Patents by Inventor Seiji Nakagawa
Seiji Nakagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11934938Abstract: A computer implemented method for training a neural network to capture a structural feature specific to a set of chemical compounds is disclosed. In the method, the computer system reads an expression describing a structure of the chemical compound for each chemical compound in the set and enumerates one or more combinations of a position and a type of a structural element appearing in the expression for each chemical compound in the set. The computer system also generates training data based on the one or more enumerated combinations for each chemical compound in the set. The training data includes one or more values with a length, each of which indicates whether or not a corresponding type of the structural element appears at a corresponding position for each combination. Furthermore, the computer system trains the neural network based on the training data for the set of the chemical compounds.Type: GrantFiled: December 23, 2020Date of Patent: March 19, 2024Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Satoshi Hara, Gakuto Kurata, Shigeru Nakagawa, Seiji Takeda
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Patent number: 10358794Abstract: A work vehicle, includes: a lift arm rotatably linked to a front portion of a vehicle body of a work vehicle so as to be allowed to swing along an up/down direction; an operation lever that can be operated within a range between a raising operation end position and a lowering operation end position, and is operated to raise and lower the lift arm; an up detent mechanism having a holding function for holding the operation lever at the raising operation end position once the operation lever is operated to the raising operation end position; and a down detent mechanism having a holding function for holding the operation lever at the lowering operation end position once the operation lever is operated to the lowering operation end position, wherein: when an angle of the lift arm becomes greater than a predetermined upper limit, the holding function of the up detent mechanism and the holding function of the down detent mechanism are disengaged.Type: GrantFiled: May 13, 2015Date of Patent: July 23, 2019Assignee: KCM CorporationInventors: Tetsuji Tanaka, Yasunori Miyamoto, Koji Hyodo, Isamu Aoki, Katsuyuki Kirita, Hiroaki Yada, Seiji Nakagawa, Masaki Yoshikawa
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Patent number: 10051882Abstract: A measuring apparatus for performing a basis weight measuring method for sheet tobacco according to the present invention includes: a light source (28) that emits light to sheet tobacco (ST) passing through a measurement position (P) on a transport path (18); and a visual sensor (30), the visual sensor (30) having a color camera (32) disposed with the transport path (18) put between the color camera (32) and the light source (28), a processing part (40) that transforms a color image of the sheet tobacco (ST) taken by the camera (32) into a grayscale image, and a conversion part (42) that converts an average gray level of the grayscale image into a basis weight of the sheet tobacco (ST) with reference to a conversion map which indicates a relationship between the average gray level of the grayscale image and an actual basis weight of sheet tobacco (ST).Type: GrantFiled: January 28, 2015Date of Patent: August 21, 2018Assignee: JAPAN TOBACCO INC.Inventors: Seiji Nakagawa, Kazuhiro Tokuda, Kaoru Narazaki, Tsutomu Kamishiraki, Yasushige Tsuchiya
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Publication number: 20160369479Abstract: A work vehicle, includes: a lift arm rotatably linked to a front portion of a vehicle body of a work vehicle so as to be allowed to swing along an up/down direction; an operation lever that can be operated within a range between a raising operation end position and a lowering operation end position, and is operated to raise and lower the lift arm; an up detent mechanism having a holding function for holding the operation lever at the raising operation end position once the operation lever is operated to the raising operation end position; and a down detent mechanism having a holding function for holding the operation lever at the lowering operation end position once the operation lever is operated to the lowering operation end position, wherein: when an angle of the lift arm becomes greater than a predetermined upper limit, the holding function of the up detent mechanism and the holding function of the down detent mechanism are disengaged.Type: ApplicationFiled: May 13, 2015Publication date: December 22, 2016Inventors: Tetsuji TANAKA, Yasunori MIYAMOTO, Koji HYODO, Isamu AOKI, Katsuyuki KIRITA, Hiroaki YADA, Seiji NAKAGAWA, Masaki YOSHIKAWA
