Patents by Inventor Shiang-Bau Wang
Shiang-Bau Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11848240Abstract: A conductive gate over a semiconductor fin is cut into a first conductive gate and a second conductive gate. An oxide is removed from sidewalls of the first conductive gate and a dielectric material is applied to the sidewalls. Spacers adjacent to the conductive gate are removed to form voids, and the voids are capped with a dielectric material to form air spacers.Type: GrantFiled: December 7, 2020Date of Patent: December 19, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shu-Uei Jang, Chen-Huang Huang, Ryan Chia-Jen Chen, Shiang-Bau Wang, Shu-Yuan Ku
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Publication number: 20230395392Abstract: A method for manufacturing a semiconductor structure includes: forming a semiconductor device on a main region of the device substrate, the device substrate having a peripheral region surrounding the main region; forming a first filling layer on the peripheral region of the device substrate; forming a second filling layer over the first filling layer and the semiconductor device after forming the first filling layer, the second filling layer having a polishing rate different from that of the first filling layer; performing a planarization process over the second filling layer to remove a portion of the second filling layer so that a remaining portion of the second filling layer has a planarized surface opposite to the device substrate; and bonding the device substrate to a carrier substrate through the first filling layer and the remaining portion of the second filling layer.Type: ApplicationFiled: June 6, 2022Publication date: December 7, 2023Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Pei-Yu CHOU, Yen-Yu CHEN, Meng-Ku CHEN, Shiang-Bau WANG, Tze-Liang LEE
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Publication number: 20230377990Abstract: In an embodiment, a device includes: a first fin extending from a substrate; a gate stack disposed on the first fin; a source/drain region disposed in the first fin; a contact etch stop layer (CESL) disposed over the source/drain region; a gate spacer extending along a side of the gate stack; and a dielectric plug disposed between the CESL and the gate spacer, where the dielectric plug, the CESL, the gate spacer, and the source/drain region collectively define a void physically separating the gate stack from the source/drain region.Type: ApplicationFiled: August 4, 2023Publication date: November 23, 2023Inventors: Shiang-Bau Wang, Li-Wei Yin, Chen-Huang Huang, Ming-Jhe Sie, Ryan Chia-Jen Chen
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Patent number: 11823958Abstract: In an embodiment, a device includes: a first fin extending from a substrate; a gate stack disposed on the first fin; a source/drain region disposed in the first fin; a contact etch stop layer (CESL) disposed over the source/drain region; a gate spacer extending along a side of the gate stack; and a dielectric plug disposed between the CESL and the gate spacer, where the dielectric plug, the CESL, the gate spacer, and the source/drain region collectively define a void physically separating the gate stack from the source/drain region.Type: GrantFiled: July 19, 2021Date of Patent: November 21, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shiang-Bau Wang, Li-Wei Yin, Chen-Huang Huang, Ming-Jhe Sie, Ryan Chia-Jen Chen
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Patent number: 11810909Abstract: Methods for cutting (e.g., dividing) metal gate structures in semiconductor device structures are provided. A dual layer structure can form sub-metal gate structures in a replacement gate manufacturing processes, in some examples. In an example, a semiconductor device includes a plurality of metal gate structures disposed in an interlayer dielectric (ILD) layer disposed on a substrate, an isolation structure disposed between the metal gate structures, wherein the ILD layer circumscribes a perimeter of the isolation structure, and a dielectric structure disposed between the ILD layer and the isolation structure.Type: GrantFiled: March 31, 2021Date of Patent: November 7, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Shiang-Bau Wang, Ryan Chia-Jen Chen, Shu-Yuan Ku, Ming-Ching Chang
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Publication number: 20230343853Abstract: In a gate replacement process, a dummy gate and adjacent structure, such as a source/drain region, are formed. The dummy gate is removed, at least in part, using a directional etch to remove some but not all of the dummy gate to form a trench. A portion of the dummy gate remains and protects the adjacent structure. A gate electrode can then be formed in the trench. A two step process can be employed, using an initial isotropic etch followed by the directional etch.Type: ApplicationFiled: June 28, 2023Publication date: October 26, 2023Inventor: Shiang-Bau Wang
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Patent number: 11798939Abstract: A method for forming a fin field effect transistor (FinFET) device structure and method for forming the same are provided. The method includes providing a substrate, and forming a fin structure on the substrate. The method also includes forming a protection layer on the sidewalls of the fin structure, and forming a dielectric layer on the fin structure and the protection layer. The method further includes removing a portion of the dielectric layer until a portion of the protection layer is exposed, and removing the exposed portion of the protection layer, such that the sidewalls of a lower portion of the fin structure are covered by the protection layer, and the sidewalls of an upper portion of the fin structure are not covered by the protection layer.Type: GrantFiled: December 9, 2019Date of Patent: October 24, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTDInventor: Shiang-Bau Wang
