plurality of design features from a database or a computer readable non-transitory medium, the database or the computer readable non-transitory medium storing a characteristic of a guiding template for each of the one or more elemental features, and determining the characteristic of the guiding template to form the entirety of the design layout, or the portion thereof, by combining the selected characteristic of the guiding template for the one or more elemental features for each of the plurality of design features.
    Type: Grant
    Filed: August 8, 2014
    Date of Patent: July 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Bart Laenens, Sander Frederik Wuister
  • Publication number: 20190129301
    Abstract: A resist composition having a) metal-containing nanoparticles and/or nanoclusters, and b) ligands and or organic linkers, wherein one or both of a) or b) are multivalent. A resist composition wherein: the resist composition is a negative resist and the nanoparticles and/or nanoclusters cluster upon crosslinking of the ligands and/or organic linkers following exposure to electromagnetic radiation or an electron beam; or the resist composition is a negative resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam allowing the nanoparticles and/or nanoclusters to cluster together; or the resist composition is a positive resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam.
    Type: Application
    Filed: April 21, 2017
    Publication date: May 2, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Willem-Pieter VOORTHUIJZEN, Marie-Claire VAN LARE, Sander Frederik WUISTER
  • Patent number: 10240250
    Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.
    Type: Grant
    Filed: October 2, 2012
    Date of Patent: March 26, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Thanh Trung Nguyen, Jozef Maria Finders, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Eddy Cornelis Antonius Van der Heijden, Hieronymus Johannus Christiaan Meessen, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Tamara Druzhinina, Jessica Margaretha De Ruiter
  • Patent number: 10222693
    Abstract: A method of aligning a template and a substrate for imprint lithography involves using a mask pattern of the template and a luminescent marker pattern of the substrate, the method including aligning the template mask pattern and the substrate marker pattern using a radiation intensity measurement of radiation emitted by the luminescent marker pattern and having passed the template mask pattern. The mask pattern and the luminescent marker pattern may each be shaped to provide a turning point in the intensity of detected radiation emitted from the marker pattern, and passing through the mask pattern to a detector, as a function of relative displacement at the aligned position. The displacement of the template and substrate may be aligned by identifying the turning point in radiation intensity. The marker pattern may be fluorescent with the emitted radiation excited by a radiation source.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Frederik Dijksman, Anke Pierik, Sander Frederik Wuister, Roelof Koole
  • Patent number: 10127336
    Abstract: A method of determining an uncertainty in the position of a domain within a self-assembly block copolymer (BCP) feature. The method includes simulating a BCP feature, calculating a minimum energy position of a first domain within the simulated BCP feature, simulating the application of a potential that causes the position of the first domain to be displaced from the minimum energy position, simulating release of the potential back toward the minimum energy, recording a plurality of energies of the BCP feature during the release and recording at each of the plurality of energies a displacement of the first domain from the minimum energy position, calculating, from the recorded energies and recorded displacements, a probability distribution indicating a probability of the first domain being displaced from the minimum energy position, and, from the probability distribution, calculating an uncertainty in the position of the first domain within the BCP feature.
    Type: Grant
    Filed: May 5, 2014
    Date of Patent: November 13, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Tamara Druzhinina, Jan Van Male, Joanne Klein-Wolterink, Davide Ambesi
  • Publication number: 20180162040
    Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.
    Type: Application
    Filed: January 8, 2018
    Publication date: June 14, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
  • Patent number: 9958774
    Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: May 1, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Arie Jeffrey Den Boef, Andre Bernardus Jeunink, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
  • Publication number: 20180088468
    Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
    Type: Application
    Filed: December 1, 2017
    Publication date: March 29, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Catharinus DE SCHIFFART, Michael Jozef Mathijs RENKENS, Gerard VAN SCHOTHORST, Andre Bernardus JEUNINK, Gregor Edward VAN BAARS, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN, Norbert Erwin Therenzo JANSEN, Toon HARDEMAN, George Arie Jan DE FOCKERT, Johan Frederik DIJKSMAN
  • Patent number: 9927699
    Abstract: An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.
    Type: Grant
    Filed: March 23, 2011
    Date of Patent: March 27, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine
  • Patent number: 9889597
    Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.
    Type: Grant
    Filed: November 11, 2013
    Date of Patent: February 13, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
  • Patent number: 9864279
    Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: January 9, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
  • Publication number: 20180004085
    Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovsikte material.
    Type: Application
    Filed: December 1, 2015
    Publication date: January 4, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Sander Frederik WUISTER, Oktay YILDIRIM, Gijsbert RISPENS, Alexey Olegovich POLYAKOV
  • Patent number: 9726973
    Abstract: A lithographic apparatus is disclosed that includes an imprint template holder configured to hold an imprint template, and a dispensing mechanism of polar molecules, wherein the dispensing mechanism of polar molecules is configured to provide polar molecules into a local environment in the vicinity of the imprint template, such that the concentration of polar molecules in the local environment in the vicinity of the imprint template is greater than the concentration of polar molecules in other parts of the lithographic apparatus.
    Type: Grant
    Filed: October 1, 2010
    Date of Patent: August 8, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Sander Frederik Wuister
  • Publication number: 20170200638
    Abstract: A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.
    Type: Application
    Filed: May 13, 2015
    Publication date: July 13, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Sander Frederik WUISTER, Andre Bernardus JEUNINK, Emiel PEETERS