Patents by Inventor Seiji Okura
Seiji Okura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170262530Abstract: A computer generates searching context information relating to appearance frequencies of words or semantic codes in a searching query sentence from the searching query sentence. Semantic analysis is performed on sentences included in documents so as to generate semantic structures, and each of the semantic structures includes three or more semantic codes and a relationship type among the semantic codes. A plurality of context information is generated and each context information relates to an appearance frequency of a word or a semantic code in a group of documents that match each of the semantic structures. The computer specifies one semantic structure of the semantic structures in accordance with the searching context information and the plurality of context information, and searches for a similar document by using the specified semantic structure.Type: ApplicationFiled: March 7, 2017Publication date: September 14, 2017Applicant: FUJITSU LIMITEDInventor: Seiji OKURA
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Patent number: 9659004Abstract: A processor performs semantic analysis on a query and generates one or more semantic structures where each structure is expressed by a graph. The processor generates retrieval keys corresponding to combinations of nodes connected directly or indirectly in the semantic structures, in addition to retrieval keys corresponding to minimum units of semantic connections between nodes in the generated semantic structures. The processor retrieves relevant documents whose sentences are matched to combinations of nodes, by using the generated retrieval keys, in the semantic structures stored in an index for retrieval on a database storing the documents.Type: GrantFiled: September 8, 2014Date of Patent: May 23, 2017Assignee: FUJITSU LIMITEDInventors: Seiji Okura, Akira Ushioda
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Publication number: 20170140926Abstract: A process is provided for depositing a substantially amorphous titanium oxynitride thin film that can be used, for example, in integrated circuit fabrication, such as in forming spacers in a pitch multiplication process. The process comprises contacting the substrate with a titanium reactant and removing excess titanium reactant and reaction byproducts, if any. The substrate is then contacted with a second reactant which comprises reactive species generated by plasma, wherein one of the reactive species comprises nitrogen. The second reactant and reaction byproducts, if any, are removed. The contacting and removing steps are repeated until a titanium oxynitride thin film of desired thickness has been formed.Type: ApplicationFiled: December 19, 2016Publication date: May 18, 2017Inventors: Viljami J. Pore, Seiji Okura, Hidemi Suemori
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Patent number: 9540729Abstract: Processes are provided for depositing titanium nanolaminate thin films that can be used, for example, in integrated circuit fabrication, such as in forming spacers in a pitch multiplication process. In some embodiments a titanium nanolaminate film comprising titanium oxide layers and titanium nitride layers is deposited on a three-dimensional feature, such as an existing mask feature. The conformal titanium nanolaminate film may be directionally etched so that only the titanium nanolaminate deposited or formed on the sidewalls of the existing three-dimensional feature remains. The three-dimensional feature is then removed via an etching process, leaving the pitch doubled titanium nanolaminate film.Type: GrantFiled: August 25, 2015Date of Patent: January 10, 2017Assignee: ASM IP HOLDING B.V.Inventors: Seiji Okura, Hidemi Suemori, Viljami J. Pore
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Patent number: 9523148Abstract: A process is provided for depositing a substantially amorphous titanium oxynitride thin film that can be used, for example, in integrated circuit fabrication, such as in forming spacers in a pitch multiplication process. The process comprises contacting the substrate with a titanium reactant and removing excess titanium reactant and reaction byproducts, if any. The substrate is then contacted with a second reactant which comprises reactive species generated by plasma, wherein one of the reactive species comprises nitrogen. The second reactant and reaction byproducts, if any, are removed. The contacting and removing steps are repeated until a titanium oxynitride thin film of desired thickness has been formed.Type: GrantFiled: August 25, 2015Date of Patent: December 20, 2016Assignee: ASM IP HOLDINGS B.V.Inventors: Viljami J. Pore, Seiji Okura, Hidemi Suemori
