Patents by Inventor Sebastien LE ROY

Sebastien LE ROY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170329064
    Abstract: An illuminating panel includes a support holding an integrated illumination. The integrated illumination is an illuminating textile including woven optical fibers coupled to light sources. The optical fibers emit light under an angle suitable for enlightening an adjacent surface substantially perpendicular to the plane of the illuminating panel.
    Type: Application
    Filed: September 21, 2015
    Publication date: November 16, 2017
    Applicants: SAINT-GOBAIN ADFORS, ABV S.A.
    Inventors: Eric DOR, Jean-Marie BRICTEUX, Sebastien LE ROY, Jean-Yves LALUET
  • Publication number: 20170153008
    Abstract: The invention relates to a luminescent material comprising a face coated with a textured layer, the texture of said layer comprising identical features distributed uniformly over said face, said layer decreasing the angle of the extraction cone of light emitted by said luminescent material and passing through said face. The luminescent material may be of the scintillator type or of the wavelength converter type.
    Type: Application
    Filed: December 16, 2016
    Publication date: June 1, 2017
    Inventors: Sébastien LE ROY, Emmanuel MIMOUN
  • Patent number: 9371251
    Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material by reactive-ion etching, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple silicon oxide or a mixed silicon oxide, most of the oxides in the case of a mixed oxide being silicon oxide, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the silicon of the oxide, a molar percentage of the species in the material ranging from 1 mol % or even up to 50 mol % while remaining below the percentage of the silicon oxide, at least most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the etching; structuring the surface of the hybrid material, without masking, with etching that lasts less t
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: June 21, 2016
    Assignee: SAINT-GOBAIN GLASS FRANCE
    Inventors: Elin Sondergard, Sébastien Le Roy, Alban Letailleur, Constance Magne
  • Patent number: 9371250
    Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: June 21, 2016
    Assignee: SAINT-GOBAIN GLASS FRANCE
    Inventors: Elin Sondergard, Sébastien Le Roy, Alban Letailleur, Etienne Barthel, Constance Magne
  • Publication number: 20120288676
    Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the
    Type: Application
    Filed: November 24, 2010
    Publication date: November 15, 2012
    Applicant: SAINT-GOBAIN GLASS FRANCE
    Inventors: Elin Sondergard, Sébastien Le Roy, Alban Letailleur, Etienne Barthel, Constance Magne
  • Publication number: 20120288681
    Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material by reactive-ion etching, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple silicon oxide or a mixed silicon oxide, most of the oxides in the case of a mixed oxide being silicon oxide, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the silicon of the oxide, a molar percentage of the species in the material ranging from 1 mol % or even up to 50 mol % while remaining below the percentage of the silicon oxide, at least most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the etching; structuring the surface of the hybrid material, without masking, with etching that lasts less t
    Type: Application
    Filed: November 24, 2010
    Publication date: November 15, 2012
    Applicant: SAINT-GOBAIN GLASS FRANCE
    Inventors: Elin Sondergard, Sébastien Le Roy, Alban Letailleur, Constance Magne