Patents by Inventor Sander Frederik Wuister
Sander Frederik Wuister has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11880640Abstract: A method involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist, performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model, and producing electronic data representing the deformation of the developed resist pattern for the input pattern.Type: GrantFiled: March 7, 2023Date of Patent: January 23, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Chrysostomos Batistakis, Scott Anderson Middlebrooks, Sander Frederik Wuister
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Publication number: 20230221651Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: ApplicationFiled: March 21, 2023Publication date: July 13, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Catharinus DE SCHIFFART, Michael Jozef Mathijs RENKENS, Gerard VAN SCHOTHORST, Andre Bernardus JEUNINK, Gregor Edward VAN BAARS, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN, Norbert Erwin Therenzo JANSEN, Toon HARDEMAN, George Arie Jan DE FOCKERT, Johan Frederik DIJKSMAN
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Publication number: 20230222273Abstract: A method involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist, performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model, and producing electronic data representing the deformation of the developed resist pattern for the input pattern.Type: ApplicationFiled: March 7, 2023Publication date: July 13, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Chrysostomos BATISTAKIS, Scott Anderson Middlebrooks, Sander Frederik Wuister
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Patent number: 11668661Abstract: Apparatuses, systems, and methods for inspecting a semiconductor sample are disclosed. In some embodiments, the sample may comprise a structure having a plurality of openings in a top layer of the structure. In some embodiments, the method may comprise generating an image of the structure using a SEM; inspecting an opening of the plurality of openings by determining a dimension of the opening based on the image and determining an open-state of the opening, based on a contrast of the image; and determining a quality of the opening based on both the determined dimension and the determined open-state of the opening.Type: GrantFiled: September 11, 2020Date of Patent: June 6, 2023Assignee: ASML Netherlands B.V.Inventors: Thomas Jarik Huisman, Sander Frederik Wuister, Hermanus Adrianus Dillen, Dorothea Maria Christina Oorschot
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Patent number: 11635696Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: GrantFiled: December 14, 2020Date of Patent: April 25, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
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Patent number: 11625520Abstract: A method involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist, performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model, and producing electronic data representing the deformation of the developed resist pattern for the input pattern.Type: GrantFiled: November 29, 2018Date of Patent: April 11, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Chrysostomos Batistakis, Scott Anderson Middlebrooks, Sander Frederik Wuister
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Patent number: 11415886Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovskite material.Type: GrantFiled: July 16, 2019Date of Patent: August 16, 2022Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Oktay Yildirim, Gijsbert Rispens, Alexey Olegovich Polyakov
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Patent number: 11016399Abstract: A method of predicting the dominant failure mode and/or the failure rate of a plurality of features formed on a substrate, and an associated inspection apparatus. The method may include determining a placement metric for each feature, the placement metric including a measure of whether the feature is in an expected position, and comparing a distribution of the placement metric to a reference (e.g., Gaussian) distribution. The placement metric may include a boundary metric for a plurality of boundary points on a boundary defining each feature, the boundary metric including a measure of whether a boundary point is in an expected position. The dominant failure mode and/or the failure rate of the plurality of features is predicted from the comparison.Type: GrantFiled: December 10, 2018Date of Patent: May 25, 2021Assignee: ASML Netherlands B.V.Inventors: Marleen Kooiman, Sander Frederik Wuister
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Publication number: 20210096468Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: ApplicationFiled: December 14, 2020Publication date: April 1, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Catharinus DE SCHIFFART, Michael Jozef Mathijs RENKENS, Gerard VAN SCHOTHORST, Andre Bernardus JEUNINK, Gregor Edward VAN BAARS, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN, Norbert Erwin Therenzo JANSEN, Toon HARDEMAN, George Arie Jan DE FOCKERT, Johan Frederik DIJKSMAN
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Publication number: 20210079519Abstract: Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.Type: ApplicationFiled: February 21, 2019Publication date: March 18, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman DE JAGER, Sander Frederik WUISTER, Marie-Claire VAN LARE, Ruben Cornelis MAAS, Alexey Olegovich POLYAKOV, Tamara DRUZHININA, Victoria VORONINA, Evgenia KURGANOVA, Jim Vincent OVERKAMP, Bernardo KASTRUP, Maarten VAN KAMPEN, Alexandr DOLGOV