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Publication number: 20160217207Abstract: A non-transitory computer-readable recording medium stores a semantic structure search program. The semantic structure search program causes a computer to execute the following process. The computer generates a plurality of search semantic symbols from a search request. Next, the computer specifies a position of a specific word that corresponds to the search request in a search target document, by the plurality of search semantic symbols and document semantic structure position information. The document semantic structure position information includes a relationship information between a plurality of semantic symbols and a plurality of positions of a plurality of words in the search target document. The plurality of semantic symbols represent a semantic structure corresponding to the plurality of words. Thereafter, the computer outputs a search result including the specific word and the position of the specific word in the search target document.Type: ApplicationFiled: January 14, 2016Publication date: July 28, 2016Applicant: FUJITSU LIMITEDInventors: Seiji Okura, Masahiro Kataoka, Masao Ideuchi
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Publication number: 20150205860Abstract: An information retrieval device includes a processor that executes processing including: breaking down a natural sentence into a plurality of words and creating retrieval keys from retrieval key candidates which each include two words out of the plurality of words, on the basis of the characteristics that are given to each of the two words; specifying the documents that include the retrieval keys, and calculating the evaluation values of the specified documents and the number of specified documents; recalculating the evaluation values of the documents that correspond to the retrieval keys that are determined to be noise, on the basis of the number of specified documents; and outputting the documents on the basis of the recalculated evaluation values.Type: ApplicationFiled: January 14, 2015Publication date: July 23, 2015Inventors: Seiji Okura, Akira Ushioda
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Publication number: 20150125628Abstract: Disclosed is a method of depositing a thin film, which includes supplying a purge gas and a source gas into a plurality of reactors for a first period, stopping supplying of the source gas, and supplying the purge gas and a reaction gas into the plurality of reactors for a second period, and supplying the reaction gas and plasma into the plurality of reactors for a third period.Type: ApplicationFiled: May 23, 2014Publication date: May 7, 2015Applicant: ASM IP Holding B.V.Inventors: Dae Youn KIM, Seung Woo CHOI, Young Hoon KIM, Seiji OKURA, Hyung Wook NOH, Dong Seok KANG
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Patent number: 9009023Abstract: A typical sentence having a specific typical characteristic in the sentence is divided. A division target typical sentence is divided on the basis of a small clause definition. The sentence is divided where positions suitable for dividing the typical sentence based on the structure are expressed by a user. A small clause string including small clauses that serve as independent sentences is created after the division. The small clause string is compared to the structure patterns, and a structure pattern that is determined to match the small clause string is selected as a result of the typical sentence division.Type: GrantFiled: March 27, 2008Date of Patent: April 14, 2015Assignee: Fujitsu LimitedInventors: Masaru Fuji, Tomoki Nagase, Seiji Okura, Akira Ushioda
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Publication number: 20150081715Abstract: A processor performs semantic analysis on a query and generates one or more semantic structures where each structure is expressed by a graph. The processor generates retrieval keys corresponding to combinations of nodes connected directly or indirectly in the semantic structures, in addition to retrieval keys corresponding to minimum units of semantic connections between nodes in the generated semantic structures. The processor retrieves relevant documents whose sentences are matched to combinations of nodes, by using the generated retrieval keys, in the semantic structures stored in an index for retrieval on a database storing the documents.Type: ApplicationFiled: September 8, 2014Publication date: March 19, 2015Inventors: Seiji OKURA, Akira USHIODA
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Publication number: 20140358522Abstract: A processor of an information search apparatus receives an input of information that includes a plurality of search words. The processor separates two search words from the received information. The processor searches for and extracts, from a storage unit, two words that correspond to the two search words and semantic information of the two words, the storage unit storing a plurality of words included in a search target sentence and semantic information in association with the search target sentence, the semantic information stored in the storage unit indicating a relationship established within the search target sentence between the plurality of words and another word. An output unit outputs the extracted semantic information. This allows an intended search result to be obtained efficiently.Type: ApplicationFiled: May 23, 2014Publication date: December 4, 2014Applicant: FUJITSU LIMITEDInventors: Seiji Okura, Akira Ushioda