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Publication number: 20160330815Abstract: An illuminating method for illuminating a specific region S and peripheral regions Ca, Cb thereof by a plurality of light sources 10a, 10b, wherein the light sources 10a, 10b have mutually different flicker frequencies, and their irradiation areas Ia, Ib overlap each other in the specific region S, thus causing an observer to perceive in the specific region S a flicker stimulation having a frequency different from the flicker frequencies of light perceived by the observer in the peripheral regions Ca, Cb where the irradiation areas do not overlap each other.Type: ApplicationFiled: September 2, 2014Publication date: November 10, 2016Inventors: Seiji NAKAGAWA, Yosuke OKAMOTO
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Publication number: 20160142817Abstract: A method for measuring propagation delay characteristics in a multipath propagation environment, wherein the propagation delay characteristics are measured between a transmission means and a reception means provided in the multipath propagation environment, the method comprising a transmission step of transmitting a measurement signal comprising an information signal having a predetermined frequency from the transmission means; a reception step of receiving the measurement signal that has traveled along a plurality of propagation paths by the reception means; a calculation step of performing Hilbert transform on the received information signal to calculate instantaneous frequency characteristics from a resulting Hilbert transform signal; and an output step of outputting propagation delay characteristics corresponding to the frequency of the information signal based on the instantaneous frequency characteristics.Type: ApplicationFiled: June 16, 2014Publication date: May 19, 2016Applicant: National Institute of Advanced Industrial Science and TechnologyInventors: Takuya HOTEHAMA, Seiji NAKAGAWA
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Publication number: 20150136161Abstract: A measuring apparatus for performing a basis weight measuring method for sheet tobacco according to the present invention includes: a light source (28) that emits light to sheet tobacco (ST) passing through a measurement position (P) on a transport path (18); and a visual sensor (30), the visual sensor (30) having a color camera (32) disposed with the transport path (18) put between the color camera (32) and the light source (28), a processing part (40) that transforms a color image of the sheet tobacco (ST) taken by the camera (32) into a grayscale image, and a conversion part (42) that converts an average gray level of the grayscale image into a basis weight of the sheet tobacco (ST) with reference to a conversion map which indicates a relationship between the average gray level of the grayscale image and an actual basis weight of sheet tobacco (ST).Type: ApplicationFiled: January 28, 2015Publication date: May 21, 2015Applicant: JAPAN TOBACCO INC.Inventors: Seiji NAKAGAWA, Kazuhiro TOKUDA, Kaoru NARAZAKI, Tsutomu KAMISHIRAKI, Yasushige TSUCHIYA
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Publication number: 20140234773Abstract: An aspect of the present embodiment, there is provided a method of coating resist, including providing solvent on a substrate to be processed being set to be nearly still, and rotating the substrate to be processed to provide resist solution on the substrate to be processed from a resist supply nozzle in a state that a top edge of the resist supply nozzle is inserted into the solvent.Type: ApplicationFiled: February 14, 2014Publication date: August 21, 2014Applicant: Kabushiki Kaisha ToshibaInventors: Katsunori SUZUKI, Seiji Nakagawa, Hiroharu Fujise
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Publication number: 20120058440Abstract: An oven is described that can more evenly heat the semiconductor wafer, even though the wafer may warp during heating. The oven may provide relatively uniform heating even though the type and location of warping may be unpredictable for any given wafer. The oven may have a heating surface divided into a plurality of heating zones that may each independently provide a given amount of heat to the wafer. The amount of heat provided by each zone may be determined using signals from sensors that sense the warping of the wafer.Type: ApplicationFiled: November 11, 2011Publication date: March 8, 2012Applicant: KABUSHIKI KAISHA TOSHIBAInventor: Seiji NAKAGAWA
