Abstract: An illumination apparatus includes a reflector including a parabolic or ellipsoidal mirror, a light source arranged near a (first) focal point of the reflector, and a front mirror having a transparent window and a mirror surface symmetrical about the light axis. Luminous flux emitted from the light source is reflected from the reflector. In the case of the parabolic mirror, the front mirror has the same size as an entrance of an output light utilizing optical system, and the luminous flux exits toward the optical system as collimated light. In the case of the ellipsoidal mirror, the front mirror is arranged between two focal points of the ellipsoidal mirror, and the luminous flux is directed toward the second focal point. However, at least one part of the luminous flux is reflected from the front mirror and returned toward the first focal point.

Abstract: A circuit board mounting electronic components including a heat generating element is accommodated in a casing. A heat dissipation member is disposed between the heat generating element and an inner surface of the casing. The heat dissipation member is thermally bonded to the heat generating element and to the casing. The heat dissipation member is a polymeric material having fluidity. A film for preventing a shifting of the heat dissipation member is disposed between the heat dissipation member and the casing. And, the film is chemically or electrically bonded to the heat dissipation member and to the casing.

Abstract: A mask having a mask pattern for properly evaluating pattern line width. A mask pattern including a pattern to be determined and a plurality of surrounding patterns is formed on a mask. Areas with the same line width in the pattern to be determined are located between a pair of surrounding patterns with an aperture rate of 0%, between a pair of surrounding patterns with an aperture rate of 50%, and between a pair of surrounding patterns with an aperture rate of 100%, respectively. These pairs of surrounding patterns with the different aperture rates change the influence of charge-up on the pattern to be determined. Accordingly, the line width of each area in the pattern to be determined is determined, the difference between the line width of two areas is found, and the amount of a determination error caused by the charge-up is calculated. As a result, whether the line width of the pattern is determined with accuracy can be judged and the line width of the pattern can be evaluated properly.

Abstract: A color separation device according to the present invention comprises a first color separation member having a first polarization direction changing element and a second polarization direction changing element, and a first polarization separation element, and a second color separation member having a second polarization separation element. The first color separation member may be configured from a color separation function element and a polarization direction changing element.

Abstract: An illumination apparatus includes a reflector including a parabolic or ellipsoidal mirror, a light source arranged near a (first) focal point of the reflector, and a front mirror having a transparent window and a mirror surface symmetrical about the light axis. Luminous flux emitted from the light source is reflected from the reflector. In the case of the parabolic mirror, the front mirror has the same size as an entrance of an output light utilizing optical system, and the luminous flux exits toward the optical system as collimated light. In the case of the ellipsoidal mirror, the front mirror is arranged between two focal points of the ellipsoidal mirror, and the luminous flux is directed toward the second focal point. However, at least one part of the luminous flux is reflected from the front mirror and returned toward the first focal point.

Abstract: A color separation device according to the present invention comprises a first color separation member having a first polarization direction changing element and a second polarization direction changing element, and a first polarization separation element, and a second color separation member having a second polarization separation element. The first color separation member may be configured from a color separation function element and a polarization direction changing element.

Abstract: An illumination apparatus includes a reflector including a parabolic or ellipsoidal mirror, a light source arranged near a (first) focal point of the reflector, and a front mirror having a transparent window and a mirror surface symmetrical about the light axis. Luminous flux emitted from the light source is reflected from the reflector. In the case of the parabolic mirror, the front mirror has the same size as an entrance of an output light utilizing optical system, and the luminous flux exits toward the optical system as collimated light. In the case of the ellipsoidal mirror, the front mirror is arranged between two focal points of the ellipsoidal mirror, and the luminous flux is directed toward the second focal point. However, at least one part of the luminous flux is reflected from the front mirror and returned toward the first focal point.

Abstract: A high-precision inspection apparatus and method for inspecting a large board with a line sensor camera, the coordinate positions of correction marks on a pair of holding members are read by the camera and compared with predetermined coordinates, and an amount of positional discrepancy of the board is computed. The board is adjusted according to the positional discrepancy, if necessary, and then scanned.

Abstract: A color separation device according to the present invention comprises a first color separation member having a first polarization direction changing element and a second polarization direction changing element, and a first polarization separation element, and a second color separation member having a second polarization separation element. The first color separation member may be configured from a color separation function element and a polarization direction changing element.