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Patent number: 8277560Abstract: A CVD apparatus cleaning method that efficiently removes by-product such as SiO2 or Si3N4 adhered to and deposited on surfaces of an inner wall, an electrode, and the like in a reaction chamber at a film forming step. In the cleaning method the discharged cleaning gas amount is very small, environmental influences such as global warming can be lessened, and cost can be reduced. A CVD apparatus supplying reactive gas into a reaction chamber and forming a deposited film on a surface of a base material provided in the reaction chamber includes an exhaust gas recycling path recycling an exhaust gas reaching the reaction chamber from downstream of a pump on an exhaust path for exhausting a gas from an inner part of the reaction chamber through the pump.Type: GrantFiled: March 19, 2003Date of Patent: October 2, 2012Assignees: National Institute of Advanced Industrial Science and Technology, Canon Anelva Corporation, Ulvac, Inc., Kanto Denka Kogyo Co., Ltd., Sanyo Electric Co., Ltd., Showa Denko K.K., Sony Corporation, Tokyo Eectron Limited, Hitachi Kokusai Electric Inc., Panasonic Corporation, Mitsubishi Denki Kabushiki Kaisha, Renesas Electronics CorporationInventors: Katsuo Sakai, Seiji Okura, Masaji Sakamura, Kaoru Abe, Hitoshi Murata, Etsuo Wani, Kenji Kameda, Yuki Mitsui, Yutaka Ohira, Taisuke Yonemura, Akira Sekiya
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Patent number: 8214198Abstract: In a computer for supporting translation work, an acquisition unit retrieves a pair of original document including a plurality of original sentences and translated document including a plurality of translated sentences from a document storage unit. An estimation unit counts the number of original sentences included in the original document and the number of translated sentences included in the translated document, and estimates a position of a translated sentence corresponding to each original sentence in the translated document based on a ratio of the number of original sentences to the number of translated sentences and a positional order of each original sentence in the original document. An alignment unit aligns each original sentence with the translated sentence located at the estimated position, and outputs information indicating the correspondences between the original and translated sentences.Type: GrantFiled: December 15, 2009Date of Patent: July 3, 2012Assignee: Fujitsu LimitedInventors: Seiji Okura, Tomoki Nagase, Akira Ushioda, Masaru Fuji
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Patent number: 8043438Abstract: An apparatus for cleaning a CVD apparatus that can efficiently remove a by-product such as SiO2 or Si3N4 stuck and deposited onto the surface of an internal wall, an electrode, or the like in a reaction chamber in a film forming process, and a method for cleaning a CVD apparatus. A control monitors luminous intensity data of an F radical in a reaction chamber by optical emission spectroscopy and compares the data with calibrated prestored luminous intensity data, and ends cleaning after a predetermined time passes from reaching a luminous intensity saturation point. Furthermore, concentration data of SiF4 in a gas discharged from the reaction chamber are monitored by a Fourier transform infrared spectrometry and compared with prestored concentration data of SiF4 to decide that the predetermined time has passed when a predetermined cleaning end point concentration is reached, thereby ending the cleaning.Type: GrantFiled: March 12, 2004Date of Patent: October 25, 2011Assignees: National Institute of Advanced Industrial Science and Technology, Canon Anelva Corporation, Ulvac, Inc., Sanyo Electric Co., Ltd., Sony Corporation, Tokyo Electron Limited, Hitachi Kokusai Electric Inc., Renesas Electronics Corporation, Fujitsu Semiconductor LimitedInventors: Katsuo Sakai, Kaoru Abe, Seiji Okura, Masaji Sakamura, Hitoshi Murata, Kenji Kameda, Etsuo Wani, Akira Sekiya
