Patents by Inventor Scott Anderson Middlebrooks
Scott Anderson Middlebrooks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200356009Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: ApplicationFiled: July 30, 2020Publication date: November 12, 2020Applicant: ASML Netherlands B.V.Inventors: Scott Anderson MIDDLEBROOKS, Markus Gerardus Martinus Maria VAN KRAAIJ, Adrianus Cornelis Matheus KOOPMAN, Stefan HUNSCHE, Willem Marie Julia Marcel COENE
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Publication number: 20200320238Abstract: A method involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist, performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model, and producing electronic data representing the deformation of the developed resist pattern for the input pattern.Type: ApplicationFiled: November 29, 2018Publication date: October 8, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Chrysostomos BATISTAKIS, Scott Anderson MIDDLEBROOKS, Sander Frederik WUISTER
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Publication number: 20200264520Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.Type: ApplicationFiled: May 1, 2020Publication date: August 20, 2020Applicant: ASML Netherlands B.VInventors: Alexander YPMA, Jasper MENGER, David DECKERS, David HAN, Adrianus Cornelis Matheus KOOPMAN, Irina LYULINA, Scott Anderson MIDDLEBROOKS, Richard Johannes Franciscu VAN HAREN, Jochem Sebastiaan WILDENBERG
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Publication number: 20200257208Abstract: A defect prediction method for a device manufacturing process involving production substrates processed by a lithographic apparatus, the method including training a classification model using a training set including measured or determined values of a process parameter associated with the production substrates processed by the device manufacturing process and an indication regarding existence of defects associated with the production substrates processed in the device manufacturing process under the values of the process parameter, and producing an output from the classification model that indicates a prediction of a defect for a substrate.Type: ApplicationFiled: April 17, 2020Publication date: August 13, 2020Inventors: Scott Anderson MIDDLEBROOKS, Willem Maria Julia Marcel COENE, Frank Arnoldus Johannes Maria DRIESSEN, Adrianus Cornelis Matheus KOOPMAN, Markus Gerardus Martinus Maria VAN KRAAIJ
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Patent number: 10732513Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: GrantFiled: September 5, 2019Date of Patent: August 4, 2020Assignee: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Markus Gerardus Martinus Maria Van Kraaij, Adrianus Cornelis Matheus Koopman, Stefan Hunsche, Willem Marie Julia Marcel Coene
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Patent number: 10725386Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.Type: GrantFiled: May 24, 2019Date of Patent: July 28, 2020Assignee: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 10706534Abstract: The invention provides a method and device for creating a model for classifying a data point in imaging data representing measured intensities, the method comprising: training a model using a first labelled set of imaging data points; determining at least one first image part in the first labelled set which the model incorrectly classifies; generating second image parts similar to at least one image part; further training the model using the second image parts. Preferably the imaging data points and the second image parts comprise 3D data points.Type: GrantFiled: July 26, 2017Date of Patent: July 7, 2020Inventors: Scott Anderson Middlebrooks, Henricus Wilhelm van der Heijden, Adrianus Cornelis Koopman
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Publication number: 20200192229Abstract: A method and a computer program product that relates to lithographic apparatuses and, processes, and more particularly to a method and computer program to inspect substrates produced by the lithographic apparatuses and processes. The method and/or computer program product includes determining contributions from independent sources from results measured from a lithography process or a substrate processed by the lithography process, wherein the results are measured using a plurality of different substrate measurement recipes.Type: ApplicationFiled: November 22, 2016Publication date: June 18, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Scott Anderson MIDDLEBROOKS, Omer Abubaker Omer ADAM, Adrianus Cornelis Matheus KOOPMAN, Henricus JohannesLambertus MEGENS, Arie Jeffrey DEN BOEF
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Patent number: 10642162Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.Type: GrantFiled: March 13, 2019Date of Patent: May 5, 2020Assignee: ASML Netherlands B.V.Inventors: Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman, Irina Lyulina, Scott Anderson Middlebrooks, Richard Johannes Franciscus Van Haren, Jochem Sebastiaan Wildenberg
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Patent number: 10627723Abstract: A defect prediction method for a device manufacturing process involving production substrates processed by a lithographic apparatus, the method including training a classification model using a training set including measured or determined values of a process parameter associated with the production substrates processed by the device manufacturing process and an indication regarding existence of defects associated with the production substrates processed in the device manufacturing process under the values of the process parameter, and producing an output from the classification model that indicates a prediction of a defect for a substrate.Type: GrantFiled: November 14, 2014Date of Patent: April 21, 2020Assignee: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Willem Maria Julia Marcel Coene, Frank Arnoldus Johannes Maria Driessen, Adrianus Cornelis Matheus Koopman, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 10607334Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: GrantFiled: November 13, 2015Date of Patent: March 31, 2020Assignee: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Markus Gerardus Martinus Maria Van Kraaij, Maxim Pisarenco, Adrianus Cornelis Matheus Koopman, Stefan Hunsche, Willem Marie Julia Marcel Coene