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Patent number: 8125734Abstract: Embodiments of the present invention provide a magnetic slider of which terminals have a sufficiently large process margin for the laser condition in the SBB process. According to one embodiment, a magnetic slider comprises: a read element and a write element; plural wiring lines which are connected to the read element and the write element; a protective film which covers the read element, the write element and the plural-wiring lines; plural slider pads formed on the protective film; and plural studs which respectively connect the slider pads and the wiring lines and are covered by the protective film, wherein each of the slider pads comprises a chromium film, a nickel iron film and a gold film, the nickel iron film is formed between the chromium film and the gold film, and the chromium film is formed between the nickel iron film and one of the studs and is in contact with the protective film.Type: GrantFiled: September 5, 2007Date of Patent: February 28, 2012Assignee: Hitachi Global Storage Technologies, Netherlands B.V.Inventors: Hiroshi Umezaki, Seiji Nakagawa, Yuhsuke Matsumoto, Yoshihisa Takeo, Gen Oikawa, Hiroshi Kamio
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Patent number: 8073316Abstract: An oven is described that can more evenly heat the semiconductor wafer, even though the wafer may warp during heating. The oven may provide relatively uniform heating even though the type and location of warping may be unpredictable for any given wafer. The oven may have a heating surface divided into a plurality of heating zones that may each independently provide a given amount of heat to the wafer. The amount of heat provided by each zone may be determined using signals from sensors that sense the warping of the wafer.Type: GrantFiled: January 31, 2008Date of Patent: December 6, 2011Assignee: Kabushiki Kaisha ToshibaInventor: Seiji Nakagawa
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Patent number: 7803720Abstract: A coating system and method of coating semiconductor wafers is disclosed that is able to maintain a wet condition on the outer portion of the semiconductor wafer to provide ease of spreading for a photo-resist or anti-reflective coating (ARC) that is being dispensed. The system can include a plurality of nozzles on a movable arm. A first nozzle dispenses a pre-wet solvent onto the semiconductor wafer. A second nozzle then dispenses the photo-resist or ARC coating onto the semiconductor wafer. A third nozzle dispenses additional pre-wet solvent onto the outer edge of the semiconductor wafer as the photo-resist or ARC coating is being dispensed. The nozzles dispense solutions onto the semiconductor wafer as it rotates. The system produces semiconductor wafers with few coating defects and uses less photo-resist or ARC coating.Type: GrantFiled: January 25, 2008Date of Patent: September 28, 2010Assignee: Kabushiki Kaisha ToshibaInventor: Seiji Nakagawa
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Publication number: 20090196588Abstract: An oven is described that can more evenly heat the semiconductor wafer, even though the wafer may warp during heating. The oven may provide relatively uniform heating even though the type and location of warping may be unpredictable for any given wafer. The oven may have a heating surface divided into a plurality of heating zones that may each independently provide a given amount of heat to the wafer. The amount of heat provided by each zone may be determined using signals from sensors that sense the warping of the wafer.Type: ApplicationFiled: January 31, 2008Publication date: August 6, 2009Applicant: Toshiba America Electronic Components, Inc.Inventor: Seiji Nakagawa
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Publication number: 20090191720Abstract: A coating system and method of coating semiconductor wafers is disclosed that is able to maintain a wet condition on the outer portion of the semiconductor wafer to provide ease of spreading for a photo-resist or anti-reflective coating (ARC) that is being dispensed. The system can include a plurality of nozzles on a movable arm. A first nozzle dispenses a pre-wet solvent onto the semiconductor wafer. A second nozzle then dispenses the photo-resist or ARC coating onto the semiconductor wafer. A third nozzle dispenses additional pre-wet solvent onto the outer edge of the semiconductor wafer as the photo-resist or ARC coating is being dispensed. The nozzles dispense solutions onto the semiconductor wafer as it rotates. The system produces semiconductor wafers with few coating defects and uses less photo-resist or ARC coating.Type: ApplicationFiled: January 25, 2008Publication date: July 30, 2009Applicant: TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC.Inventor: Seiji Nakagawa
