Patents by Inventor Sanjeev Baluja

Sanjeev Baluja has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220075396
    Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.
    Type: Application
    Filed: November 8, 2021
    Publication date: March 10, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Michael Rice, Joseph AuBuchon, Sanjeev Baluja, Ashley M. Okada, Alexander Fernandez, Ming Xu, Marcel E. Josephson, Sushant Suresh Koshti, Kenneth Le, Kevin M. Brashear
  • Publication number: 20220068608
    Abstract: Process chambers and methods for calibrating components of a processing chamber while the chamber volume is under vacuum are described. The process chamber includes a motor shaft connected to the process chamber with a plurality of motor bolts. A support plate is positioned under the chamber floor to accommodate for deflection of the chamber floor due to vacuum conditions within the chamber volume. A bellows assembly extending from the chamber floor to the support plate maintains vacuum conditions within the chamber.
    Type: Application
    Filed: September 3, 2020
    Publication date: March 3, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Gopu Krishna, Alexander S. Polyak, Sanjeev Baluja
  • Publication number: 20220071037
    Abstract: Process assemblies and cable management assemblies for managing cables in tight envelopes. A processing assembly includes a top chamber having at least one substrate support, a support shaft, a robot spindle assembly, a stator and a cable management system. The cable management system includes an inner trough assembly and an outer trough assembly configured to move relative to one another, and a plurality of chain links configured to house at least one cable for delivering power to the process assembly.
    Type: Application
    Filed: September 1, 2020
    Publication date: March 3, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Akshay Gunaji, Uday Pai, Timothy J. Roggenbuck, Sanjeev Baluja, Kalesh Panchaxari Karadi, Tejas Ulavi
  • Publication number: 20220068674
    Abstract: A heater assembly having a top seal and a second seal configured to account for deviation in processing heights and motor runoff of a heater standoff. The top seal is positioned between a shield plate and a top plate and the bottom seal is positioned between a heater mounting base and the heater standoff.
    Type: Application
    Filed: August 31, 2020
    Publication date: March 3, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Akshay Gunaji, Tejas Ulavi, Sanjeev Baluja
  • Patent number: 11260432
    Abstract: Substrate supports, substrate support assemblies and methods of using an arc generated between a first electrode and a second electrode to clean a support surface. The first electrode comprises a plurality of first branches which are interdigitated with a plurality of branches of the second electrode in a finger-joint like pattern creating a gap between the first electrode and the second electrode.
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: March 1, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tejas Ulavi, Arkaprava Dan, Sanjeev Baluja, Wei V. Tang
  • Patent number: 11220747
    Abstract: Apparatus and methods to process one or more wafers are described. A first processing station has a first gas flow pattern from one or more of a first gas diffuser, a first cooling channel pattern, or a first heater. A second processing station has a second gas flow pattern from one or more of a second gas diffuser, a second cooling channel pattern, or a second heater. The second gas diffuser, the second cooling channel pattern, or the second heater is rotated or translated relative to the first gas diffuser, the first cooling channel pattern, or the first heater to provide the second gas flow pattern complementary to the first gas flow pattern.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: January 11, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Joseph AuBuchon, Sanjeev Baluja, Michael Rice, Arkaprava Dan, Hanhong Chen
  • Publication number: 20210394144
    Abstract: Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.
    Type: Application
    Filed: September 3, 2021
    Publication date: December 23, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Jared Ahmad Lee, Sanjeev Baluja, Joseph AuBuchon, Dhritiman Subha Kashyap, Michael Rice
  • Publication number: 20210351060
    Abstract: Substrate supports, substrate support assemblies and methods of using the substrate supports are described. The substrate support has a support surface with at least two electrodes and a plurality of purge channels bounded by a seal band. A power supply connected to the electrodes configured as an electrostatic chuck. A capacitance of the substrate is measured while on the substrate support to determine the chucking state of the substrate.
    Type: Application
    Filed: May 7, 2021
    Publication date: November 11, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Tejas Ulavi, Arkaprava Dan, Mike Murtagh, Sanjeev Baluja
  • Patent number: 11169547
    Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.
    Type: Grant
    Filed: April 27, 2019
    Date of Patent: November 9, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Michael Rice, Joseph AuBuchon, Sanjeev Baluja, Ashley M. Okada, Alexander Fernandez, Ming Xu, Marcel E. Josephson, Sushant Suresh Koshti, Kenneth Le, Kevin M. Brashear
  • Patent number: 11133210
    Abstract: A method and apparatus for positioning and heating a substrate in a chamber are provided. In one embodiment, the apparatus comprises a substrate support assembly having a support surface adapted to receive the substrate and a plurality of centering fingers for supporting the substrate at a distance parallel to the support surface and for centering the substrate relative to a reference axis substantially perpendicular to the support surface. The plurality of the centering fingers are movably disposed along a periphery of the support surface, and each of the plurality of centering fingers comprises a first end portion for either contacting or supporting a peripheral edge of the substrate.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: September 28, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap, Jianhua Zhou, Thomas Nowak
  • Publication number: 20210292898
    Abstract: Apparatus and methods for providing backside pressure control and edge purge gas to a substrate in a processing chamber. A support region of a substrate support is defined by an outer band. The support region comprises one or more openings in the top surface of the substrate support. The outer band comprises a plurality of spaced apart posts. Processing chambers, methods of processing a substrate and non-transitory computer-readable medium containing instructions to process a substrate are also disclosed.