Abstract: An exposing method for semiconductor integrated circuits by extracting exposing pattern data for predetermined units of area from the exposing pattern data input to an exposing apparatus, merging the extracted exposing pattern data with the dummy pattern data for every predetermined unit of area and exposing the merged exposing pattern data and dummy pattern data for every unit of area.

Abstract: An object of the present invention is to provide a high-precision inspection apparatus and inspection method capable of inspecting a large board by laterally moving the board and photographing the board several times before and after the lateral moving. Coordinate positions of correction marks applied to a pair of holding members or a pair of rails are read by a line sensor camera, an amount of positional discrepancy of the board is computed by comparing coordinate positions of correction marks previously set with the coordinate positions of the correction marks having been read, and when there are discrepancies between the two kinds of coordinate positions, photographing is carried out after correcting an amount of movement of the holding members based on the amount of positional discrepancy of the board.

Abstract: A high-precision inspection apparatus and method for inspecting a large board with a line sensor camera, the coordinate positions of correction marks on a pair of holding members are read by the camera and compared with predetermined coordinates, and an amount of positional discrepancy of the board is computed. The board is adjusted according to the positional discrepancy, if necessary, and then scanned.

Abstract: An illumination system having a light-emitting unit and a reflecting mirror for condensing light is described. The illumination system includes a lens plate having a plurality of approximately identical lens elements. The lens plate is disposed away from the light-emitting unit and the plurality of lens elements are arranged two-dimensionally and approximately perpendicular to a main optical axis of a projection lens system and an object to be projected. The illumination system further includes first and second lenticules, and at least one convex lens disposed so as to refract a light path of the light flux formed by each of the plurality of lens elements such that the light flux illuminates a surface of the object to be projected after passing through the first and second lenticules.

Abstract: An illumination apparatus includes a reflector including a parabolic or ellipsoidal mirror, a light source arranged near a (first) focal point of the reflector, and a front mirror having a transparent window and a mirror surface symmetrical about the light axis. Luminous flux emitted from the light source is reflected from the reflector. In the case of the parabolic mirror, the front mirror has the same size as an entrance of an output light utilizing optical system, and the luminous flux exits toward the optical system as collimated light. In the case of the ellipsoidal mirror, the front mirror is arranged between two focal points of the ellipsoidal mirror, and the luminous flux is directed toward the second focal point. However, at least one part of the luminous flux is reflected from the front mirror and returned toward the first focal point.

Abstract: A method of manufacturing a semiconductor device, comprises the following steps of growing a dielectric film made of a dielectric material whose dielectric constant is improved by crystallization thereof, on a semiconductor substrate to utilize the dielectric film as a capacitor film, and applying a voltage to the semiconductor substrate in a plasma atmosphere to increase a grown interface temperature by “dielectric heating” upon growth of the dielectric film

Abstract: In the fabrication of capacitors, a TiO2 film is formed from a TiN film by means of heat-treatment within an atmosphere which does not contain oxygen. This serves to prevent the polysilicon which forms the bottom electrode from being oxidized during heat-treatment. Thus, once the bottom electrode has been formed on the silicon wafer, a TiN film and RuO2 film are formed, and the silicon wafer is heat-treated in an atmosphere which does not contain oxygen. In this manner, a dielectric film that is a TiO2 film and a top electrode that is a ruthenium film are obtained.

Abstract: The system and method of controlling the olfactory stimuli release a specified aroma-causing agent from a first specified location in environment. In order to simulate the movement of the released aroma-causing agent in space, the same aroma-causing agent is released from a second specified location in the environment.

Abstract: The system for and a method of generating a scent and an image based upon a coded signal transmitted from a remote location, and the scent is generated from a dry scent carrying medium which contains a plurality of independent sources of scent causing agents. The coded signal is indicative of simultaneously activating the independent sources of scent causing agents so as to generated a complex mixture of the scents on the fly.

Abstract: In a process where a capacitor using a BST film for a dielectric film is incorporated into a DRAM, the film is selectively removed by wet etching for forming a contact hole. For this purpose, a bottom electrode is formed and then an amorphous film is formed on the entire surface of a silicon wafer. And after forming a crystalline top electrode on this film, lamp heating is performed to crystallize only the area that is in contact with the electrode. Then wet etching is performed using a solution of hydrogen and ammonium fluoride (1:2), which allows removing only the amorphous area selectively.

Abstract: A language conversion system converts an original sentence in a source-language into a translated sentence in a target-language.