Patents by Inventor Sankar Menon CHERUBALA PATHAYAPURA

Sankar Menon CHERUBALA PATHAYAPURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ATOMIC LAYER DEPOSITION PART COATING CHAMBER
    Publication number: 20240420926
    Abstract: Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a method for coating a part via atomic layer deposition includes: fastening a workpiece to be coated to an interior volume facing portion of a part coating reactor; and performing an ALD process on the fastened workpiece within the part coating reactor.
    Type: Application
    Filed: August 26, 2024
    Publication date: December 19, 2024
    Inventors: Michael R. RICE, Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Steven D. MARCUS, Kirubanandan Naina SHANMUGAM, Sriharsha DHARMAPURA SATHYANARAYANAMURTHY, Madhukar KRISHNA, Shivaprakash Padadayya HIREMATH, Senthil Kumar NATTAMAI SUBRAMANIAN, Sankar Menon CHERUBALA PATHAYAPURA
  • Atomic layer deposition part coating chamber
    Patent number: 12074010
    Abstract: Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: August 27, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Michael R. Rice, Hanish Kumar Panavalappil Kumarankutty, Steven D. Marcus, Kirubanandan Naina Shanmugam, Sriharsha Dharmapura Sathyanarayanamurthy, Madhukar Krishna, Shivaprakash Padadayya Hiremath, Senthil Kumar Nattamai Subramanian, Sankar Menon Cherubala Pathayapura
  • ATOMIC LAYER DEPOSITION PART COATING CHAMBER
    Publication number: 20230074149
    Abstract: Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.
    Type: Application
    Filed: September 9, 2021
    Publication date: March 9, 2023
    Inventors: Michael R. RICE, Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Steven D. MARCUS, Kirubanandan Naina SHANMUGAM, Sriharsha DHARMAPURA SATHYANARAYANAMURTHY, Madhukar KRISHNA, Shivaprakash Padadayya HIREMATH, Senthil Kumar NATTAMAI SUBRAMANIAN, Sankar Menon CHERUBALA PATHAYAPURA