Patents by Inventor Seiichi Watanabe

Seiichi Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120189800
    Abstract: Provided is an element array in which an error in pitch among elements in the element array is absorbed surely in a step of laminating a plurality of element arrays so that each group of the elements arrayed in the laminating direction can be aligned with high accuracy. The element array has a plurality of elements arrayed one-dimensionally or two-dimensionally, and a flexible support formed out of a material richer in elasticity than a material forming the elements. The elements are coupled with one another through the support.
    Type: Application
    Filed: July 6, 2010
    Publication date: July 26, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Takayuki Fujiwara, Seiichi Watanabe
  • Publication number: 20120145323
    Abstract: A plasma processing apparatus for subjecting a substrate to be processed to plasma processing includes a processing chamber, a substrate electrode having an electrostatic chuck mechanism, a plasma generator, a high-frequency bias power supply which applies a high-frequency bias voltage to the substrate electrode, a voltage monitor which monitors the high-frequency bias voltage, a current monitor which monitors a high-frequency bias current, a measurement storage unit which stores a resistance component, an induction component and a capacity component of the electrostatic chuck mechanism, which have been calculated beforehand as fitting parameters of an expression V w = V esc - R esc ? I esc - L esc ? ? I esc ? t - 1 C esc ? ? I esc ? ? t + A , ( A ) that is an approximate curve of a correlation among a voltage of the substrate, a computing unit which estimates the voltage of the substrate according to the expression, and a control unit that generates a
    Type: Application
    Filed: February 17, 2012
    Publication date: June 14, 2012
    Inventors: Hitoshi Tamura, Naoki Yasui, Seiichi Watanabe
  • Publication number: 20120103412
    Abstract: Provided is a method for manufacturing a two-dimensional pattern by simultaneously forming a plurality of quantum dots on a surface of a solid material and making the quantum dots a periodic structure by a laser irradiation, and a device structure and a device fabricated by the method. The method for fabricating a quantum dot-formed surface including the laser irradiation which irradiate at least one batch of laser onto a surface of a solid material to simultaneously form a plurality of quantum dots on the surface, arranging the plurality of quantum dots into periodic arrays.
    Type: Application
    Filed: May 25, 2010
    Publication date: May 3, 2012
    Inventors: Takahiko Kato, Seiichi Watanabe, Shigeo Yatsu, Satoshi Kayashima, Norihiko Nishiguchi, Hiroaki Misawa, Kiyotaka Asakura
  • Publication number: 20120077233
    Abstract: This invention relates to DNA encoding a novel enzyme having activity of synthesizing D-serine from formaldehyde and glycine, recombinant DNA constructed by integrating such DNA into a vector, a transformant transformed with the recombinant DNA, and a method for producing D-serine from formaldehyde and glycine with the use of the enzyme.
    Type: Application
    Filed: February 24, 2011
    Publication date: March 29, 2012
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Tadashi Araki, Tomonori Hidesaki, Seiichi Watanabe, Keita Nishida, Kiyoteru Nagahara, Mitsuo Koito
  • Patent number: 8142674
    Abstract: The invention provides a plasma processing apparatus and a plasma processing method capable of controlling the voltage of the processing substrate with high accuracy, thereby enabling a highly accurate plasma processing. According to the invention, a voltage of the processing substrate is measured using a processing substrate with a voltage probe prepared in advance, and based on a bias voltage supplied to an electrostatic chuck mechanism and a bias current flowing through the electrostatic chuck mechanism, a capacity component which is an impedance representing the electric property of the electrostatic chuck mechanism is computed numerically. Then, based on a predetermined expression, the voltage of the processing substrate is estimated using the bias voltage of the processing substrate to be measured, the bias current flowing through the electrostatic chuck mechanism and the capacity component which is the impedance acquired in advance.
    Type: Grant
    Filed: April 8, 2009
    Date of Patent: March 27, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hitoshi Tamura, Naoki Yasui, Seiichi Watanabe
  • Patent number: 8075733
    Abstract: A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing electrode where a processing material, is placed and which holds the processing material in the chamber; and a vacuuming unit that is connected to the chamber to discharge the gas in the chamber, in which the chamber, a part for providing gas into the chamber of the gas supply unit, a part for introducing a microwave into the chamber of the microwave supply unit, the object-placing electrode, and the vacuuming unit are disposed coaxially with the center axis of the chamber, and the part for introducing a microwave includes a microwave rotation generator that rotates a polarization plane of the input microwave and supplies the microwave to the chamber.