    Type: Application
    Filed: March 17, 2021
    Publication date: September 23, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Sanjeev Baluja, Tejas Ulavi, Ashutosh Agarwal
  • Patent number: 11110425
    Abstract: Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: September 7, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jared Ahmad Lee, Sanjeev Baluja, Joseph AuBuchon, Dhritiman Subha Kashyap, Michael Rice
  • Publication number: 20210262092
    Abstract: Gas delivery systems and methods of delivering a process gas are described. The gas delivery system includes an inert gas line and a first reactive gas line connected to a gas line with a purge gas flow. The flows of inert gas and first reactive gas are controlled so that the pressure at the end of the gas line remains substantially constant.
    Type: Application
    Filed: February 26, 2021
    Publication date: August 26, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Muhammad M. Rasheed, Mandyam Sriram, Anqing Cui, Sanjeev Baluja, Kevin Griffin, Joseph AuBuchon
  • Patent number: 11098404
    Abstract: Multi-station process chamber lids comprising a plurality of station openings are described. A station separation purge channel is around the station openings. A plurality of angular purge channels separate station openings from adjacent station openings. A lid support beam can compensate for deflection of the chamber lid body.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: August 24, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Dhritiman Subha Kashyap, Gopu Krishna, Sanjeev Baluja, Michael Rice
  • Publication number: 20210249230
    Abstract: In one embodiment, at least a processing chamber includes a perforated lid, a gas blocker disposed on the perforated lid, and a substrate support disposed below the perforated lid. The gas blocker includes a gas manifold, a central gas channel formed in the gas manifold, a first gas distribution plate comprising an inner and outer trenches surrounding the central gas channel, a first and second gas channels formed in the gas manifold, the first gas channel is in fluid communication with a first gas source and the inner trench, and the second gas channel is in fluid communication with the first gas source and the outer trench, a second gas distribution plate, a third gas distribution plate disposed below the second gas distribution plate, and a plurality of pass-through channels disposed between the second gas distribution plate and the third gas distribution plate.
    Type: Application
    Filed: April 26, 2021
    Publication date: August 12, 2021
    Inventors: Sanjeev BALUJA, Yi YANG, Truong NGUYEN, Nattaworn Boss NUNTA, Joseph F. AUBUCHON, Tuan Anh NGUYEN, Karthik JANAKIRAMAN
  • Patent number: 11047043
    Abstract: Embodiments disclosed herein generally relate to a chamber liner for the high temperature processing of substrates in a processing chamber. The processing chamber utilizes an inert bottom purge flow to shield the substrate support from halogen reactants such that the substrate support may be heated to temperatures greater than about 650 degrees Celsius. The chamber liner controls a flow profile such that during deposition the bottom purge flow restricts reactants and by-products from depositing below the substrate support. During a clean process, the bottom purge flow restricts halogen reactants from contacting the substrate support. As such, the chamber liner includes a conical inner surface angled inwardly to direct purge gases around an edge of the substrate support and to reduce deposition under the substrate support and the on the edge.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: June 29, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Sanjeev Baluja, Ren-Guan Duan, Kalyanjit Ghosh
  • Publication number: 20210159094
    Abstract: A gas distribution apparatus is disclosed. The apparatus includes a faceplate and a blocker plate. An adjustment mechanism is coupled to the blocker plate and is operable to position the blocker plate relative to the faceplate in order to modify a flow profile of a gas flowing therethrough. A method of processing a substrate using the gas distribution is also disclosed.
    Type: Application
    Filed: April 3, 2019
    Publication date: May 27, 2021
    Inventors: Yuxing ZHANG, Sanjeev BALUJA, Amit Kumar BANSAL, Tuan Anh NGUYEN, Tejas ULAVI, Gopu KRISHNA
  • Patent number: 11017986
    Abstract: Disclosed embodiments generally relate to a processing chamber that includes a perforated lid, a gas blocker disposed on the perforated lid, and a substrate support disposed below the perforated lid. The gas blocker includes a gas manifold, a central gas channel formed in the gas manifold, a first gas distribution plate that includes inner and outer trenches surrounding the central gas channel, and a first and second gas channels formed in the gas manifold. The first gas channel is in fluid communication with a first gas source and the inner trench, and the second gas channel is in fluid communication with the first gas source and the outer trench and a second gas distribution plate The first gas channel is in further fluid communication with a third gas distribution plate that is disposed below the second gas distribution plate, and a plurality of pass-through channels that are disposed between the second gas distribution plate and the third gas distribution plate.
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: May 25, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Sanjeev Baluja, Yi Yang, Truong Nguyen, Nattaworn Boss Nunta, Joseph F. Aubuchon, Tuan Anh Nguyen, Karthik Janakiraman
  • Publication number: 20210111058
    Abstract: Substrate supports comprising a top plate positioned on a shaft are described. The top plate including a primary heating element a first depth from the surface of the top plate, a inner zone heating element a second depth from the surface of the top plate and an outer zone heating element a third depth from the surface of the top plate. Substrate support assemblies comprising a plurality of substrate supports and methods of processing a substrate are also disclosed.
    Type: Application
    Filed: October 9, 2020
    Publication date: April 15, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Tejas Ulavi, Sanjeev Baluja, Dhritiman Subha Kashyap
  • Publication number: 20210111059
    Abstract: Substrate supports comprising a plurality of bonded plates forming a single component support body and methods of forming the substrate supports are described. The single component support body has an outer peripheral edge, a top surface and a bottom surface. A pocket is formed in the top surface and has a bottom surface, a depth and an outer peripheral edge. A purge ring is spaced a distance from the outer peripheral edge and comprises at least one opening in the top surface in fluid communication with a purge gas line within the body thickness.
    Type: Application
    Filed: October 9, 2020
    Publication date: April 15, 2021
    Applicant: Applies Materials, Inc.
    Inventors: Tejas Ulavi, Vijay D. Parkhe, Naveen Kumar Nagaraja, Sanjeev Baluja, Surajit Kumar, Dhritiman Subha Kashyap, Ashutosh Agarwal