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Patent number: 11728407Abstract: In a gate replacement process, a dummy gate and adjacent structure, such as a source/drain region, are formed. The dummy gate is removed, at least in part, using a directional etch to remove some but not all of the dummy gate to form a trench. A portion of the dummy gate remains and protects the adjacent structure. A gate electrode can then be formed in the trench. A two step process can be employed, using an initial isotropic etch followed by the directional etch.Type: GrantFiled: June 27, 2022Date of Patent: August 15, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventor: Shiang-Bau Wang
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Publication number: 20230253479Abstract: In an embodiment, a method of forming a semiconductor device includes forming a dummy gate stack over a substrate; forming a first spacer layer over the dummy gate stack; oxidizing a surface of the first spacer layer to form a sacrificial liner; forming one or more second spacer layers over the sacrificial liner; forming a third spacer layer over the one or more second spacer layers; forming an inter-layer dielectric (ILD) layer over the third spacer layer; etching at least a portion of the one or more second spacer layers to form an air gap, the air gap being interposed between the third spacer layer and the first spacer layer; and forming a refill layer to fill an upper portion of the air gap.Type: ApplicationFiled: April 18, 2023Publication date: August 10, 2023Inventors: Ming-Jhe Sie, Chen-Huang Huang, Shao-Hua Hsu, Cheng-Chung Chang, Szu-Ping Lee, An Chyi Wei, Shiang-Bau Wang, Chia-Jen Chen
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Patent number: 11669957Abstract: A method of analyzing a semiconductor wafer includes obtaining a graphic data system (GDS) file corresponding to the semiconductor wafer, using GDS information from the GDS file to provide coordinates of a layout feature of the semiconductor wafer to an electron microscope, using the electron microscope to capture a raw image from the semiconductor wafer based on the coordinates of the layout feature, and performing a measurement operation on the raw image.Type: GrantFiled: July 16, 2021Date of Patent: June 6, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Peng-Ren Chen, Yi-An Huang, Jyun-Hong Chen, Wei-Chung Hu, Wen-Hao Cheng, Shiang-Bau Wang, Yung-Jung Chang
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Patent number: 11652155Abstract: In an embodiment, a method of forming a semiconductor device includes forming a dummy gate stack over a substrate; forming a first spacer layer over the dummy gate stack; oxidizing a surface of the first spacer layer to form a sacrificial liner; forming one or more second spacer layers over the sacrificial liner; forming a third spacer layer over the one or more second spacer layers; forming an inter-layer dielectric (ILD) layer over the third spacer layer; etching at least a portion of the one or more second spacer layers to form an air gap, the air gap being interposed between the third spacer layer and the first spacer layer; and forming a refill layer to fill an upper portion of the air gap.Type: GrantFiled: May 24, 2022Date of Patent: May 16, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Ming-Jhe Sie, Chen-Huang Huang, Shao-Hua Hsu, Cheng-Chung Chang, Szu-Ping Lee, An Chyi Wei, Shiang-Bau Wang, Chia-Jen Chen
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Patent number: 11631750Abstract: A method includes: forming a gate over a semiconductor substrate; forming doped regions in the semiconductor substrate; depositing a dielectric layer on sidewalls of the gate, the dielectric layer including vertical portions laterally surrounding a sidewall of the gate; depositing a spacer laterally surrounding the dielectric layer, the spacer including a carbon-free portion laterally surrounding the vertical portions of the dielectric layer and a carbon-containing portion laterally surrounding the carbon-free portion; forming source/drain regions in the semiconductor substrate; performing an etching operation to remove the gate and vertical portions of the dielectric layer using the carbon-free portion as an etching stop layer to thereby expose the carbon-free portion and form a recess; and forming a gate dielectric layer and a conductive layer in the recess, wherein the gate dielectric layer extends in at least a portion of an area where the vertical portions of the dielectric layer are etched.Type: GrantFiled: March 18, 2022Date of Patent: April 18, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventor: Shiang-Bau Wang
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Publication number: 20230113320Abstract: A method for shallow trench isolation structures in a semiconductor device and a semiconductor device including the shallow trench isolation structures are disclosed. In an embodiment, the method may include forming a trench in a substrate; depositing a first dielectric liner in the trench; depositing a first shallow trench isolation (STI) material over the first dielectric liner, the first STI material being deposited as a conformal layer; etching the first STI material; depositing a second STI material over the first STI material, the second STI material being deposited as a flowable material; and planarizing the second STI material such that top surfaces of the second STI material are co-planar with top surfaces of the substrate.Type: ApplicationFiled: December 12, 2022Publication date: April 13, 2023Inventors: Shiang-Bau Wang, Chun-Hung Lee
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Publication number: 20230060763Abstract: In a method of manufacturing a semiconductor device, a sacrificial gate structure including sacrificial gate electrode is formed over a substrate. A first dielectric layer is formed over the sacrificial gate structure. A second dielectric layer is formed over the first dielectric layer. The second and first dielectric layers are planarized and recessed, and an upper portion of the sacrificial gate structure is exposed. A third dielectric layer is formed over the exposed sacrificial gate structure and over the first dielectric layer. A fourth dielectric layer is formed over the third dielectric layer. The fourth and third dielectric layers are planarized, and the sacrificial gate electrode is exposed and part of the third dielectric layer remains on the recessed first dielectric layer. The recessing the first dielectric layer comprises a first etching operation and a second etching operation using a different etching as from the first etching operation.Type: ApplicationFiled: August 27, 2021Publication date: March 2, 2023Inventors: Hsu Ming HSIAO, Shen WANG, Kung Shu HSU, Hong LIN, Shiang-Bau WANG, Che-Fu CHEN