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Patent number: 8024175Abstract: A translation memory system enabling the user to not only narrow down the view range of search result, but also view a surrounding context of a retrieved text. Stored parallel texts include sentence-class and segment-class parallel texts. Parallel texts relevant to a given input text are retrieved and subjected to calculation of match rates with respect to the input text. A downward link is then added to each retrieved sentence-class parallel text, while an upward link is added to each retrieved segment-class parallel text. A search result screen shows a best matching parallel text with an expand button and/or a shrink button. The expand button causes the current parallel text to be replaced with an upper-class parallel text pointed at by a corresponding upward link. The shrink button causes the current parallel text to be replaced with a lower-class parallel text pointed at by a corresponding downward link.Type: GrantFiled: October 22, 2007Date of Patent: September 20, 2011Assignee: Fujitsu LimitedInventors: Masaru Fuji, Seiji Okura, Tomoki Nagase
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Patent number: 7930166Abstract: A translation support device for supporting a process of translating an original sentence in a language into another language, comprising a partial expression setting unit, a dummy head setting unit, an original sentence replacement unit, a translated sentence obtaining unit, and a translated sentence replacement unit.Type: GrantFiled: March 2, 2005Date of Patent: April 19, 2011Assignee: Fujitsu LimitedInventors: Akira Ushioda, Masaru Fuji, Seiji Okura, Tatsuo Yamashita
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Publication number: 20100094617Abstract: In a computer for supporting translation work, an acquisition unit retrieves a pair of original document including a plurality of original sentences and translated document including a plurality of translated sentences from a document storage unit. An estimation unit counts the number of original sentences included in the original document and the number of translated sentences included in the translated document, and estimates a position of a translated sentence corresponding to each original sentence in the translated document based on a ratio of the number of original sentences to the number of translated sentences and a positional order of each original sentence in the original document. An alignment unit aligns each original sentence with the translated sentence located at the estimated position, and outputs information indicating the correspondences between the original and translated sentences.Type: ApplicationFiled: December 15, 2009Publication date: April 15, 2010Applicant: FUJITSU LIMITEDInventors: Seiji Okura, Tomoki Nagase, Akira Ushioda, Masaru Fuji
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Publication number: 20090269506Abstract: The present invention provides a process and an apparatus for remote plasma cleaning of a process chamber of a chemical vapor deposition (CVD) reactor. The reactive species are generated in a remote plasma unit and are introduced into the process chamber through a plurality of inlet holes. The reactive species are free radicals such as oxygen radicals, fluorine radicals, and the like. These reactive species react with the unwanted residues in the process chamber and generate volatile products. The invention also provides a method for controlling the flow rate of the reactive species.Type: ApplicationFiled: April 24, 2008Publication date: October 29, 2009Inventor: Seiji Okura
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Publication number: 20090249197Abstract: An apparatus includes a mechanism for selecting a replacement source expression associated with respective replacement destination expressions, and the respective replacement destination expressions associated with the replacement source expression; a mechanism for extracting the replacement source expression associated with the replacement destination expression which is the same expression as the selected replacement destination expression, and creating an expression list; a mechanism for determining whether or not an expression group included in the expression list for one field is similar to an expression group included in the expression list; and a mechanism for generating a proofreading complementary dictionary, which associates an expression included in the expression list with a high replacement destination expression included in the expression list.Type: ApplicationFiled: March 30, 2009Publication date: October 1, 2009Applicant: FUJITSU LIMITEDInventors: Tomoki Nagase, Masaru Fuji, Seiji Okura
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Publication number: 20090090382Abstract: A method of self-cleaning a plasma reactor upon depositing a carbon-based film on a substrate a pre-selected number of times, includes: (i) exciting oxygen gas and/or nitrogen oxide gas to generate a plasma; and (ii) exposing to the plasma a carbon-based film accumulated on an upper electrode provided in the reactor and a carbon-based film accumulated on an inner wall of the reactor.Type: ApplicationFiled: October 5, 2007Publication date: April 9, 2009Applicant: ASM JAPAN K.K.Inventors: Yoshinori Morisada, Seiji Okura, Kamal Kishore Goundar, Seongoh Woo, Kiyoshi Satoh