Patents by Inventor Sebastian Champigny

Sebastian Champigny has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and System for Adjusting an Optical Model
    Publication number: 20080304029
    Abstract: In a method of adjusting an optical parameter of an exposure apparatus, a photolithographic projection is performed using an exposure apparatus and using a layout pattern so as to provide measured layout data with different focus settings of the exposure apparatus. An optical model is provided including at least one optical parameter and a simulated image is created by using the optical model and the layout pattern. The optical model is optimized by modifying the optical parameter.
    Type: Application
    Filed: June 8, 2007
    Publication date: December 11, 2008
    Applicant: QIMONDA AG
    Inventors: Rainer Pforr, Thorsten Winkler, Ralf Ziebold, Wolfram Kostler, Jens Reichelt, Stefan Blawid, Sebastian Champigny, Manuel Vorwerk