    Type: Grant
    Filed: September 29, 2008
    Date of Patent: December 13, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Seiichi Watanabe, Naoki Yasui, Susumu Tauchi, Yasuhiro Nishimori
  • Patent number: 7955409
    Abstract: A method of smelting copper includes: a generating step of generating blister and slag from copper matte by charging the copper matte into a smelting furnace and oxidizing the copper matte; a first refining step of refining another blister from the slag by reduction in an electrical furnace; and a charging step of charging the slag into one of the smelting furnace or another smelting furnace for treating copper concentrate and generating matte as repeating flux if copper grade of slag generated in the first refining step is higher than 0.8 weight %.
    Type: Grant
    Filed: July 14, 2009
    Date of Patent: June 7, 2011
    Assignee: Pan Pacific Copper Co., Ltd.
    Inventors: Kenta Nakakado, Makoto Hamamoto, Seiichi Watanabe
  • Patent number: 7918917
    Abstract: A method of smelting copper includes: a generating step of generating blister and calcium ferrite slag from copper matte by charging the copper matte into a smelting furnace and oxidizing the copper matte; and a refining step of refining another blister from the calcium ferrite slag in an electrical furnace under a temperature condition of 1250 degrees C. to 1350 degrees C. and under a reductive atmosphere condition of oxygen partial pressure logPO2??9.3.
    Type: Grant
    Filed: July 14, 2009
    Date of Patent: April 5, 2011
    Assignee: Pan Pacific Copper Co., Ltd.
    Inventors: Kenta Nakakado, Makoto Hamamoto, Seiichi Watanabe
  • Patent number: 7919285
    Abstract: This invention relates to DNA encoding an enzyme having activity of synthesizing D-serine from formaldehyde and glycine, recombinant DNA constructed by integrating such DNA into a vector, a transformant transformed with the recombinant DNA, and a method for producing D-serine from formaldehyde and glycine with the use of the enzyme.
    Type: Grant
    Filed: October 7, 2005
    Date of Patent: April 5, 2011
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Tadashi Araki, Tomonori Hidesaki, Seiichi Watanabe, Keita Nishida, Kiyoteru Nagahara, Mitsuo Koito
  • Publication number: 20110043932
    Abstract: A lens device (10) is constituted of a lens barrel (12), and first to third lenses (14) to (16) accommodated in the lens barrel (12). The first to the third lenses (14) to (16) are formed from plastic nanocomposite material that is plastic material in which inorganic fine particles are dispersed. First to third cushioning members (18a) to (18c) are provided between rim surfaces of flanges (14b) to (16b) of the first to the third lenses (14) to (16) and inner circumferential surfaces of the lens barrel (12), respectively. Thus, corner portions (14c) to (16c) of the first to the third lenses (14) to (16) are prevented from chipping on contact with the inner circumferential surfaces of the lens barrel (12).
    Type: Application
    Filed: January 21, 2009
    Publication date: February 24, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Yoshimitsu Nomura, Tatsuhiko Obayashi, Seiichi Watanabe
  • Patent number: 7891965
    Abstract: A mold for molding a product in a cavity formed by closing the mold is provided. The mold includes a first half; a second half; and a plurality of aligning members which contact respective outer circumferential surfaces of a first die of the first half and a second die of the second half, at least in three directions, when the mold is closed. At least one of the aligning members is moved toward the outer circumferential surfaces of the first die and the second die, and then each of the aligning members sandwiches the first die and the second die, which enables a center axis alignment between the first die and the second die.
    Type: Grant
    Filed: January 9, 2007
    Date of Patent: February 22, 2011
    Assignee: Fujifilm Corporation
    Inventors: Noriko Eiha, Seiichi Watanabe, Yasuhito Hiraki
  • Publication number: 20110026109
    Abstract: In a surveillance camera 2, an optical system unit for use in imaging is provided with a first lens 7, a second lens 8, a third lens 9, and a fourth lens 10, and a subject image is formed on a photoelectric surface 12 of an imaging element through a cover glass 11. The third lens 9 is an optical lens made of a nanocomposite material of the invention in which inorganic fine particles are dispersed. A thin film layer 15 that blocks UV rays is formed on a light incident surface of the third lens 9. After passing through the first lens 7 and the second lens 8, UV rays contained in subject light are blocked by the thin film layer 15 and therefore cannot enter the third lens 9.
    Type: Application
    Filed: August 14, 2008
    Publication date: February 3, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Hiromitsu Yamakawa, Hitoshi Miyano, Eiichi Suzuki, Tatsuhiko Obayashi, Seiichi Watanabe
  • Publication number: 20100311135
    Abstract: The invention provides: an isopropyl alcohol-producing bacterium which has an acetoacetate decarboxylase activity, an isopropyl alcohol dehydrogenase activity, a CoA transferase activity and a thiolase activity having been imparted thereto and is capable of producing isopropyl alcohol from a plant-derived material; a method of producing isopropyl alcohol whereby isopropyl alcohol is produced from a plant-derived material by using this isopropyl alcohol-producing bacterium; and an apparatus therefor.