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Patent number: 11527430Abstract: A method for shallow trench isolation structures in a semiconductor device and a semiconductor device including the shallow trench isolation structures are disclosed. In an embodiment, the method may include forming a trench in a substrate; depositing a first dielectric liner in the trench; depositing a first shallow trench isolation (STI) material over the first dielectric liner, the first STI material being deposited as a conformal layer; etching the first STI material; depositing a second STI material over the first STI material, the second STI material being deposited as a flowable material; and planarizing the second STI material such that top surfaces of the second STI material are co-planar with top surfaces of the substrate.Type: GrantFiled: November 23, 2020Date of Patent: December 13, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Shiang-Bau Wang, Chun-Hung Lee
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Publication number: 20220328656Abstract: In a gate replacement process, a dummy gate and adjacent structure, such as a source/drain region, are formed. The dummy gate is removed, at least in part, using a directional etch to remove some but not all of the dummy gate to form a trench. A portion of the dummy gate remains and protects the adjacent structure. A gate electrode can then be formed in the trench. A two step process can be employed, using an initial isotropic etch followed by the directional etch.Type: ApplicationFiled: June 27, 2022Publication date: October 13, 2022Inventor: Shiang-Bau Wang
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Publication number: 20220285530Abstract: In an embodiment, a method of forming a semiconductor device includes forming a dummy gate stack over a substrate; forming a first spacer layer over the dummy gate stack; oxidizing a surface of the first spacer layer to form a sacrificial liner; forming one or more second spacer layers over the sacrificial liner; forming a third spacer layer over the one or more second spacer layers; forming an inter-layer dielectric (ILD) layer over the third spacer layer; etching at least a portion of the one or more second spacer layers to form an air gap, the air gap being interposed between the third spacer layer and the first spacer layer; and forming a refill layer to fill an upper portion of the air gap.Type: ApplicationFiled: May 24, 2022Publication date: September 8, 2022Inventors: Ming-Jhe Sie, Chen-Huang Huang, Shao-Hua Hsu, Cheng-Chung Chang, Szu-Ping Lee, An Chyi Wei, Shiang-Bau Wang, Chia-Jen Chen
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Publication number: 20220262920Abstract: A method of forming a gas spacer in a semiconductor device and a semiconductor device including the same are disclosed. In accordance with an embodiment, a method includes forming a gate stack over a substrate; forming a first gate spacer on sidewalls of the gate stack; forming a second gate spacer on sidewalls of the first gate spacer; removing the second gate spacer using an etching process to form a first opening, the etching process being performed at a temperature less than 0° C., the etching process using an etching solution including hydrogen fluoride; and depositing a dielectric layer over the first gate spacer and the gate stack, the dielectric layer sealing a gas spacer in the first opening.Type: ApplicationFiled: May 9, 2022Publication date: August 18, 2022Inventors: Chen-Huang Huang, Ming-Jhe Sie, Cheng-Chung Chang, Shao-Hua Hsu, Shu-Uei Jang, An Chyi Wei, Shiang-Bau Wang, Ryan Chia-Jen Chen
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Publication number: 20220208993Abstract: A method includes: forming a gate over a semiconductor substrate; forming doped regions in the semiconductor substrate; depositing a dielectric layer on sidewalls of the gate, the dielectric layer including vertical portions laterally surrounding a sidewall of the gate; depositing a spacer laterally surrounding the dielectric layer, the spacer including a carbon-free portion laterally surrounding the vertical portions of the dielectric layer and a carbon-containing portion laterally surrounding the carbon-free portion; forming source/drain regions in the semiconductor substrate; performing an etching operation to remove the gate and vertical portions of the dielectric layer using the carbon-free portion as an etching stop layer to thereby expose the carbon-free portion and form a recess; and forming a gate dielectric layer and a conductive layer in the recess, wherein the gate dielectric layer extends in at least a portion of an area where the vertical portions of the dielectric layer are etched.Type: ApplicationFiled: March 18, 2022Publication date: June 30, 2022Inventor: SHIANG-BAU WANG
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Patent number: 11374110Abstract: In a gate replacement process, forming a dummy gate and an adjacent structure; In a gate replacement process, a dummy gate and adjacent structure, such as a source/drain region, are formed. The dummy gate is removed, at least in part, using a directional etch to remove some but not all of the dummy gate to form a trench. A portion of the dummy gate remains and protects the adjacent structure. A gate electrode can then be formed in the trench. A two step process can be employed, using an initial isotropic etch followed by the directional etch.Type: GrantFiled: September 18, 2020Date of Patent: June 28, 2022Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventor: Shiang-Bau Wang