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Patent number: 10908510Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: GrantFiled: August 26, 2019Date of Patent: February 2, 2021Assignee: ASML Netherlands B.V.Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
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Patent number: 10890851Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: GrantFiled: December 1, 2017Date of Patent: January 12, 2021Assignee: ASML Netherlands B.V.Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
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Publication number: 20210003521Abstract: Apparatuses, systems, and methods for inspecting a semiconductor sample are disclosed. In some embodiments, the sample may comprise a structure having a plurality of openings in a top layer of the structure. In some embodiments, the method may comprise generating an image of the structure using a SEM; inspecting an opening of the plurality of openings by determining a dimension of the opening based on the image and determining an open-state of the opening, based on a contrast of the image; and determining a quality of the opening based on both the determined dimension and the determined open-state of the opening.Type: ApplicationFiled: September 11, 2020Publication date: January 7, 2021Inventors: Thomas Jarik HUISMAN, Sander Frederik WUISTER, Hermanus Adrianus DILLEN, Dorothea Maria Christina OORSCHOT
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Patent number: 10884333Abstract: A method of design or verification for a self-assemblable block copolymer feature, the block copolymer feature including a first domain having a first polymer type and a second domain having a second polymer type, the method including, based on the length of the second polymer type or on an uncertainty in position of the first domain within the block copolymer feature calculated based on the length of the second polymer type, adjusting a parameter of the self-assembly process of a block copolymer feature or verifying a placement of a block copolymer feature.Type: GrantFiled: July 9, 2014Date of Patent: January 5, 2021Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Bart Laenens, Davide Ambesi
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Publication number: 20200348598Abstract: A method for calibrating a resist model. The method includes: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting one or more of the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.Type: ApplicationFiled: December 20, 2018Publication date: November 5, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Marleen KOOIMAN, David Marie RIO, Sander Frederik WUISTER
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Publication number: 20200320238Abstract: A method involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist, performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model, and producing electronic data representing the deformation of the developed resist pattern for the input pattern.Type: ApplicationFiled: November 29, 2018Publication date: October 8, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Chrysostomos BATISTAKIS, Scott Anderson MIDDLEBROOKS, Sander Frederik WUISTER
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Publication number: 20200310254Abstract: A method of predicting the dominant failure mode and/or the failure rate of a plurality of features formed on a substrate, and an associated inspection apparatus. The method may include determining a placement metric for each feature, the placement metric including a measure of whether the feature is in an expected position, and comparing a distribution of the placement metric to a reference (e.g., Gaussian) distribution. The placement metric may include a boundary metric for a plurality of boundary points on a boundary defining each feature, the boundary metric including a measure of whether a boundary point is in an expected position. The dominant failure mode and/or the failure rate of the plurality of features is predicted from the comparison.Type: ApplicationFiled: December 10, 2018Publication date: October 1, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Marleen KOOIMAN, Sander Frederik WUISTER
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Patent number: 10712678Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.Type: GrantFiled: February 17, 2016Date of Patent: July 14, 2020Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Andre Bernardus Jeunink, Arie Jeffrey Den Boef, Vadim Yevgenyevich Banine, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Johan Frederik Dijksman, Carolus Johannes Catharina Schoormans, Adrianus Hendrik Koevoets, Catharinus De Schiffart, Sander Frederik Wuister
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Patent number: 10654217Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: GrantFiled: January 8, 2018Date of Patent: May 19, 2020Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
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Patent number: 10642152Abstract: A method of designing a feature guiding template for guiding self-assembly of block copolymer to form at least two features in a design layout for lithography, the feature guiding template including at least two portions joined by a bottleneck, the method including determining a characteristic of the feature guiding template based on at least a function of geometry of the feature guiding template including a value of a first width of at least one of the portions, a value of a second width of the bottleneck, or a value based on both the first width and the second width.Type: GrantFiled: October 10, 2014Date of Patent: May 5, 2020Assignee: ASML Netherlands B.VInventors: Sander Frederik Wuister, Davide Ambesi