Patents by Inventor Seong Hyeon JEON

Seong Hyeon JEON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10995268
    Abstract: A silicon nitride etching composition effective to selectively etch a silicon nitride film contains an inorganic acid; a silicon-based compound; from 0.01 to 1 wt%, based on total weight of the etching composition, of an ammonium-based compound composed of ammonium acetic acid; and water. The silicon-based compound may be represented by Chemical Formula 1 below or Chemical Formula 2 below, (R1)3-Si-R2-Si-(R1)3??Chemical Formula 1, (R3)3-Si-R4-Si-(R3)3??Chemicl Formula 2. A method of etching a silicon nitride film includes providing the etching composition; and wet etching the silicon nitride film in the etching composition at an etching rate that is at least 200 times faster than a corresponding silicon oxide film.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: May 4, 2021
    Assignee: LTCAM CO., LTD.
    Inventors: Sok Ho Lee, Jung Hwan Song, Seong Sik Jeon, Sung Il Jo, Byeoung Tak Kim, Ah Hyeon Lim, Junwoo Lee
  • Publication number: 20200330350
    Abstract: Provided are a novel pseudoceramide compound and uses thereof. The pseudoceramide has antioxidant, anti-inflammatory, skin whitening, and moisturizing effects. In addition, the pseudoceramide can be synthesized in a simple and economically advantageous manner and is free from problems associated with the preparation of cosmetic formulations resulting from low hydrophilicity, thus being suitable for use in cosmetic applications.
    Type: Application
    Filed: November 22, 2017
    Publication date: October 22, 2020
    Inventors: Jin Oh PARK, Ji Won LEE, Seong Hyeon JEON, Jae Young LEE, Hye Ja LEE, Bo Kyung KWON