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Publication number: 20200072761Abstract: A method including selecting a shaped feature from a set of shaped features, each shaped feature of the set of shaped features having a set of points on a perimeter of the shape of the shaped feature, creating a plurality of shape context descriptors for the selected shaped feature, wherein each shape context descriptor provides an indication of a location in a shape context descriptor framework of a first focus point of the set of points in relation to a second point of the set of points, and identifying a shaped feature from the set of shaped features having a same or similar shape as the selected shaped feature based on data from the plurality of shape context descriptors.Type: ApplicationFiled: March 2, 2018Publication date: March 5, 2020Inventors: Adrianus Cornelis Matheus KOOPMAN, Scott Anderson MIDDLEBROOKS, Willem Marie Julia Marcel COENE
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Patent number: 10539882Abstract: A diagnostic system implements a network including two or more sub-domains. Each sub-domain has diagnostic information extracted by analysis of object data, the object data representing one or more parameters measured in relation to a set of product units that have been subjected nominally to the same industrial process as one another. The network further has at least one probabilistic connection from a first variable in a first diagnostic sub-domain to a second variable in a second diagnostic sub-domain. Part of the second diagnostic information is thereby influenced probabilistically by knowledge within the first diagnostic information. Diagnostic information may include, for example, a spatial fingerprint observed in the object data, or inferred. The network may include connections within sub-domains. The network may form a directed acyclic graph, and used for Bayesian inference operations.Type: GrantFiled: July 14, 2017Date of Patent: January 21, 2020Assignee: ASML Netherlands B.V.Inventors: Alexander Ypma, Adrianus Cornelis Matheus Koopman, Scott Anderson Middlebrooks
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Publication number: 20190391500Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern, wherein the pattern includes a plurality of pattern elements. The set of images are registered relative to each other to superimpose the instances of the pattern. The registration includes applying different weightings to two or more of the plurality of pattern elements, wherein the weightings control the extent to which each pattern element contributes to the registration of the set of images and each weighting is based on an expected variation of the pattern element to which the weighting is applied. Variation in the pattern is measured using the registered set of images.Type: ApplicationFiled: February 7, 2018Publication date: December 26, 2019Inventors: Antoine Gaston Marie KIERS, Scott Anderson MIDDLEBROOKS, Jan-Willem GEMMINK
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Publication number: 20190391498Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: ApplicationFiled: September 5, 2019Publication date: December 26, 2019Applicant: ASML Netherlands B.V.Inventors: Scott Anderson MIDDLEBROOKS, Markus Gerardus Martinus Maria VAN KRAAIJ, Adrianus Cornelis Matheus KOOPMAN, Stefan HUNSCHE, Willem Marie Julia Marcel COENE
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Publication number: 20190378012Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.Type: ApplicationFiled: May 29, 2019Publication date: December 12, 2019Applicant: ASML Netherlands B.V.Inventors: Lorenzo Tripodi, Patrick Warnaar, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans, Scott Anderson Middlebrooks, Adrianus Cornelis Matheus Koopman, Frank Staals, Brennan Peterson, Anton Bernhard Van Oosten
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Publication number: 20190310554Abstract: A method including: obtaining a logistic mathematical model predicting the formation of a physical structure created using a patterning process; evaluating the logistic mathematical model to predict formation of a part of the physical structure and generate an output; and adapting, based on the output, an aspect of the patterning process.Type: ApplicationFiled: November 29, 2017Publication date: October 10, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Scott Anderson MIDDLEBROOKS, Adrianus Cornelis Matheus KOOPMAN, Markus Gerardus Martinus Maria VAN KRAAIJ, Maxim PISARENCO
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Patent number: 10437157Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: GrantFiled: November 13, 2015Date of Patent: October 8, 2019Assignee: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Markus Gerardus Martinus Maria Van Kraaij, Adrianus Cornelis Matheus Koopman, Stefan Hunsche, Willem Marie Julia Marcel Coene
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Publication number: 20190278190Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.Type: ApplicationFiled: May 24, 2019Publication date: September 12, 2019Applicant: ASML Netherlands B.V.Inventors: Scott Anderson MIDDLEBROOKS, Niels GEYPEN, Hendrik Jan Hidde SMILDE, Alexander STRAAIJER, Maurits VAN DER SCHAAR, Markus Gerardus Martinus Maria VAN KRAAIJ
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Publication number: 20190278188Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.Type: ApplicationFiled: March 13, 2019Publication date: September 12, 2019Applicant: ASML Netherlands B.V.Inventors: Alexander YPMA, Jasper MENGER, David DECKERS, David HAN, Adrianus Cornelis Matheus KOOPMAN, Irina LYULINA, Scott Anderson MIDDLEBROOKS, Richard Johannes Franciscus VAN HAREN, Jochem Sebastiaan WILDENBERG