Patents by Inventor Seiichi Maeda

Seiichi Maeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6026806
    Abstract: To provide an inexpensive air-conditioned construction of floor and ceiling, by using as a heat accumulating agent water which is friendly to the human body and nature, and using a heat source solar energy or outside air temperature. The construction of the invention comprises a floor body and a ceiling body formed by a plurality of space portions and filled up with water, sunlight intercepting sections for permitting the contains to receive the sunlight, heating sections provided below the sunlight intercepting sections, outside air temperature receiving sections or outside heating means provided in place of the sunlight intercepting sections, and cooling sections provided above the outside air temperature receiving sections.
    Type: Grant
    Filed: June 20, 1997
    Date of Patent: February 22, 2000
    Assignee: Izena Co. Ltd.
    Inventor: Seiichi Maeda
  • Patent number: 5495248
    Abstract: A stabilizing method of a synthetic aperture radar and a position determining method by the radar. At least three repeaters are arranged in mutually different positions on the ground or the sea and a radio frequency signal having a predetermined frequency is transmitted from the radar mounted on a radar platform such as an aircraft to the repeaters. Each repeater frequency-modulates and amplifies the received signal to return the signal to the radar. The radar receives the signal returned from each repeater. The radar calculates a distance between the radar platform and each repeater on the basis of a time required for the transmitting and the receiving and phase information of the received signal. When the position of each repeater is known, by using the positions of the repeaters and the calculated distances, the position of the radar platform can be calculated. On the basis of the obtained position of the radar platform, a reference signal for phase compensation is generated.
    Type: Grant
    Filed: November 16, 1993
    Date of Patent: February 27, 1996
    Assignees: Sachio Uehara, Director General, Technical Research and Development Institute, Japan Defence Agency, Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masatoshi Kawase, Seiichi Maeda, Takahiko Fujisaka, Yoshimasa Oh-Hashi, Michimasa Kondo, Natsuki Kondo
  • Patent number: 5097630
    Abstract: A specular machining apparatus for giving a specular machining or mirror-like surface to a peripheral edge portion, in particular a chamfered portion, of typically a semiconductor wafer such as a silicon wafer. This mirror-like surface is provided to smooth out the relatively rough surface formed by etching to remove a strained layer which is generated as a result of grinding work. The mirror-like surface tends to reject the attachment of dirt, which is desirable. The specular machining apparatus is of simple construction and easy to use, comprising a chuck table plus chuck means for holding a wafer having a chamfered peripheral edge portion. The chuck table rotates the wafer held by the chuck about the wafer axis. A polishing ring is disposed to be freely rotatable around an axis perpendicular to the axis of the wafer on the chuck table, to permit the polishing surface on the outer periphery to be accessable for polishing.
    Type: Grant
    Filed: September 13, 1988
    Date of Patent: March 24, 1992
    Assignee: Speedfam Co., Ltd.
    Inventors: Seiichi Maeda, Isao Nagahashi
  • Patent number: 5094037
    Abstract: Described herein is an edge polisher for polishing chamfered edge portions on the front and rear sides of work, including a first machining stage for polishing the front side of work and a second machining stage for polishing the rear side of work, along with mechanisms for supplying, positioning, transferring, reversing and ejecting work. In the first and second machining stages, a work is chucked on each of index units which are mounted on an intermittently rotating index table and revolved around a polishing drum located at the center of the index table, pressing chamfered edge portions of the works against the polishing drum to give a polishing treatment thereto.
    Type: Grant
    Filed: September 26, 1990
    Date of Patent: March 10, 1992
    Assignee: Speedfam Company, Ltd.
    Inventors: Shunji Hakomori, Seiichi Maeda, Isao Nagahashi
  • Patent number: 4805348
    Abstract: Described herein is a flat lapping machine capable of precision-abrading simultaneously flat surfaces on the front and rear sides of a work in the fashion of lapping, polishing and grinding machines. The present invention contemplates to provide a flat lapping machine which is simplified in construction as compared with conventional flap lapping machines having a large number of carriers in planetary motions, and which can stop the respective carriers easily in specific positions and directions at the end of a lapping operation. To this end, the present invention employs a large number of support gear mechanisms each constituted by a plural number of small gears and located at uniform intervals around a center gear, rotatably supporting the respective carriers in predetermined positions while the respective carriers are driven by the center gear.
    Type: Grant
    Filed: July 29, 1986
    Date of Patent: February 21, 1989
    Assignee: Speedfam Co., Ltd.
    Inventors: Hatsuyuki Arai, Isao Nagahashi, Seiichi Maeda, Kazumi Yasuda, Shiro Furusawa, Kazuhiko Hirata, Kastunori Nagao, Kazuhiko Kondo, Takaya Sanoki, Misuo Sugiyama, Shinichi Kusano
  • Patent number: 4171970
    Abstract: A composition for moderating the growth of graminaceous plants is disclosed which comprises at least one component as an effective ingredient selected from the group consisting of sulfonates and sulfuric esters having the formulaR.sup.1 --SO.sub.3 Mwherein R.sup.1 represents an alkyl or alkenyl group having 8 to 20 carbon atoms, an alkylaryl group containing an alkyl group of 8 to 20 carbon atoms, the residue of succinic acid esters represented by the formula ##STR1## wherein R.sup.2 and R.sup.3 represent an alkyl group of 1 to 18 carbon atoms or an alkylaryl group containing an alkyl group of 1 to 18 carbon atoms, or the group R.sup.4 O wherein R.sup.4 represents an alkyl group of 8 to 20 carbon atoms or an alkylaryl group containing an alkyl group of 8 to 20 carbon atoms; and M represents an agriculturally acceptable organic or inorganic salt.
    Type: Grant
    Filed: November 18, 1977
    Date of Patent: October 23, 1979
    Assignee: Kao Soap Co., Ltd.
    Inventors: Fumikazu Kakiuchi, Jiro Takemoto, Seiichi Maeda, Kazuhiko Kurita, Tsuneyuki Takeno
  • Patent number: 4095973
    Abstract: A composition which increases the yield of pulse, comprising an effective amount of at least one component selected from the group consisting of a sulfonate represented by the formulaR.sup.1 --SO.sub.3 M,wherein R.sup.1 represents alkyl or alkenyl of 8 to 20 carbon atoms or the residue of succinic acid esters represented by the formula, ##STR1## wherein R.sup.2 and R.sup.3 represent alkyl of 1 to 18 carbon atoms or alkylaryl containing an alkyl group of 1 to 18 carbon atoms and M represents an organic or inorganic cation; and a sulfuric ester represented by the formulaR.sup.4 --O--SO.sub.3 M,wherein R.sup.4 represents an alkyl group having 8 to 20 carbon atoms or an alkylaryl group containing an alkyl group of 8 to 20 carbon atoms and M is the same as defined above.
    Type: Grant
    Filed: November 1, 1976
    Date of Patent: June 20, 1978
    Assignee: Kao Soap Co., Ltd.
    Inventors: Seiichi Maeda, Kan Mori, Tsuneyuki Takeno