Patents by Inventor Sangkwon Han

Sangkwon Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9856564
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: January 2, 2018
    Assignee: SNU R&DB FOUNDATION
    Inventors: Sunghoon Kwon, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Publication number: 20160145744
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Application
    Filed: January 28, 2016
    Publication date: May 26, 2016
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sunghoon KWON, Sueun CHUNG, Seungah LEE, Jisung JANG, Sangkwon HAN
  • Patent number: 9323159
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: April 26, 2016
    Assignee: SNU R&DB FOUNDATION
    Inventors: Sung Hoon Kwon, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Publication number: 20120236278
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Application
    Filed: March 29, 2012
    Publication date: September 20, 2012
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sung Hoon KWON, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Publication number: 20120182714
    Abstract: Provided is a composite film used for a light emitting apparatus including a light emitting device. The composite film includes a fluorescent layer including phosphors and an optical plate disposed on the fluorescent layer, and diffusing, reducing or mixing at least one of light emitted by the light emitting device, light emitted by the phosphors and a combination thereof.
    Type: Application
    Filed: March 28, 2012
    Publication date: July 19, 2012
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sunghoon KWON, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han