    Type: Application
    Filed: July 4, 2008
    Publication date: December 9, 2010
    Inventors: Nozomi Takebayashi, Mitsufumi Wada, Daisuke Mochizuki, Fuminobu Yoshimi, Seiichi Watanabe, Hitoshi Takahashi, Takashi Morishige
  • Publication number: 20100296181
    Abstract: A second lens (15) of a concave meniscus type is formed from a plastic nanocomposite material. An approximately annular flange (15b) is formed along an outer periphery of a lens body portion (15a). The lens body portion (15a) and the flange (15b) are formed to satisfy 1<(Lt/Ft)<5 and (CA/4)?b. “CA” is a diameter of the lens body portion (15a). “Ft” is a thickness at a center of the lens body portion (15a). “Lt” is a thickness of the flange (15b) in an optical axis direction. “R” is an outer diameter of the flange (15b). “b” is one-half of a difference between the outer diameter R and the diameter CA. Increasing the thickness of the flange (15b) increases mechanical strength of the second lens (15), thus preventing the second lens (15) from being damaged easily.
    Type: Application
    Filed: January 21, 2009
    Publication date: November 25, 2010
    Inventors: Yoshimitsu Nomura, Tatsuhiko Obayashi, Seiichi Watanabe
  • Patent number: 7833451
    Abstract: In a mold, at least a first half includes an insert member forming a cavity surface on one end side; a body member having an insertion part into which the insert member is inserted; and an insert member fixer interposed between the insert member and the insertion part, for holding the insert member. The insert member fixer is made of a shape memory alloy, and presses and holds the insert member when the insert member fixer restores its memorized shape, to make a center axis alignment of the insert member with respect to the body member.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: November 16, 2010
    Assignee: Fujifilm Corporation
    Inventors: Noriko Eiha, Seiichi Watanabe, Yasuhito Hiraki
  • Patent number: 7807581
    Abstract: The present invention provides a plasma processing apparatus or a plasma processing method that can etch a multilayer film structure for constituting a gate structure with high accuracy and high efficiency. A plasma processing method of, on processing a sample on a sample stage 112 in a depressurized discharge room 117, etching a multilayer film (including a high-k and a metal gate) at 0.1 Pa or less and with the sample stage 112 temperature-regulated by using a pressure gauge 133 to be used for pressure regulation and connected to the processing room and a main pump for exhaustion 130.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: October 5, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Susumu Tauchi, Akitaka Makino, Seiichi Watanabe, Naoki Yasui
  • Publication number: 20100225013
    Abstract: A method for producing an optical member from a nanocomposite material which includes a thermoplastic resin containing inorganic fine particles is provided. The method includes: a first step of preparing in a solution the thermoplastic resin containing the inorganic fine particles; a second step of drying and solidifying the solution containing the prepared thermoplastic resin to produce the nanocomposite material having a specific surface area (surface area/volume) of 15 mm?1 or more; and a third step of heat-compressing the produced nanocomposite material to form the optical member in a desired shape.
    Type: Application
    Filed: September 18, 2008
    Publication date: September 9, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Noriko Eiha, Seiichi Watanabe, Masato Yoshioka
  • Publication number: 20100214663
    Abstract: A method for molding an optical member from a material of a nanocomposite resin which includes a thermoplastic resin containing inorganic fine particles is provided. The method includes: charging a solution containing a solvent and the nanocomposite resin into a vessel providing at least an optical surface shape and an opening to an atmosphere, and evaporating the solvent from the opening to solidify and form an optical surface of the optical member into a finished shape.
    Type: Application
    Filed: August 29, 2008
    Publication date: August 26, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Masato Yoshioka, Noriko Eiha, Seiichi Watanabe
  • Publication number: 20100104855
    Abstract: A method for manufacturing a preform from a nano composite resin that includes a thermoplastic resin containing inorganic fine particles, the preform being a pre-finish product of an optical member having an optical surface formed by press molding, is provided. The method includes: supplying a solution including the nano composite resin and a solvent into a mold which has an approximate optical surface closely resembling the optical surface and an opening to an atmosphere; and evaporating the solvent while a shape of the approximate optical surface is kept, to solidify the solution.
    Type: Application
    Filed: March 28, 2008
    Publication date: April 29, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Masato Yoshioka, Noriko Eiha, Seiichi Watanabe
  • Patent number: 7700330
    Abstract: The invention is to provide a process for effectively removing impurities contained in an amide compound-containing solution by making an amide compound-containing solution, particularly an amide compound-containing solution produced by a hydration reaction of a nitrile compound by using a microorganism fungus body containing nitrile hydratase or a processed product of the microorganism fungus body, in contact with activated carbon under acidic conditions.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: April 20, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Takeya Abe, Kiyoshi Itou, Kenju Sasaki, Seiichi Watanabe, Tamotsu Asano