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Patent number: 7474212Abstract: The device will make it easy to recognize an individual object located at a specific location using radio frequency ID tags. The device includes an object having an object main body, a tag provided with the object main body, and a display section provided with the object main body to display the information corresponding to the ID information stored on the tag.Type: GrantFiled: July 7, 2005Date of Patent: January 6, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Seiji Nakagawa, Minoru Okamoto
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Patent number: 7457741Abstract: A device (1) for transmitting speech information to the human body, comprising: a microphone (2) for inputting speech from an external source; a speech signal processor (20) that produces a consonant-clarified signal based on the input speech signal; a carrier signal generator (6) that produces a carrier signal; an amplitude modulator (8) that modulates the amplitude of the carrier signal based on the consonant-clarified signal; and a vibrator (12) that transmits mechanical vibrations based on the amplitude-modulated output signal; the speech signal processor (20) comprising: a consonant extracting unit that extracts the consonant parts from the speech signal; and a repetition processing unit that adds the extracted consonant parts to the speech signal to produce a consonant-clarified signal in which each of the consonant parts of the speech signal is repeated two or more times. This speech information transmitting device realizes good discriminability of speech information.Type: GrantFiled: March 29, 2005Date of Patent: November 25, 2008Assignee: National Institute of Advnaced Industrial Science and TechnologyInventors: Seiji Nakagawa, Kiyoshi Fujimoto, Yoh-ichi Fujisaka, Yosuke Okamoto
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Publication number: 20080199596Abstract: A system and method for dispensing fluid onto a surface during a manufacturing process. A fluid storage container holds a chemical, such as resist, used in a semiconductor lithography process. When not dispensing the chemical over the surface of a wafer, a pump and nozzle dispense the chemical into a dedicated dispense receptacle. A drain and pump may return the contents of the dispense receptacle to the fluid storage container for reuse.Type: ApplicationFiled: February 21, 2007Publication date: August 21, 2008Applicant: TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC.Inventor: Seiji Nakagawa
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Publication number: 20080169230Abstract: A pumping/dispensing system is disclosed that is able to efficiently pump and dispense resist solution, anti-reflective coating (ARC) solution, or other solutions, with less bubbles, such as micro-bubbles, and/or less dissolved gas. The system has a pump that separates bubbles from the solution prior to dispensing the solution outside of the system. A circulation loop is provided in which the solution passes through a filter before being pumped. A pressure drop across the filter is sufficient to induce bubbles at the back end of the filter, and these bubbles are separated and removed by the pump before dispending. Accordingly, little or no further bubbles are formed at the pressure drop of the outlet when dispensing the solution.Type: ApplicationFiled: January 12, 2007Publication date: July 17, 2008Applicant: TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC.Inventor: Seiji Nakagawa
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Publication number: 20080076077Abstract: Apparatuses and methods for heating semiconductor wafers with high temperature uniformity are described. In particular, rotation of the hot plate and/or wafer during heating operations such as the post exposure bake (PEB) can compensate for non-circular temperature gradients caused by the random generation of air currents and other non-uniform environmental conditions within the oven chamber. Temperature variations caused by these influences, while not easily corrected through zonal heater adjustment alone, are a major determinant of critical dimension control and consequently the overall semiconductor quality.Type: ApplicationFiled: September 21, 2006Publication date: March 27, 2008Applicant: Toshiba America Electronic Components, Inc.Inventor: Seiji Nakagawa
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Patent number: D693853Type: GrantFiled: March 15, 2013Date of Patent: November 19, 2013Assignee: Hitachi Construction Machinery Co., Ltd.Inventors: Kazuhiko Hiraoka, Kouji Kimijima, Akira Shimohira, Hiroaki Yada, Kouji Takehi, Katsuhisa Onoguchi, Seiji Nakagawa, Yuuji Akutsu, Tadashi Koseki, Wataru Isaka, Hirofumi Oouchi